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    Projection system for EUV lithography
    11.
    再颁专利
    Projection system for EUV lithography 有权
    EUV光刻投影系统

    公开(公告)号：USRE42118E1

    公开(公告)日：2011-02-08

    申请号：US11981511

    申请日：2007-10-31

    Applicant: Russell Hudyma ,  Hans-Jûrgen Mann ,  Udo Dinger

    Inventor： Russell Hudyma ,  Hans-Jûrgen Mann ,  Udo Dinger

    IPC: G03B27/54 ,  G03B27/42

    CPC classification number: G03F7/70233 ,  G02B17/0657 ,  G03F7/70275

    Abstract: An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).

    Abstract translation: EUV光学投影系统包括用于对图像（IM）上的物体（OB）进行成像的至少六个反射表面。 该系统优选地被配置成沿着从物体（OB）到次级反射镜（M2）和第三反射镜（M3）之间的图像（IM）的光路形成中间图像（IMI），使得主反射镜 M1）和副镜（M2）形成第一光学组（G1），第三反射镜（M3），第四反射镜（M4），第五反射镜（M5）和第六反射镜（M6）形成第二光学组 （G2）。 该系统还优选地包括沿着从物体（OB）到主镜（M1）和副镜（M2）之间的图像（IM）的光路定位的孔径光阑（APE）。 副镜（M2）优选为凹面，第三反射镜（M3）优选为凸面。 六个反射表面中的每一个优选地以小于大约15°的入射角从中心场点接收主光线（CR）。 该系统优选地在图像（IM）处具有大于0.18的数值孔径。 优选地，该系统被配置为使得主光线（CR）在副反射镜（M2）和第三反射镜（M3）之间传播的同时朝向光轴（OA）会聚。

    BUNDLE-GUIDING OPTICAL COLLECTOR FOR COLLECTING THE EMISSION OF A RADIATION SOURCE
    12.
    发明申请
    BUNDLE-GUIDING OPTICAL COLLECTOR FOR COLLECTING THE EMISSION OF A RADIATION SOURCE 有权
    用于收集辐射源排放的组合光学收集器

    公开(公告)号：US20100231882A1

    公开(公告)日：2010-09-16

    申请号：US12726081

    申请日：2010-03-17

    Applicant: Udo Dinger ,  Christopher Weth

    Inventor： Udo Dinger ,  Christopher Weth

    IPC: G03B27/54 ,  G02B5/10 ,  G02B5/09 ,  G02B7/185

    CPC classification number: G03F7/70175 ,  G02B5/0891 ,  G02B5/09 ,  G03F7/70083 ,  G03F7/70116 ,  G03F7/702 ,  G21K2201/064

    Abstract: A bundle-guiding optical collector collects an emission of a radiation source and forms a radiation bundle from the collected emission. A reflective surface of the collector is the first bundle-forming surface downstream of the radiation source. The reflective surface is formed such that it converts the radiation source into a family of images in a downstream plane. The family of images includes a plurality of radiation source images which are offset to each other in two dimensions (x, y) in a direction perpendicular to the beam direction of the transformed radiation bundle and are arranged relative to each other in a non-rotationally symmetric manner relative to the beam direction of the transformed radiation bundle. The transformed radiation bundle in the downstream plane has a non-rotationally symmetric bundle edge contour relative to the beam direction of the transformed radiation bundle. The result is a collector in which the radiation bundle shape generated by the collector. In other words, the illumination distribution generated by the collector in a defined manner in the plane downstream of the collector has a shape which is freely selectable to the greatest possible extent.

    Abstract translation: 束引导光学收集器收集辐射源的发射并从收集的发射形成辐射束。 收集器的反射表面是辐射源下游的第一束形成表面。 反射表面形成为使得其在下游平面中将辐射源转换成一系列图像。 图像系列包括在垂直于变换辐射束的光束方向的方向上以二维（x，y）彼此偏移的多个辐射源图像，并且以非旋转方式相对于彼此布置 相对于变换辐射束的束方向的对称方式。 下游平面中的变换的辐射束相对于变换的辐射束的光束方向具有非旋转对称的束边缘轮廓。 其结果是由收集器产生的辐射束形状的收集器。 换句话说，集电体在集电体下游的平面中以规定的方式产生的照明分布具有可以最大可能地自由选择的形状。

    COLLECTOR FOR AN ILLUMINATION SYSTEM
    16.
    发明申请
    COLLECTOR FOR AN ILLUMINATION SYSTEM 有权
    收集器用于照明系统

    公开(公告)号：US20080018876A1

    公开(公告)日：2008-01-24

    申请号：US11781010

    申请日：2007-07-20

    Applicant: Ralf Stuetzle ,  Udo Dinger

    Inventor： Ralf Stuetzle ,  Udo Dinger

    IPC: G03B27/54 ,  G02B19/00

    CPC classification number: G21K1/06 ,  B82Y10/00 ,  G02B2207/123 ,  G03F7/70166

    Abstract: Collectors with mirror shells arranged inside each other, illumination systems equipped with such collectors, projection exposure apparatuses equipped with such illumination systems, methods of manufacturing microelectronic components with such projection exposure apparatuses, and related systems, components and methods are disclosed.

