Vacuum deposition facility and method for coating a substrate

    公开(公告)号:US12054821B2

    公开(公告)日:2024-08-06

    申请号:US16770850

    申请日:2018-12-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/24 C23C14/14 C23C14/562 C23C14/564

    Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:



    a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,
    a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

    EQUIPMENT FOR COATING A METAL STRIP
    15.
    发明申请

    公开(公告)号:US20190040515A1

    公开(公告)日:2019-02-07

    申请号:US16058009

    申请日:2018-08-08

    Applicant: ArcelorMittal

    Abstract: Equipment for manufacturing a metal strip coated by a process that includes vacuum-depositing a layer of an oxidizable metal or an oxidizable metal alloy on a metal strip precoated with zinc or with a zinc alloy, then coiling the coated metal strip, then oxidizing a surface of the metal strip coated with the oxidizable metal or oxidizable metal alloy and treating the oxidized wound coil with a static diffusion treatment to obtain a strip having a coating that includes, in an upper portion, a layer of an alloy formed by diffusion of the oxidizable metal or the oxidizable metal alloy in all or part of the zinc or zinc alloy layer. The equipment includes a device for galvanizing the metal strip, a vacuum deposition coating device, and a static heat treatment device operating in a controlled atmosphere.

    Vacuum deposition facility and method for coating a substrate

    公开(公告)号:US12139784B2

    公开(公告)日:2024-11-12

    申请号:US16770872

    申请日:2018-12-11

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and including: a central casing including a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap including at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

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