METHOD FOR PREPARING GRAPHENE RIBBONS
    12.
    发明申请
    METHOD FOR PREPARING GRAPHENE RIBBONS 有权
    制备石墨饼的方法

    公开(公告)号:US20100047154A1

    公开(公告)日:2010-02-25

    申请号:US12545740

    申请日:2009-08-21

    Abstract: Disclosed is a method for fabricating graphene ribbons, comprising: preparing a graphitic material comprising stacked graphene helices; and cutting the graphitic material in a short form by applying energy to the graphitic material; and simultaneously or afterward, decomposing the graphitic material into short graphene ribbons. This method provides a mass production route to graphene ribbons.

    Abstract translation: 公开了一种制造石墨烯带的方法,包括:制备包括堆积的石墨烯螺旋的石墨材料; 并通过向石墨材料施加能量来以短形式切割石墨材料; 同时或之后,将石墨材料分解成短的石墨烯带。 这种方法提供了石墨烯带的大规模生产路线。

    DC PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION APPARATUS IN THE ABSENCE OF POSITIVE COLUMN, METHOD FOR DEPOSITING MATERIAL IN THE ABSENCE OF POSITIVE COLUMN, AND DIAMOND THIN LAYER THEREBY
    13.
    发明申请
    DC PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION APPARATUS IN THE ABSENCE OF POSITIVE COLUMN, METHOD FOR DEPOSITING MATERIAL IN THE ABSENCE OF POSITIVE COLUMN, AND DIAMOND THIN LAYER THEREBY 有权
    直流等离子体辅助化学气相沉积装置在正极柱的存在下,沉积材料在正极柱和金刚石薄层中的沉积方法

    公开(公告)号:US20080280135A1

    公开(公告)日:2008-11-13

    申请号:US11833679

    申请日:2007-08-03

    CPC classification number: C23C16/503 C23C16/272 Y10T428/268

    Abstract: Disclosed are DC plasma assisted chemical vapor deposition (DC PA-CVD) apparatus operable in the absence of a positive column, a method for depositing a material by DC PA-CVD in the absence of a positive column, and a diamond thin film fabricated thereby. In the method for depositing a material in the absence of a positive column, a discharge is generated between a cathode and an anode disposed to face each other in a reaction chamber by applying a DC voltage therebetween, and introducing reaction gas into the reaction chamber, thereby depositing a material on a substrate mounted on the anode and serving as a part of the anode, wherein the deposition of the material on the substrate is performed under a state that a cathode glow and an anode glow exist in a form of thin layers coating respectively the surfaces of the cathode and the substrate, while a positive column does not exist or is so small as to be negligible. The diamond thin film fabricated by the method is uniform, contains no impurity, and has excellent crystallinity.

    Abstract translation: 公开了在没有正极柱的情况下可操作的DC等离子体辅助化学气相沉积(DC PA-CVD)装置,在不存在正极柱的情况下通过DCPA-CVD沉积材料的方法和由其制造的金刚石薄膜 。 在不存在正极柱时沉积材料的方法中,通过在反应室中施加直流电压,在反应室内彼此面对的阴极和阳极之间产生放电,并将反应气体引入反应室, 从而将材料沉积在安装在阳极上并用作阳极的一部分的衬底上,其中材料在衬底上的沉积在阴极辉光和阳极辉光以薄层涂层形式存在的状态下进行 分别是阴极和衬底的表面,而正柱不存在或太小以致可以忽略。 通过该方法制造的金刚石薄膜是均匀的,不含杂质,并具有优异的结晶度。

    Fabrication method for diamond-coated cemented carbide cutting tool
    14.
    发明授权
    Fabrication method for diamond-coated cemented carbide cutting tool 失效
    金刚石涂层硬质合金切削工具的制造方法

    公开(公告)号:US5700518A

    公开(公告)日:1997-12-23

    申请号:US712707

    申请日:1996-09-12

    CPC classification number: C23C16/0227 C23C16/27 C25F3/02 Y10T407/27

    Abstract: A fabrication method for a diamond-coated cemented carbide cutting tool includes electrolytically etching the surface of a cemented carbide cutting tool with a NaOH or KOH aqueous solution or chemically etching the surface of the cemented carbide cutting tool with a KMnO.sub.4 +KOH aqueous solution, and depositing a diamond film on the cemented carbide cutting tool. A stronger etching effect than by using a Murakami solution can be achieved, and no poisonous material is included in the etchant. In addition, disposal of the waste etchant is made simpler, and the adhesion between the diamond film coating and the cemented carbide cutting tool can be strengthened.

    Abstract translation: 金刚石涂层硬质合金切削工具的制造方法包括用NaOH或KOH水溶液电解蚀刻硬质合金切削工具的表面,或用KMnO 4 + KOH水溶液化学蚀刻硬质合金刀具的表面,以及 在硬质合金切削工具上沉积金刚石膜。 可以实现比通过使用村上解决方案更强的蚀刻效果,并且蚀刻剂中不包含有毒材料。 此外,使废弃蚀刻剂的处理变得更简单,并且可以加强金刚石膜涂层和硬质合金切削工具之间的粘附。

    METHOD FOR DEPOSITING CUBIC BORON NITRIDE THIN FILM
    17.
    发明申请
    METHOD FOR DEPOSITING CUBIC BORON NITRIDE THIN FILM 审中-公开
    沉积CIBIC BORON NITRIDE THIN FILM的方法

    公开(公告)号:US20110223332A1

    公开(公告)日:2011-09-15

    申请号:US13047405

    申请日:2011-03-14

    CPC classification number: C23C14/0647 C23C14/067

    Abstract: The present invention relates to a method for depositing a cBN thin film on a substrate to obtain an abrasive material by physical vapor deposition carried out under an atmosphere composed of an inert gas and hydrogen. The abrasive produced by the inventive method comprises the cBN thin film attached firmly to the substrate, which has excellent hardness and durability.

    Abstract translation: 本发明涉及一种在基板上沉积cBN薄膜的方法,通过在由惰性气体和氢气组成的气氛下进行物理气相沉积来获得研磨材料。 通过本发明方法制造的磨料包括牢固地附着到基底上的cBN薄膜,其具有优异的硬度和耐久性。

Patent Agency Ranking