    Abstract translation: 公开了具有彼此布置的具有镜壳的收集器，配备有这种收集器的照明系统，配备有这种照明系统的投影曝光装置，具有这种投影曝光装置的微电子部件的制造方法以及相关系统，部件和方法。

    Method of manufacturing an optical element
    18.
    发明授权
    Method of manufacturing an optical element 有权
    制造光学元件的方法

    公开(公告)号：US07118449B1

    公开(公告)日：2006-10-10

    申请号：US10943952

    申请日：2004-09-20

    Applicant: Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

    Inventor： Udo Dinger ,  Frank Eisert ,  Siegfried Stacklies ,  Martin Weiser ,  Guenther Seitz

    IPC: B24B49/00 ,  B24B51/00 ,  B24B1/00

    CPC classification number: B24B13/06 ,  B24B51/00

    Abstract: A method of manufacturing an optical element having an optical surface extending close to a periphery of a substrate comprises: providing a substrate having a main surface extending beyond a periphery of the optical surface and also performing a polishing of the optical surface in regions of the main surface extending beyond the optical surface. Thereafter, material of the substrate carrying a portion of the surface extending beyond the optical surface is removed.

    Abstract translation: 一种制造具有靠近基板周边延伸的光学表面的光学元件的方法包括：提供具有延伸超过光学表面的周边的主表面的基板，并且还在主体的区域中执行光学表面的抛光 表面延伸超出光学表面。 此后，去除承载延伸超过光学表面的表面的一部分的基板的材料。

    Reduction objective for extreme ultraviolet lithography
    19.
    发明授权
    Reduction objective for extreme ultraviolet lithography 有权
    极光紫外光刻的减量目标

    公开(公告)号：US06577443B2

    公开(公告)日：2003-06-10

    申请号：US09878697

    申请日：2001-06-11

    Applicant: Udo Dinger ,  Hans-Jürgen Mann

    Inventor： Udo Dinger ,  Hans-Jürgen Mann

    IPC: G02B510

    CPC classification number: G03F7/70358 ,  G02B17/0663 ,  G03F7/70233 ,  Y10S359/90

    Abstract: A reduction objective, a projection exposure apparatus with a reduction objective, and a method of use thereof are disclosed. The reduction objective has a first set of multilayer mirrors in centered arrangement with respect to a first optical axis, a second set of multilayer mirrors in centered arrangement with respect to a second optical axis, and an additional mirror disposed at grazing incidence, such that said additional mirror defines an angle between the first optical axis and said second optical axis. The reduction objective has an imaging reduction scale of approximately 4× for use in soft X-ray, i.e., EUV and UV, annular field projection applications, such as lithography

    Abstract translation: 公开了一种还原目标，具有还原目标的投影曝光装置及其使用方法。 还原物镜具有相对于第一光轴居中布置的第一组多层反射镜，相对于第二光轴居中布置的第二组多层反射镜，以及放置在入射处的附加镜，使得所述多层反射镜 另外的反射镜限定了第一光轴和所述第二光轴之间的角度。 还原目标具有用于软X射线（即EUV和UV）环形场投影应用中的大约4x的成像缩小比例，例如光刻

    Projection illumination system for EUV microlithography
    20.
    发明授权
    Projection illumination system for EUV microlithography 有权
    用于EUV微光刻的投影照明系统

    公开(公告)号：US08710471B2

    公开(公告)日：2014-04-29

    申请号：US12887139

    申请日：2010-09-21

    Applicant: Udo Dinger ,  Markus Hauf

    Inventor： Udo Dinger ,  Markus Hauf

    IPC: H01L21/26 ,  H05G2/00

    CPC classification number: G03F7/702 ,  G03F7/70008 ,  G03F7/70058 ,  G03F7/70108

    Abstract: A projection illumination installation for EUV microlithography includes an EUV synchrotron light source for producing EUV used light. An object field is illuminated with the used light using illumination optics. The object field is mapped into an image field using projection optics. A scanning device is used to illuminate the object field by deflecting the used light in sync with a projection illumination period. The result is a projection illumination installation in which the output power from an EUV synchrotron light source can be used as efficiently as possible for EUV projection illumination.

    Abstract translation: 用于EUV微光刻的投影照明装置包括用于产生EUV使用光的EUV同步加速器光源。 使用照明光学器件的被使用的光照亮物体场。 使用投影光学将物体场映射到图像场中。 扫描装置用于通过与投影照明周期同步地偏转所使用的光来照亮对象场。 结果是投影照明设备，其中EUV同步加速器光源的输出功率可以尽可能高效地用于EUV投影照明。

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