PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    12.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开
    图案形成方法,抗紫外线敏感性或辐射敏感性树脂组合物,电阻膜,制造电子器件的方法和电子器件

    公开(公告)号:US20140349225A1

    公开(公告)日:2014-11-27

    申请号:US14456309

    申请日:2014-08-11

    Abstract: There is provided a pattern forming method, including: (a) forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin capable of increasing polarity by an action of an acid to decrease solubility in an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin, which contains substantially no fluorine atom and silicon atom and is other than the resin (A), (b) exposing the film; and (c) performing development using the organic solvent-containing developer to form a negative type pattern, wherein a receding contact angle of water on the film formed by (a) is 70° or more.

    Abstract translation: 提供了一种图案形成方法,其包括:(a)通过光化射线敏感或辐射敏感性树脂组合物形成膜,所述树脂组合物包含:(A)能够通过酸的作用增加极性的树脂,以降低溶解度 含有有机溶剂的显影剂,(B)能够以光化射线或辐射照射后能够产生酸的化合物,(C)溶剂,(D)基本上不含氟原子和硅原子的树脂, 比树脂(A),(b)曝光该膜; 和(c)使用含有机溶剂的显影剂进行显影以形成负型图案,其中由(a)形成的膜上的水的后退接触角为70°以上。

    PHOTOSENSITIVE COMPOSITION, FILM, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE

    公开(公告)号:US20220332970A1

    公开(公告)日:2022-10-20

    申请号:US17846340

    申请日:2022-06-22

    Abstract: Provided are a photosensitive composition including a coloring material A including a pigment, a pigment derivative B, and a dispersant C, in which the pigment derivative B includes a pigment derivative B1 in which a maximum value of a molar absorption coefficient in a wavelength range of 400 to 700 nm is 3000 L·mol−1·cm−1 or less, the dispersant C includes a dispersant C1 having an ethylenically unsaturated bond-containing group, and a total content of the coloring material A and the pigment derivative B in a total solid content of the photosensitive composition is 50% by mass or more; a film formed of the photosensitive composition; an optical filter, a solid-state imaging element; and an image display device.

    CURABLE COMPOSITION, LIGHT-SHIELDING FILM, COLOR FILTER, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, SOLID-STATE IMAGING ELEMENT, AND INFRARED SENSOR

    公开(公告)号:US20190018174A1

    公开(公告)日:2019-01-17

    申请号:US16131714

    申请日:2018-09-14

    Abstract: An object of the present invention is to provide a curable composition capable of forming a cured film having excellent linearity of a pattern, and a light-shielding film, a color filter, a solid-state imaging device, and an infrared sensor, each formed using the curable composition. Another object of the present invention is to provide a pattern forming method and a method for manufacturing a color filter, each using the curable composition.The curable composition of the present invention is a curable composition containing a visible light-absorbing coloring agent, an infrared ray-absorbing coloring agent, a polymerizable compound, and a photopolymerization initiator, in which a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of 380 to 1,100 nm of a coating film of the curable composition is 1 or more, and the Δ optical density calculated by Formula (1) is 1 or less, Δ Optical density=|OD1−OD2|  Formula (1) in Formula (1), OD1 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range from 380 nm to 780 nm of the coating film, and OD2 represents a minimum value in optical densities per 1 μm of a film thickness in a wavelength range of more than 780 nm and 1,100 nm or less of the coating film.

    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    20.
    发明申请
    PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权
    图案形成方法,电泳敏感性或辐射敏感性树脂组合物,电阻膜,电子器件的制造方法和电子器件

    公开(公告)号:US20140308605A1

    公开(公告)日:2014-10-16

    申请号:US14315661

    申请日:2014-06-26

    Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin capable of increasing the polarity by the action of an acid to decrease the solubility for an organic solvent-containing developer, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin substantially free from a fluorine atom and a silicon atom and different from the resin (A), (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.

    Abstract translation: 提供了一种图案形成方法,其包括(i)通过使用光化学射线敏感或辐射敏感性树脂组合物形成膜的步骤,所述树脂组合物含有(A)能够通过酸的作用增加极性的树脂,以减少 对于含有机溶剂的显影剂的溶解度,(B)在用光化学射线或辐射照射时能够产生酸的化合物,(C)溶剂,(D)基本上不含氟原子和硅原子的树脂 并且不同于树脂(A),(ii)曝光膜的步骤,和(iii)通过使用含有机溶剂的显影剂进行显影以形成负图案的步骤。

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