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    Negative pattern forming method and resist pattern
    2.
    发明授权
    Negative pattern forming method and resist pattern 有权
    负图案形成方法和抗蚀剂图案

    公开(公告)号：US08859192B2

    公开(公告)日：2014-10-14

    申请号：US13904236

    申请日：2013-05-29

    Applicant: FUJIFILM Corporation

    Inventor： Keita Kato ,  Kana Fujii ,  Sou Kamimura ,  Kaoru Iwato

    IPC: G03F7/20 ,  G03F7/039 ,  G03F7/32 ,  G03F7/40

    CPC classification number: G03F7/20 ,  G03F7/0397 ,  G03F7/325 ,  G03F7/40 ,  Y10T428/24802

    Abstract: A negative pattern forming method, includes: (i) forming a film having a film thickness of 200 nm or more from a chemical amplification resist composition containing (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to decrease a solubility of the resin (A) for a developer containing one or more organic solvents, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film with a developer containing one or more organic solvents.

    Abstract translation: 负图案形成方法包括：（i）从含有（A）树脂（A）的树脂的树脂（A）的极性增加的树脂的化学放大抗蚀剂组合物形成膜厚度为200nm以上的膜， 降低对含有一种或多种有机溶剂的显影剂的树脂（A）的溶解度的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物和（C）溶剂; （ii）使膜曝光，形成曝光膜; 和（iii）用含有一种或多种有机溶剂的显影剂显影曝光的薄膜。

    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
    3.
    发明授权
    Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device 有权
    图案形成方法，光化射线敏感或辐射敏感性树脂组合物，抗蚀剂膜，电子器件的制造方法和电子器件

    公开(公告)号：US09128376B2

    公开(公告)日：2015-09-08

    申请号：US14280128

    申请日：2014-05-16

    Applicant: FUJIFILM Corporation

    Inventor： Keita Kato ,  Michihiro Shirakawa ,  Hidenori Takahashi ,  Sou Kamimura

    IPC: G03F7/004 ,  G03F7/32 ,  G03F7/038 ,  H01L21/027 ,  G03F7/039 ,  C08F220/18

    CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/325 ,  H01L21/0274

    Abstract: A pattern forming method including: (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit having a group generating a polar group upon being decomposed by the action of an acid, and a repeating unit having an aromatic group, a compound (B) generating an acid upon irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film; and (iii) developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the resin (A) is a resin having a repeating unit having a naphthyl group, and the like, and/or the actinic ray-sensitive or radiation-sensitive resin composition contains a compound (D) having a naphthalene ring, and the like.

    Abstract translation: 一种图案形成方法，包括：（i）使用含有具有通过酸的作用分解产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜 和具有芳基的重复单元，在用光化射线或辐射照射时产生酸的化合物（B）和溶剂（C）; （ii）曝光胶片; 和（iii）使用包含有机溶剂的显影剂显影曝光的膜以形成负色调图案，其中树脂（A）是具有萘基的重复单元的树脂等，和/或光化射线 敏感性或辐射敏感性树脂组合物含有具有萘环的化合物（D）等。

    Pattern forming method, chemical amplification resist composition and resist film
    4.
    发明授权
    Pattern forming method, chemical amplification resist composition and resist film 有权
    图案形成方法，化学放大抗蚀剂组合物和抗蚀剂膜

    公开(公告)号：US08753802B2

    公开(公告)日：2014-06-17

    申请号：US13656960

    申请日：2012-10-22

    Applicant: FUJIFILM Corporation

    Inventor： Keita Kato ,  Shinji Tarutani ,  Sou Kamimura ,  Yuichiro Enomoto ,  Kaoru Iwato

    IPC: G03F7/26

    CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

    Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。

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