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公开(公告)号：US20050214935A1
公开(公告)日：2005-09-29
申请号：US10989910
申请日：2004-11-17
摘要： It is an object of this invention to provide a cell culture vessel which has a simple and convenient structure, can prevent the injury on the cells at the time of peeling, and accelerates the transportation of nutrients and discharge of waste materials. In order to solve the problem mentioned above, the cell culture vessel of this invention has protrusions having a corresponding diameter not smaller than 10 nm and not greater than 10 μm and a height not smaller than 10 nm and not greater than 1 mm on the surface of the cell culture vessel. The protrusions make the culture fluid permeate into the under part of the cells, accelerate the supply of nutrients and discharge of waste materials, and makes the contact between the cells and the vessel as a point-contact and thereby prevents the cells from the injury which the cells undergo at the time of peeling.
摘要翻译： 本发明的目的是提供一种结构简单方便的细胞培养容器，可以防止剥离时对细胞的损伤，加速营养物质的运输和废料排出。 为了解决上述问题，本发明的细胞培养容器具有相对应的直径不小于10nm且不大于10um的突起，并且在表面上具有不小于10nm且不大于1mm的高度 的细胞培养容器。 突起使得培养液渗透到细胞的下部，加速营养物质的供给和排出废物，并使细胞与血管之间的接触作为点接触，从而防止细胞受损， 细胞在剥离时经历。
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公开(公告)号：US20050116370A1
公开(公告)日：2005-06-02
申请号：US10997865
申请日：2004-11-29
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0015
摘要： An object of the invention is to execute an imprinting process at a higher speed and a higher accuracy, in an imprinting apparatus. In an imprinting apparatus for contacting and pressurizing a mold having a micro concavo-convex structure formed on a surface thereof to a substrate surface in order to form a micro and nanometer size structure on a substrate, a step of pressurizing the mold and the substrate and a step of peeling the mold from the substrate are constituted by independent units, the mold and the substrate are moved in a closely attached state at a time of moving from the pressurizing step to the peeling step, and preferably at least two sets of molds and substrates are processed by the different steps simultaneously or a temporarily overlapped manner.
摘要翻译： 本发明的目的是在压印装置中以更高的速度和更高的精度执行压印过程。 在用于使形成在其表面上的具有微凹凸结构的模具与基板表面接触和加压以在基板上形成微米和纳米尺寸结构的压印装置中，对模具和基板加压的步骤和 从基板剥离模具的步骤由独立的单元构成，在从加压步骤移动到剥离步骤时，模具和基板以紧密连接的状态移动，并且优选地至少两组模具和 基板通过不同的步骤同时处理或临时重叠。
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公开(公告)号：US08268209B2
公开(公告)日：2012-09-18
申请号：US11623776
申请日：2007-01-17
申请人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
发明人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
IPC分类号： H01L23/544
CPC分类号： H01L21/76838 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076 , G11B5/855 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.
摘要翻译： 在图案形成为微细凹凸形状的模具中，同心地形成用于确定基板和模具之间的相对位置关系的两个或更多个对准标记。 此外，根据各个标记的位置信息和形状来识别损坏的标记，并且除了损坏的标记之外，执行模具和施加了树脂膜的基板之间的对准。
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公开(公告)号：US08109751B2
公开(公告)日：2012-02-07
申请号：US11774244
申请日：2007-07-06
IPC分类号： B28B11/08
CPC分类号： B29C43/021 , B29C43/003 , B29C43/58 , B29C2043/025 , B29C2043/3634 , B29C2043/5808 , B29L2011/0016 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.
