公开(公告)号：US09576810B2

公开(公告)日：2017-02-21

申请号：US14290861

申请日：2014-05-29

Applicant: Applied Materials, Inc.

Inventor： Subhash Deshmukh ,  Joseph Johnson ,  Jingjing Liu ,  He Ren

IPC: H01L21/3065 ,  H01J37/32 ,  C23F4/00 ,  H01L21/311 ,  H01L21/3213 ,  H05K3/02 ,  H01L21/268 ,  H01L21/02

CPC classification number: H01L21/3065 ,  C23F4/00 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32862 ,  H01J2237/3343 ,  H01L21/02071 ,  H01L21/268 ,  H01L21/2686 ,  H01L21/31116 ,  H01L21/32135 ,  H01L21/32136 ,  H05K3/027

Abstract: An apparatus configured to remove metal etch byproducts from the surface of substrates and from the interior of a substrate processing chamber. A plasma is used in combination with a solid state light source, such as an LED, to desorb metal etch byproducts. The desorbed byproducts may then be removed from the chamber.

Abstract translation: 一种被配置为从衬底的表面和从衬底处理室的内部去除金属蚀刻副产物的装置。 将等离子体与固态光源（例如LED）组合使用以解吸金属蚀刻副产物。 然后可以从室中除去解吸的副产物。

公开(公告)号：US08896837B1

公开(公告)日：2014-11-25

申请号：US13922712

申请日：2013-06-20

Applicant: Applied Materials, Inc.

Inventor： Joseph M. Ranish ,  Joseph Johnson ,  Mehran Behdjat

IPC: G01N21/55

CPC classification number: G01N21/55 ,  G01N21/4738 ,  G01N2201/08

Abstract: An apparatus for reflectivity measurement is provided. The apparatus generally measures reflectivity characteristics of a reflective surface, such as a reflective cavity of a light array. The apparatus generally comprises a body defining a volume and a light emitting element disposed outside the volume. A sensor coupled to the body detects light reflected from a reflective surface. Various embodiments provide positioning of the apparatus relative to a light array having a reflective cavity.

Abstract translation: 提供了一种用于反射率测量的装置。 该装置通常测量反射表面的反射率特性，例如光阵列的反射腔。 该装置通常包括限定体积的体和设置在体积外的发光元件。 耦合到身体的传感器检测从反射表面反射的光。 各种实施例提供了装置相对于具有反射腔的光阵列的定位。

公开(公告)号：US09754807B2

公开(公告)日：2017-09-05

申请号：US14182879

申请日：2014-02-18

Applicant: APPLIED MATERIALS, INC.

Inventor： John Gerling ,  Joseph M. Ranish ,  Oleg V. Serebryanov ,  Joseph Johnson

IPC: H01L21/67 ,  C23C14/54 ,  C23C16/46

CPC classification number: H01L21/67115 ,  C23C14/541 ,  C23C16/46

Abstract: Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include: a process chamber body of the semiconductor process chamber; one or more solid state source arrays providing pulsed or continuous energy to the process chamber, wherein each of the one or more solid state source arrays include a substrate having a plurality of solid state light sources disposed on a first surface of the substrate, wherein the plurality of solid state light sources are connected in series and in a recursive pattern on the first surface of the substrate, and a heat sink coupled to a second surface of the substrate configured to remove heat from the substrate; and a power source coupled to the one or more solid state source arrays to electrically power the plurality of solid state sources.

公开(公告)号：US09406653B2

公开(公告)日：2016-08-02

申请号：US13778991

申请日：2013-02-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Joseph Johnson ,  Joseph M. Ranish

IPC: F26B3/30 ,  H01L25/075 ,  H01L33/60 ,  H01L33/64

CPC classification number: H01L25/0753 ,  H01L33/60 ,  H01L33/642 ,  H01L2924/0002 ,  H01L2933/0066 ,  H01L2924/00

Abstract: Apparatus for providing pulsed or continuous energy in a process chamber, and methods of fabricated said apparatus, are provided herein. The apparatus may include a substrate having a plurality of electrical terminals disposed on one or more surfaces of the substrate, a plurality of solid state sources grown on top of the plurality of electrical terminals, the plurality of solid state sources providing pulsed or continuous energy when electrically powered, and one or more cooling channels formed in one or more areas of the substrate.

Abstract translation: 在处理室中提供脉冲或连续能量的装置，以及制造的所述装置的方法。 该装置可以包括具有设置在基板的一个或多个表面上的多个电端子的基板，在多个电端子的顶部上生长的多个固态源，多个固态源提供脉冲或连续的能量，当 电动的，以及形成在衬底的一个或多个区域中的一个或多个冷却通道。

公开(公告)号：US09232569B2

公开(公告)日：2016-01-05

申请号：US13779004

申请日：2013-02-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Joseph Johnson ,  John Gerling ,  Klaus Schuegraf

IPC: A21B1/00 ,  H05B3/00 ,  H01L21/67

CPC classification number: H05B3/0038 ,  H01L21/67115

Abstract: Apparatus for providing pulsed or continuous energy in a process chamber are provided herein. The apparatus may include a lamphead including a set of lamps, wherein the first set of lamps are not solid state light sources, and a set of solid state light sources disposed on the lamp head, to provide pulsed or continuous energy to the process chamber.

Abstract translation: 本文提供了用于在处理室中提供脉冲或连续能量的装置。 该装置可以包括包括一组灯的灯头，其中第一组灯不是固态光源，并且一组固态光源设置在灯头上，以向处理室提供脉冲或连续的能量。