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公开(公告)号：US20170315450A1
公开(公告)日：2017-11-02
申请号：US15653380
申请日：2017-07-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Heine Melle MULDER , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Markus Franciscus Antonius EURLINGS , Hendrikus Robertus Marie VAN GREEVENBROEK , Paul VAN DER VEEN , Patricius Aloysius Jacobus TINNEMANS , Wilfred Edward ENDENDIJK
IPC: G03F7/20
CPC classification number: G03F7/70058 , G03F7/70116 , G03F7/702 , G03F7/70216
Abstract: A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
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公开(公告)号：US20170269483A1
公开(公告)日：2017-09-21
申请号：US15614542
申请日：2017-06-05
Applicant: ASML Netherlands B.V.
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70291 , G03F7/70433 , G03F7/70508
Abstract: An apparatus and method are used to form patterns on a substrate. The apparatus comprises a projection system, a patterning device, a low-pass filter, and a data manipulation device. The projection system projects a beam of radiation onto the substrate as an array of sub-beams. The patterning device modulates the sub-beams to substantially produce a requested dose pattern on the substrate. The low-pass filter operates on pattern data derived from the requested dose pattern in order to form a frequency-clipped target dose pattern that comprises only spatial frequency components below a selected threshold frequency. The data manipulation device produces a control signal comprising spot exposure intensities to be produced by the patterning device, based on a direct algebraic least-squares fit of the spot exposure intensities to the frequency-clipped target dose pattern. In various examples, filters can also be used.
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公开(公告)号：US20170212434A1
公开(公告)日：2017-07-27
申请号：US15328194
申请日：2015-07-07
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Patricius Aloysius Jacobus TINNEMANS
IPC: G03F9/00
CPC classification number: G03F9/7088 , G03F9/7065 , G03F9/7069
Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
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公开(公告)号：US20170206649A1
公开(公告)日：2017-07-20
申请号：US15473879
申请日：2017-03-30
Applicant: ASML Netherlands B.V.
CPC classification number: G06T7/0004 , G03F7/705 , G03F7/70591 , G03F7/70633 , G06T7/11 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
Abstract: A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.
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公开(公告)号：US20150109593A1
公开(公告)日：2015-04-23
申请号：US14586518
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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Patent Agency Ranking
公开(公告)号：US20230017491A1
公开(公告)日：2023-01-19
申请号：US17784566
申请日：2020-12-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Igor Matheus Petronalla AARTS , Kaustuve BHATTACHARYYA , Ralph BRINKHOF , Leendert Jan KARSSEMEIJER , Stefan Carolus Jacobus A KEIJ , Haico Victor KOK , Simon Gijsbert Josephus MATHIJSSEN , Henricus Johannes Lambertu MEGENS , Samee Ur REHMAN
Abstract: A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
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17.发明申请公开(公告)号：US20210389365A1
公开(公告)日：2021-12-16
申请号：US17460947
申请日：2021-08-30
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Patrick WARNAAR , Vasco Tomas TENNER , Maurits VAN DER SCHAAR
IPC: G01R31/265
Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
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公开(公告)号：US20210072647A1
公开(公告)日：2021-03-11
申请号：US16623647
申请日：2018-05-14
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey DEN BOEF , Patricius Aloysius Jacobus TINNEMANS , Haico Victor KOK , William Peter VAN DRENT , Sebastianus Adrianus GOORDEN
IPC: G03F7/20
Abstract: The invention relates to a sensor (SE) comprising: —a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and —a polarizing beam splitter (PBS) to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
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19.发明申请公开(公告)号：US20210003924A1
公开(公告)日：2021-01-07
申请号：US17022910
申请日：2020-09-16
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20190094721A1
公开(公告)日：2019-03-28
申请号：US16132520
申请日：2018-09-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Edo Maria HULSEBOS , Henricus Johannes Lambertus MEGENS , Sudharshanan RAGHUNATHAN , Boris MENCHTCHIKOV , Ahmet Koray ERDAMAR , Loek Johannes Petrus VERHEES , Willem Seine Christian ROELOFS , Wendy Johanna Martina VAN DE VEN , Hadi YAGUBIZADE , Hakki Ergün CEKLI , Ralph BRINKHOF , Tran Thanh Thuy VU , Maikel Robert GOOSEN , Maaike VAN'T WESTEINDE , Weitian KOU , Manouk RIJPSTRA , Matthijs COX , Franciscus Godefridus Casper BIJNEN
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
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