-
公开(公告)号：US20220100109A1
公开(公告)日：2022-03-31
申请号：US17415682
申请日：2019-12-12
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Franciscus BIJNEN , Alessandro POLO , Kirill Urievich SOBOLEV , Simon Reinald HUISMAN , Justin Lloyd KREUZER
Abstract: An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.
-
公开(公告)号：US20170212434A1
公开(公告)日：2017-07-27
申请号：US15328194
申请日：2015-07-07
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Patricius Aloysius Jacobus TINNEMANS
IPC: G03F9/00
CPC classification number: G03F9/7088 , G03F9/7065 , G03F9/7069
Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
-
13.发明公开公开(公告)号：US20240272058A1
公开(公告)日：2024-08-15
申请号：US18568585
申请日：2022-05-24
Applicant: ASML Netherlands B.V.
Inventor： Michal Emanuel PAWLOWSKI , Justin Lloyd KREUZER
IPC: G01N15/0205 , G01N15/075 , G03F7/00
CPC classification number: G01N15/0205 , G01N15/075 , G03F7/701 , G03F7/70116 , G03F7/70133 , G03F7/7025 , G03F7/70275
Abstract: An inspection system includes a projection system including a radiation source configured to transmit an illumination beam along an illumination path and an aperture stop configured to select a portion of the illumination beam. The inspection system also includes an aperture stop that selects a portion of the illumination beam and an optical system that transmits the selected portion of the illumination beam towards an object and transmit a signal beam scattered from the object. The inspection system also includes a detector that detects the signal beam.
-
公开(公告)号：US20250130512A1
公开(公告)日：2025-04-24
申请号：US18682678
申请日：2022-07-21
Applicant: ASML Netherlands B.V.
Inventor： Mohamed SWILLAM , Stephen ROUX , Justin Lloyd KREUZER , Roxana REZVANI NARAGHI
Abstract: Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the region. The example method can further include illuminating the region with a second radiation beam at a second incident angle and, in response, measuring a second set of photons diffracted from the region. The example method can further include generating measurement data for the region based on the measured first set of photons and the measured second set of photons.
-
15.发明公开公开(公告)号：US20230142459A1
公开(公告)日：2023-05-11
申请号：US17918426
申请日：2021-04-08
Applicant: ASML Holding N.V.
Inventor： Andrew JUDGE , Ravi Chaitanya KALLURI , Michal Emanuel PAWLOWSKI , James Hamilton WALSH , Justin Lloyd KREUZER
CPC classification number: G03F1/84 , G01N21/94 , G01N21/4795 , G01N21/8806 , G01N21/8851 , G03F7/2004 , G01N2021/8896
Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.
-
Patent Agency Ranking
公开(公告)号：US20180299790A1
公开(公告)日：2018-10-18
申请号：US15766427
申请日：2016-10-06
Applicant: ASML Holding N.V.
Inventor： Krishanu SHOME , Justin Lloyd KREUZER
IPC: G03F7/20
CPC classification number: G03F7/70566 , G03F9/7046 , G03F9/7049 , G03F9/7065 , G03F9/7069 , G03F9/7088
Abstract: A metrology system includes a radiation source that generates light, an optical modulation unit, a reflector, an interferometer, and a detector. The optical modulating unit temporally separates a first polarization mode of the light from a second polarization mode of the light. The reflector directs the light towards a substrate. The interferometer interferes the diffracted light from a pattern on the substrate, or reflected light from the substrate, and produces output light from the interference. The detector receives the output light from the interferometer. The first and second polarization modes of the output light are temporally separated at the detector.
-
公开(公告)号：US20240077308A1
公开(公告)日：2024-03-07
申请号：US18260817
申请日：2022-01-04
Applicant: ASML Holding N.V.
Inventor： Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX , Michael Leo NELSON , Muhsin ERALP
CPC classification number: G01B11/272 , G03F7/20
Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.
-
公开(公告)号：US20220179331A1
公开(公告)日：2022-06-09
申请号：US17600174
申请日：2020-03-25
Applicant: ASML HOLDING N.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Justin Lloyd KREUZER , Yuxiang LIN , Kirill Urievich SOBOLEV
IPC: G03F9/00
Abstract: Apparatus for, and method of, measuring a parameter of an alignment mark on a substrate in which an optical system is arranged to receive at least one diffraction order from the alignment mark and the diffraction order is modulated at a pupil or a wafer conjugate plane of the optical system, a solid state optical device is arranged to receive the modulated diffraction order, and a spectrometer is arranged to receive the modulated diffraction order from the solid state optical device and to determine an intensity of one or more spectral components in the modulated diffraction order.
-
公开(公告)号：US20230055116A1
公开(公告)日：2023-02-23
申请号：US17794905
申请日：2021-01-21
Applicant: ASML Holding N.V.
Inventor： Peter Conrad KOCHERSPERGER , Christopher Michael DOHAN , Justin Lloyd KREUZER , Michal Emanuel PAWLOWSKI , Aage BENDIKSEN , Kirill Urievich SOBOLEV , James Hamilton WALSH , Roberto B. WIENER , Arun Mahadevan VENKATARAMAN
IPC: G03F1/84
Abstract: An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.
-
公开(公告)号：US20200064746A1
公开(公告)日：2020-02-27
申请号：US16466315
申请日：2017-12-13
Applicant: ASML HOLDING N.V.
Inventor： Justin Lloyd KREUZER
IPC: G03F7/20
Abstract: A method including: subsequent to a first device lithographic step of a device patterning process, measuring a degraded metrology mark on an object and/or a device pattern feature associated with the degraded metrology mark, the degraded metrology mark arising at least in part from the first device lithographic step on the object; and prior to a second device lithographic step of the device patterning process on the object, creating a replacement metrology mark, for use in the patterning process in place of the degraded metrology mark, on the object.
-
-
-
-
-
-
-
-
-
Search Results
25
records
(took 0.024 seconds)
