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11.发明授权Large area substrate transferring method for aligning with horizontal actuation of lever arm 有权大面积基板转印方法，用于与杆臂的水平致动对齐公开(公告)号：US07651315B2
公开(公告)日：2010-01-26
申请号：US11621039
申请日：2007-01-08
CPC分类号： H01L21/67201 , B65G49/064 , B65G49/067 , B65G49/068 , B65G2249/02 , H01L21/67236 , Y10S414/136 , Y10S414/137 , Y10S414/139
摘要： A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.
摘要翻译： 提供了一种负载锁定室和用于传送大面积基板的方法。 在一个实施例中，适于传送大面积衬底的负载锁定室包括多个垂直堆叠的单个衬底传送室。 垂直堆叠的单个基板传送室的配置与现有技术的双槽双面基板设计相比，有助于减小尺寸和更大的通量。 此外，在减少的泵送和排气速率下已经实现了增加的产量，这对应于由于颗粒和冷凝引起的底物污染的可能性降低。
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公开(公告)号：US07316966B2
公开(公告)日：2008-01-08
申请号：US11278318
申请日：2006-03-31
IPC分类号： H01L21/20
CPC分类号： H01L21/67201 , H01L21/67196 , H01L21/67748
摘要： Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.
摘要翻译： 本文提供了一种基板处理系统，其包括盒式装载台; 负载锁定室; 位于中心的传送室; 以及位于传送室的周边周围的一个或多个处理室。 负载锁定室包括在相同位置构造的双重双槽加载锁。 这种系统可用于处理用于半导体制造的衬底。
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公开(公告)号：US07270713B2
公开(公告)日：2007-09-18
申请号：US10337483
申请日：2003-01-07
IPC分类号： C23C16/455 , C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , C23F1/00 , H01L21/306
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/45591 , C23C16/5096 , H01J37/3244 , H01J37/32449
摘要： A gas distribution plate assembly and a method for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate assembly includes a tuning plate coupled to a diffuser plate. The tuning plate has a plurality of orifice holes formed therethrough that align with a plurality of apertures formed through the diffuser plate, where the apertures each have a greater sectional area than the holes in the tuning plate. Each aperture is aligned with a respective hole to define gas passages through the gas distribution plate assembly. The tuning plate may be interchanged with a replacement tuning plate to change the gas flow characteristics through the gas distribution plate assembly.
摘要翻译： 提供一种气体分配板组件和在处理室中分配气体的方法。 在一个实施例中，气体分配板组件包括联接到扩散板的调谐板。 调谐板具有穿过其形成的多个孔孔，其与通过扩散板形成的多个孔对准，其中孔各自具有比调谐板中的孔更大的截面面积。 每个孔与相应的孔对准以限定通过气体分配板组件的气体通道。 调谐板可以与更换调谐板互换，以改变通过气体分配板组件的气流特性。
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公开(公告)号：US07018517B2
公开(公告)日：2006-03-28
申请号：US10601185
申请日：2003-06-20
CPC分类号： H01L21/67196 , C23C14/566 , C23C16/54 , H01L21/67126 , H01L21/67739 , H01L21/67748 , Y10S414/135
摘要： A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.
摘要翻译： 用于基板处理工具的传送室包括具有适于耦合到至少一个处理室和至少一个装载锁定室的侧壁的主体。 主体容纳至少一部分适于在处理室和加载锁定室之间输送基板的机器人。 盖子连接到并密封传送室主体的顶部。 传送室还具有适于联接到传送室的主体的底部并且密封传送室的主体的底部的圆顶形底部。
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公开(公告)号：US06435868B2
公开(公告)日：2002-08-20
申请号：US09732159
申请日：2000-12-07
IPC分类号： F27D306
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67109 , H01L21/67173 , H01L21/67201 , H01L21/67236 , H01L21/67248
摘要： A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.
摘要翻译： 负载锁定室包括具有孔的腔体，以允许衬底被转移到腔室中或从腔室中移出。 负载锁定室可配置为多种配置，包括用于提供两种不同压力之间的转换的基本配置，用于加热衬底并提供两种不同压力之间的转换的加热配置，以及用于冷却衬底的冷却配置， 两种不同压力之间的转变。 腔室结构的各种特征有助于通过使衬底的快速加热和冷却以及腔室的同时排空和排气来增加系统的生产能力，并且有助于补偿衬底边缘附近的热损失，由此在衬底上提供更均匀的温度 。
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公开(公告)号：US06193507B1
公开(公告)日：2001-02-27
申请号：US09502117
申请日：2000-02-10
IPC分类号： F27D306
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67109 , H01L21/67173 , H01L21/67201 , H01L21/67236 , H01L21/67248
摘要： A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.