摘要翻译： 提供了用于将精细图案转印到材料以形成图案化材料的压印装置。 该装置包括其上具有精细图案的压模和压力分布机构。 压模被压在材料上，并且压力分配机构在图案化材料的图案化区域中提供不均匀的压力分布，同时压模与材料接触。 提供了压印装置和微结构转印方法，通过该方法可以在压模和图案化材料之间以较低压力充分地铺展树脂或其它材料以形成图案层，以便不损坏压模或 并且在图案化材料上形成具有均匀厚度的图案形成层。
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公开(公告)号：US20110171431A1
公开(公告)日：2011-07-14
申请号：US13002209
申请日：2009-06-18
申请人： Masahiko Ogino , Takashi Ando , Miho Sasaki , Akihiro Miyauchi
发明人： Masahiko Ogino , Takashi Ando , Miho Sasaki , Akihiro Miyauchi
CPC分类号： G03F7/0002 , B81C99/009 , B82Y10/00 , B82Y40/00 , Y10T428/24612
摘要： Provided is a fine structure which allows the formation of a highly accurate metallic replica mold. The structure is resistant to breakage even in the presence of foreign particles or bumps and causes a smaller transfer failure region even when applied to an undulating object to be transferred. Also provided is a stamper for imprinting, which conforms to local bumps of a substrate to be transferred, causes, if any, a smaller pattern transfer failure region, and has satisfactory durability.The fine structure includes a supporting member; and a pattern layer having a fine asperity pattern formed on a surface thereof. The pattern layer is made from a resin through curing of a resin composition containing a cationic-polymerization catalyst and two or more organic components having different functional groups, and the supporting member and the pattern layer each transmit light having a wavelength of 365 nm or longer. The stamper for imprinting includes a base layer; a buffer layer; and a pattern layer having a fine asperity geometry formed on a surface thereof. The stamper is adopted to transferring of the asperity geometry to a surface of an object to be transferred by contacting the pattern layer with the object to be transferred. The buffer layer is arranged on another surface of the pattern layer opposite to the surface on which the asperity geometry is formed, and the base layer is arranged on another surface of the buffer layer opposite to the surface on which the pattern layer is arranged. The buffer layer has a Young's modulus lower than the Young's modulus of the pattern layer, and the base layer has a Young's modulus higher than the Young's modulus of the buffer layer.
摘要翻译： 提供了允许形成高精度金属复制模具的精细结构。 即使在外来颗粒或凸起的存在下，该结构也能够破裂，并且即使当应用于待转移的起伏物体时也会导致较小的转印失效区域。 还提供了一种用于压印的压模，其符合要转印的基板的局部凸起，导致更小的图案转印失效区域，并且具有令人满意的耐久性。 精细结构包括支撑构件; 以及在其表面上形成有微细凹凸图案的图案层。 图案层由树脂通过固化含有阳离子聚合催化剂和两种或更多种具有不同官能团的有机组分的树脂组合物制成，并且支撑构件和图案层各自透射波长为365nm或更长的光 。 用于压印的压模包括基层; 缓冲层; 以及在其表面上形成有细微凹凸几何图案的图案层。 采用压模，通过使图案层与要被转印的物体接触，将凹凸几何图形转印到待转印物体的表面上。 缓冲层布置在与形成有凹凸几何形状的表面相对的图案层的另一表面上，并且基底层布置在与布置有图案层的表面相对的缓冲层的另一个表面上。 缓冲层的杨氏模量低于图案层的杨氏模量，基底层的杨氏模量高于缓冲层的杨氏模量。
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16.发明申请FUNCTIONING SUBSTRATE WITH A GROUP OF COLUMNAR MICRO PILLARS AND ITS MANUFACTURING METHOD 审中-公开具有柱状微支柱的功能基板及其制造方法公开(公告)号：US20110135814A1
公开(公告)日：2011-06-09
申请号：US13028978
申请日：2011-02-16
CPC分类号： G02B1/111 , A45B25/18 , B01L3/502746 , B01L3/502761 , B01L2200/10 , B01L2200/12 , B01L2300/0636 , B01L2300/0877 , B01L2300/166 , B01L2400/086 , B81B1/00 , B81B2203/0361 , B81B2207/056 , B82Y20/00 , C12M25/00 , C12M25/06 , G01N27/423 , G02B1/005 , G02B1/118 , G02B5/289 , G02B6/12004 , G02B6/1225 , G02B6/42 , G02B6/43 , G02B2006/12147 , G02B2006/12166
摘要： A functioning substrate with a group of columnar micro pillars characterized in that a first matrix of organic polymer and a group of columnar micro pillars of organic polymer extending from this matrix are provided. This group of columnar micro pillars has an equivalent diameter of 10 nm through 500 μm and a height of 50 nm through 5000 μm; and the ratio (H/D) of the equivalent diameter (D) to the height (H) of the group of columnar micro pillars is 4 or more.
