公开(公告)号：US08933144B2

公开(公告)日：2015-01-13

申请号：US14212807

申请日：2014-03-14

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Enomoto ,  Kunihiko Kodama ,  Shinji Tarutani

IPC: B29C71/04 ,  C09D11/38 ,  C08F2/50 ,  C08L33/00 ,  C09D11/30 ,  B41J11/00 ,  C09D183/06 ,  C09D11/101 ,  C08F2/44 ,  G03F7/004 ,  G03F7/027

CPC classification number: C09D11/38 ,  B41J11/0015 ,  B41J11/002 ,  C08F2/44 ,  C08F2/50 ,  C08L33/00 ,  C09D11/101 ,  C09D11/30 ,  C09D133/16 ,  C09D183/06 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/027 ,  Y10T428/24802

Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

Abstract translation: 提供用于印记的可固化组合物，其改善了固化膜的表面粗糙度。 一种包含可聚合化合物（A），聚合引发剂（B）和不可聚合化合物（C））的用于印迹的可固化组合物，所述非可聚合化合物（C）包含至少一种表面活性剂（C1） 20质量％以上的氟原子和至少1种含有3质量％以上且小于20质量％的氟原子和/或5质量％以上的聚合物（C2） 超过40质量％的硅原子，并且具有1,000至100,000的重均分子量（Mw）。

公开(公告)号：US10248019B2

公开(公告)日：2019-04-02

申请号：US13725483

申请日：2012-12-21

Applicant: FUJIFILM CORPORATION

Inventor： Shohei Kataoka ,  Kaoru Iwato ,  Kana Fujii ,  Sou Kamimura ,  Yuichiro Enomoto ,  Keita Kato ,  Shuhei Yamaguchi

IPC: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/075 ,  G03F7/11

Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

公开(公告)号：US09897922B2

公开(公告)日：2018-02-20

申请号：US15235675

申请日：2016-08-12

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Enomoto ,  Shinji Tarutani ,  Sou Kamimura ,  Kaoru Iwato ,  Keita Kato ,  Kana Fujii

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  G03F7/42 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/325 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/422

Abstract: Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an alcohol compound (X) at a content of 0 to less than 500 ppm based on the total mass of the developer.

公开(公告)号：US09663671B2

公开(公告)日：2017-05-30

申请号：US14255490

申请日：2014-04-17

Applicant: FUJIFILM Corporation

Inventor： Yuichiro Enomoto ,  Kunihiko Kodama ,  Shinji Tarutani

IPC: C09D11/30 ,  G03F7/00 ,  C08F2/50 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: C09D11/30 ,  B82Y10/00 ,  B82Y40/00 ,  C08F2/50 ,  G03F7/0002 ,  Y10T428/24802 ,  C08F2222/102 ,  C08F220/24 ,  C08F2222/245 ,  C08F2220/1875 ,  C08F2220/1891

Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.