摘要翻译： 负载锁定室包括具有孔的腔体，以允许衬底被转移到腔室中或从腔室中移出。 负载锁定室可配置为多种配置，包括用于提供两种不同压力之间的转换的基本配置，用于加热衬底并提供两种不同压力之间的转换的加热配置，以及用于冷却衬底的冷却配置， 两种不同压力之间的转变。 腔室结构的各种特征有助于通过使衬底的快速加热和冷却以及腔室的同时排空和排气来增加系统的生产能力，并且有助于补偿衬底边缘附近的热损失，由此在衬底上提供更均匀的温度 。
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公开(公告)号：US6016611A
公开(公告)日：2000-01-25
申请号：US115110
申请日：1998-07-13
IPC分类号： C23C16/455 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , F26B13/30
CPC分类号： H01L21/67173 , H01L21/67017 , Y10S414/139
摘要： A substrate processing system can include an evacuable chamber adjacent a process chamber and back-to-back process chambers, or other combinations of evacuable chambers and process chambers. The processing system includes various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. A controller controls the respective positions of the various gas flow valves and vacuum valves depending, in part, on whether the various isolation valves are in their open or sealed positions. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled, for example, to help maximize throughput, increase efficiency, and reduce the likelihood of cross-contamination between chambers.
摘要翻译： 衬底处理系统可以包括邻近处理室和背对背处理室的可抽空室，或者可抽空室和处理室的其它组合。 处理系统包括设置在相邻室之间的各种隔离阀以及气体流量阀和真空阀。 控制器控制各种气体流量阀和真空阀的各个位置，部分地取决于各种隔离阀是处于其打开或密封位置。 通过控制阀的位置，可以控制来往不同室的气体流，例如，以帮助最大限度地提高生产量，提高效率，并减少室之间交叉污染的可能性。
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公开(公告)号：US5549756A
公开(公告)日：1996-08-27
申请号：US190421
申请日：1994-02-02
摘要： A temperature measurement system for use in a thin film deposition system is based on optical pyrometry on the backside of the deposition substrate. The backside of the deposition substrate is viewed through a channel formed in the susceptor of the deposition system. Radiation from the backside of the deposition substrate passes through an infrared window and to an infrared detector. The signal output by the infrared detector is coupled to electronics for calculating the temperature of the deposition substrate in accordance with blackbody radiation equations. A tube-like lightguide shields the infrared detector from background radiation produced by the heated susceptor.
摘要翻译： 用于薄膜沉积系统的温度测量系统基于沉积基板的背面上的光学高温测量。 通过形成在沉积系统的基座中的通道观察沉积衬底的背面。 从沉积基板的背面的辐射通过红外窗口和红外检测器。 由红外检测器输出的信号耦合到电子装置，用于根据黑体辐射方程计算沉积基板的温度。 管状光导将红外探测器与受热基座产生的背景辐射屏蔽。
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公开(公告)号：US08616820B2
公开(公告)日：2013-12-31
申请号：US11926720
申请日：2007-10-29
IPC分类号： H01L21/00 , H01L21/67 , H01L21/677 , B65G47/90
CPC分类号： H01L21/67201 , H01L21/67196 , H01L21/67748
摘要： Provided herein is a double dual slot load lock chamber. The double dual slot load lock chamber includes two isolated load lock regions that are vertically stacked and share a common wall, wherein each isolated load lock region comprises two substrate slots.
摘要翻译： 这里提供双重双槽加载锁定室。 双双插槽加载锁定室包括垂直堆叠并共享公共壁的两个隔离的负载锁定区域，其中每个隔离的负载锁定区域包括两个基板槽。
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公开(公告)号：US07959987B2
公开(公告)日：2011-06-14
申请号：US11292225
申请日：2005-11-30
IPC分类号： C23C16/24 , C23C16/34 , C23C16/513
CPC分类号： C23C16/24 , C23C16/345 , H01M8/0213 , H01M8/0215 , H01M8/0226 , H01M8/0228
摘要： A method and apparatus for depositing a material layer to treat and condition a substrate, such as a fuel cell part, is described. The method includes depositing a hydrophilic material layer on a portion of the surface of the substrate in a process chamber from a mixture of precursors of the hydrophilic material layer. In addition, the method includes reducing a fluid contact angle of the substrate surface. The hydrophilic material layer comprises a wet etch rate of less than about 0.03 Å/min in the presence of about 10 ppm of hydrofluoric acid in water. The material layer can be used to condition various parts of a fuel cell useful in applications to generate electricity.
摘要翻译： 描述了用于沉积材料层以处理和调节诸如燃料电池部件的基板的方法和装置。 该方法包括在亲水材料层的前体的混合物的处理室中的基底表面的一部分上沉积亲水材料层。 此外，该方法包括降低衬底表面的流体接触角。 在大约10ppm氢氟酸存在下，亲水性材料层包括小于约0.03 /分钟的湿蚀刻速率。 材料层可用于调节用于发电的燃料电池的各种部件。
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