摘要翻译： 具有一组柱状微柱的功能性基底，其特征在于提供了从该基体延伸的有机聚合物的第一基质和一组有机聚合物的柱状微柱。 这组柱状微柱的当量直径为10nm至500μm，高度为50nm至5000μm; 并且当量直径（D）与一组柱状微柱的高度（H）的比（H / D）为4以上。
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公开(公告)号：US20090246309A1
公开(公告)日：2009-10-01
申请号：US12388653
申请日：2009-02-19
申请人： Ryuta WASHIYA , Takashi Ando , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
发明人： Ryuta WASHIYA , Takashi Ando , Masahiko Ogino , Noritake Shizawa , Kyoichi Mori , Akihiro Miyauchi
IPC分类号： B29C59/02
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A fine structure imprinting machine is provided which can surely and easily eliminate static electricity in removing a stamper from an imprinting object. The fine structure imprinting machine is adapted to bring the stamper with a fine concavo-convex pattern formed thereon into contact with the imprinting object, thereby to imprint the fine concavo-convex pattern of the stamper onto a surface of the imprinting object. The stamper has a conductive film on at least a pattern formation surface thereof. The stamper is fixed by a conductive holding member, the conductive film is connected to the holding member via the conductor, and the holding member is connected to a ground within the machine.
摘要翻译： 提供了一种精细的结构压印机，其可以确实地和容易地消除从压印对象去除压模的静电。 精细结构压印机适于使压模与形成在其上的精细凹凸图案与压印对象接触，从而将压模的细微凹凸图案压印到压印对象的表面上。 压模至少在其图案形成表面上具有导电膜。 压模由导电保持构件固定，导电膜通过导体连接到保持构件，并且保持构件连接到机器内的地面上。
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18.发明申请公开(公告)号：US20090243126A1
公开(公告)日：2009-10-01
申请号：US12388573
申请日：2009-02-19
申请人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
发明人： Ryuta Washiya , Takashi Ando , Masahiko Ogino , Akihiro Miyauchi
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G11B7/263
摘要： A method of imprinting a microstructure comprising: contacting a stamper comprising a pattern layer with the microstructure of the order of from micrometers to nanometers in one face of the pattern layer and a substrate supporting the pattern layer with an imprinting member having a deformable layer to which the microstructure is imprinted, wherein the pattern layer is supported on a round surface having a prescribed radius of curvature of the substrate, the center of the round surface protruding towards the rear face of the pattern layer; causing the deformable layer on the imprinting member; and separating the stamper from the cured deformable layer.
摘要翻译： 一种压印微结构的方法，包括：将包含图案层的压模与图案层的一个表面中的微米级至数毫米级的微结构接触;以及支撑图案层的基板，其具有可变形层的压印构件， 印刷微结构，其中图案层被支撑在具有规定的基底曲率半径的圆形表面上，圆形表面的中心朝向图案层的背面突出; 使压印构件上的可变形层产生; 以及将所述压模与所述固化的可变形层分离。
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公开(公告)号：US20080028953A1
公开(公告)日：2008-02-07
申请号：US11833284
申请日：2007-08-03
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模与 检测被转移对象的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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公开(公告)号：US08491291B2
公开(公告)日：2013-07-23
申请号：US13366792
申请日：2012-02-06
IPC分类号： B29C59/16
CPC分类号： G11B7/263 , B29C33/303 , B29C43/003 , B29C43/021 , B29C43/58 , B29C2043/025 , B29C2043/043 , B29C2043/3602 , B29C2043/3634 , B29C2043/5833 , B29L2011/0075 , B29L2017/005 , B29L2031/756
摘要： In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
摘要翻译： 为了允许高精度地对准被转印物体与压模之间的相对位置，而不在被转移物体中提供对准图案，提供了一种图案转印方法，包括：当调节压模和 检测被转移物体的至少两个以上边缘位置的步骤，并从检测到的边缘位置计算任意点; 从压模的边缘或形成在压模中的对准标记检测压模的位置的步骤; 以及从任意点和压模的位置调整被转印物体与压模之间的相对位置的步骤; 以及使用其的压印装置。
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