公开(公告)号：US20190086819A1

公开(公告)日：2019-03-21

申请号：US16197416

申请日：2018-11-21

Applicant: ASML NETHERLANDS B.V

Inventor： Erik Roelof LOOPSTRA ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

公开(公告)号：US09442388B2

公开(公告)日：2016-09-13

申请号：US14456845

申请日：2014-08-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

Abstract translation: 公开了一种用于位于投影系统和基板之间的浸液的光刻投影装置。公开了几种方法和机构来保护投影系统，基板台和液体限制系统的部件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。

公开(公告)号：US12189310B2

公开(公告)日：2025-01-07

申请号：US17790341

申请日：2020-12-04

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Mehmet Ali Akbas

IPC: G03F7/20 ,  C03C27/00 ,  G03F7/00 ,  H01L21/683

Abstract: Systems, apparatuses, and methods are provided for manufacturing an electrostatic clamp. An example method can include forming, during a first duration of time comprising a first time, a top clamp comprising a first set of electrodes and a plurality of burls. The method can further include forming, during a second duration of time comprising a second time that overlaps the first time, a core comprising a plurality of fluid channels configured to carry a thermally conditioned fluid. The method can further include forming, during a third duration of time comprising a third time that overlaps the first time and the second time, a bottom clamp comprising a second set of electrodes. In some aspects, the example method can include manufacturing the electrostatic clamp without an anodic bond.

公开(公告)号：US11520241B2

公开(公告)日：2022-12-06

申请号：US16768766

申请日：2018-11-29

Applicant: ASML HOLDING N.V.

Inventor： Matthew Lipson ,  David Allen Heald ,  Iliya Sigal

IPC: G03F7/20 ,  H01L21/687

Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.

公开(公告)号：US10310391B2

公开(公告)日：2019-06-04

申请号：US15504749

申请日：2015-07-09

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Vincent Dimilia ,  Ronald Peter Totillo ,  Tammo Uitterdijk ,  Steven Michael Zimmerman

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  C03B23/20 ,  C03B25/02

Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.

公开(公告)号：US12111581B2

公开(公告)日：2024-10-08

申请号：US17291086

申请日：2019-10-22

Applicant: ASML Holding N.V.

Inventor： Mehmet Ali Akbas ,  Tammo Uitterdijk ,  Christopher John Mason ,  Matthew Lipson ,  David Hart Peterson ,  Michael Perry ,  Peter Helmus ,  Jerry Jianguo Deng ,  Damoon Sohrabibabaheidary

IPC: G03F7/20 ,  G03F7/00 ,  H01L21/687

CPC classification number: G03F7/707 ,  G03F7/70491 ,  H01L21/6875

Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.

公开(公告)号：US10274842B2

公开(公告)日：2019-04-30

申请号：US15504749

申请日：2015-07-09

Applicant: ASML Holding N.V.

Inventor： Matthew Lipson ,  Vincent Dimilia ,  Ronald Peter Totillo ,  Tammo Uitterdijk ,  Steven Michael Zimmerman

IPC: G03B27/58 ,  G03F7/20 ,  H01L21/67 ,  H01L21/683 ,  C03B23/20 ,  C03B25/02

Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.