Abstract:
Provided are a curable composition including a colorant, a resin, and a thiol compound, in which a thiol value is 6×10−6 mmol/g to 6×10−4 mmol/g; a curable composition including a colorant, a resin, and a thiol compound, in which a content of the thiol compound is 1 ppm to 99 ppm; a cured product of the curable composition; a color filter including the cured product; and a solid-state imaging element and an image display device including the color filter.
Abstract:
There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.
Abstract:
Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
Abstract:
Provided are a photosensitive composition including a coloring material A including a pigment, a pigment derivative B, and a dispersant C, in which the pigment derivative B includes a pigment derivative B1 in which a maximum value of a molar absorption coefficient in a wavelength range of 400 to 700 nm is 3000 L·mol−1·cm−1 or less, the dispersant C includes a dispersant C1 having an ethylenically unsaturated bond-containing group, and a total content of the coloring material A and the pigment derivative B in a total solid content of the photosensitive composition is 50% by mass or more; a film formed of the photosensitive composition; an optical filter, a solid-state imaging element; and an image display device.
Abstract:
Provided are a curable composition including a pigment and a resin which satisfies at least one or the following requirement 1 or the following requirement 2; a film and a color filter formed from the curable composition; a method for manufacturing a color filter formed from the curable composition; a solid-state imaging element and an image display device including the film or the color filter; and a polymer compound. Requirement 1: the resin includes a constitutional unit having, in the same side chain, an anionic structure, a quaternary ammonium cationic structure which is ionically bonded to the anionic structure, and a radically polymerizable group. Requirement 2: the resin includes a constitutional unit having, in a side chain, a quaternary ammonium cationic structure and a group to which a radically polymerizable group is linked.
Abstract:
Provided are a curable composition including a pigment, a resin having a structural unit represented by Formula 1, and a photopolymerization initiator; as well as a cured product obtained by curing the curable composition, a color filter including the cured product, a method for producing the color filter, and a solid-state imaging element or an image display device, each of which including the color filter. R1 to R3 each independently represent a hydrogen atom or an alkyl group, X1 represents —COO—, —CONR—, or an arylene group, R4 represents a divalent linking group, L1 represents a group represented by Formula 2 or 3, R5 represents an (n+1)-valent linking group, X2 represents an oxygen atom or —NRA-, RA represents a hydrogen atom, an alkyl group, or an aryl group, and n represents an integer of 1 or more.
Abstract:
A composition includes a compound represented by Formula (1) and a pigment. In Formula (1), R1 represents an (m+n)-valent linking group, P1 represents a polymer chain which has a polyester repeating unit in a main chain, and of which a weight-average molecular weight is 1000 or more, P2 represents a polymer chain which is different from P1 and has a repeating unit derived from a monomer having an ethylenically unsaturated bonding group in a main chain, m represents a number of 1 to 9, n represents a number of 1 to 9, and m+n satisfies 4 to 18.
Abstract:
An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.The curable composition of the present invention is a curable composition containing a visible light-absorbing coloring agent, an infrared ray-absorbing coloring agent, a polymerizable compound, and a photopolymerization initiator, in which a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of 380 to 1,100 nm of a coating film of the curable composition is 1 or more, and the Δ optical density calculated by Formula (1) is 1 or less, Δ Optical density=|OD1−OD2| Formula (1) in Formula (1), OD1 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range from 380 nm to 780 nm of the coating film, and OD2 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of more than 780 nm and 1,100 nm or less of the coating film.
Abstract:
Provided are a colored composition which enables the formation of a pattern having excellent heat resistance and excellent solubility in solvents and has inhibited color migration; and a cured film, a color filter, a method for producing a color filter, a solid-state image sensor, and an image display device, each of which uses the colored composition.The colored composition includes a polymer anion having a repeating unit containing a weakly nucleophilic anionic structure, and a dye having a cationic structure, in which the weakly nucleophilic anionic structure represents an anionic structure produced by dissociating an organic acid having a lower pKa value than the pKa value of sulfuric acid.
Abstract:
There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.