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公开(公告)号：US12181736B2
公开(公告)日：2024-12-31
申请号：US17977376
申请日：2022-10-31
Applicant: Applied Materials, Inc.
Inventor： Tapashree Roy , Wayne McMillan , Rutger Meyer Timmerman Thijssen
Abstract: Embodiments of metasurfaces having nanostructures with desired geometric profiles and configurations are provided in the present disclosure. In one embodiment, a metasurface includes a nanostructure formed on a substrate, wherein the nanostructure is cuboidal or cylindrical in shape. In another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein each of the nanostructures has a gap greater than 35 nm spaced apart from each other. In yet another embodiment, a metasurface includes a plurality of nanostructures on a substrate, wherein the nanostructures are fabricated from at least one of TiO2, silicon nitride, or amorphous silicon, or GaN or aluminum zinc oxide or any material with refractive index greater than 1.8, and absorption coefficient smaller than 0.001, the substrate is transparent with absorption coefficient smaller than 0.001.
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公开(公告)号：US12050327B2
公开(公告)日：2024-07-30
申请号：US16537326
申请日：2019-08-09
Applicant: Applied Materials, Inc.
Inventor： Jinxin Fu , Tapashree Roy , Ludovic Godet , Wayne McMillan , Robert J Visser
CPC classification number: G02B3/0068 , G02B3/0012 , G02B27/0172
Abstract: An imaging system and a method of manufacturing a metalens array is provided. The imaging system includes a metalens array, and light scattered from an object is split by the metalens array, such that an image is formed in front of an observer. The metalens array is at least partially transparent to visible light, so that the observer can also see the environment. The method of manufacturing the metalens array includes bonding together a plurality of substrates, and dicing the plurality of substrates into metalens arrays. The metalens arrays can be used in the imaging system.
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公开(公告)号：US11557987B2
公开(公告)日：2023-01-17
申请号：US17455312
申请日：2021-11-17
Applicant: Applied Materials, Inc.
Inventor： Wayne McMillan , Visweswaren Sivaramakrishnan , Joseph C. Olson , Ludovic Godet , Rutger Meyer Timmerman Thijssen , Naamah Argaman
IPC: H02N13/00 , C23F1/00 , G02B6/34 , H01L21/683 , C23C16/453 , H05H1/24 , H01L21/265
Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.
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公开(公告)号：US10955606B2
公开(公告)日：2021-03-23
申请号：US16191340
申请日：2018-11-14
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser , Wayne McMillan
Abstract: Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ϑ using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle α and a back angle β relative to a second plane of the surface of the substrate less than about 45°.
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15.发明申请公开(公告)号：US20200284953A1
公开(公告)日：2020-09-10
申请号：US16884117
申请日：2020-05-27
Applicant: Applied Materials, Inc.
Inventor： Jinxin Fu , Ludovic Godet , Wayne McMillan
Abstract: Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.
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Patent Agency Ranking
公开(公告)号：US11608558B2
公开(公告)日：2023-03-21
申请号：US16843347
申请日：2020-04-08
Applicant: Applied Materials, Inc.
Inventor： Karl J. Armstrong , Ludovic Godet , Brian Alexander Cohen , Wayne McMillan , James D. Strassner , Benjamin Riordon
IPC: C23C16/40 , C23C14/04 , C23C16/04 , C23C16/455 , C23C14/08 , C23C14/06 , C23C14/14 , C23C16/24 , C23C16/34 , H01L21/677 , C23C16/56 , G02B6/132
Abstract: Embodiments of the present disclosure relate to forming multi-depth films for the fabrication of optical devices. One embodiment includes disposing a base layer of a device material on a surface of a substrate. One or more mandrels of the device material are disposed on the base layer. The disposing the one or more mandrels includes positioning a mask over of the base layer. The device material is deposited with the mask positioned over the base layer to form an optical device having the base layer with a base layer depth and the one or more mandrels having a first mandrel depth and a second mandrel depth.
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公开(公告)号：US11187836B2
公开(公告)日：2021-11-30
申请号：US16293354
申请日：2019-03-05
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser , Naamah Argaman , Christopher Dennis Bencher , Wayne McMillan
Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.
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18.发明授权公开(公告)号：US10705268B2
公开(公告)日：2020-07-07
申请号：US16120733
申请日：2018-09-04
Applicant: Applied Materials, Inc.
Inventor： Jinxin Fu , Ludovic Godet , Wayne McMillan
Abstract: Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.
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公开(公告)号：US10564332B2
公开(公告)日：2020-02-18
申请号：US15880693
申请日：2018-01-26
Applicant: Applied Materials, Inc.
Inventor： Rutger Meyer Timmerman Thijssen , Wayne McMillan
Abstract: Embodiments described herein relate to augmented waveguide regions. The augmented waveguide regions generally include pluralities of gratings having duty cycles and refractive indices. In certain embodiments, the duty cycles are different, the refractive indices are different, or both the duty cycles and the refractive indices are different. Also described herein are methods for forming the augmented waveguide regions.
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公开(公告)号：US10409001B2
公开(公告)日：2019-09-10
申请号：US15992845
申请日：2018-05-30
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Wayne McMillan , Rutger Meyer Timmerman Thijssen , Robert Jan Visser
Abstract: Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.
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