公开(公告)号：US20220382151A1

公开(公告)日：2022-12-01

申请号：US17724873

申请日：2022-04-20

Applicant: FUJIFILM Corporation

Inventor： Tomoaki YOSHIOKA ,  Shuhei Yamaguchi ,  Eiji Fukuzaki ,  Taro Miyoshi

IPC: G03F7/039 ,  G03F7/038 ,  C08F212/14 ,  C08F8/34

Abstract: A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.

公开(公告)号：US10934414B2

公开(公告)日：2021-03-02

申请号：US16170732

申请日：2018-10-25

Applicant: FUJIFILM Corporation

Inventor： Yoshinori Maeda ,  Shuhei Yamaguchi

IPC: C08K5/13 ,  B29C41/28 ,  C08J5/18 ,  G02F1/1335 ,  C08K5/053 ,  C08L1/12 ,  G02B5/30 ,  C08L1/10 ,  C08L1/14 ,  B32B23/00 ,  G02B1/14 ,  G02B1/18 ,  B29K1/00 ,  B29L31/34 ,  C08K5/134 ,  C08K5/45

Abstract: A long film containing a cellulose acylate and a compound A having a molecular weight of less than 1,000 which satisfies conditions 1-4. Condition 1: containing two or more aromatic rings each directly connected to a hydroxyl group in a molecule. Condition 2: containing one or more carbon atoms directly connected to an aromatic ring directly connected to a hydroxyl group and do not constitute the aromatic ring in a molecule, the carbon atoms being directly connected to 1 to 3 aromatic rings. Condition 3: Each carbon atom directly connected to an aromatic ring directly connected to a hydroxyl group and not constituting the aromatic ring has no bond with a hydrogen atom. Condition 4: Each carbon atom directly connected to an aromatic ring directly connected to a hydroxyl group and not constituting the aromatic ring is bonded by a single bond to atoms other than hydrogen atoms.

公开(公告)号：US10545405B2

公开(公告)日：2020-01-28

申请号：US15685499

申请日：2017-08-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei Yamaguchi ,  Koutarou Takahashi ,  Toshiaki Fukuhara ,  Shuji Hirano

IPC: G03F7/038 ,  G03F7/30 ,  G03F1/50 ,  G03F7/16 ,  G03F7/20

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US09632410B2

公开(公告)日：2017-04-25

申请号：US14868409

申请日：2015-09-29

Applicant: FUJIFILM Corporation

Inventor： Shuhei Yamaguchi ,  Toru Tsuchihashi ,  Tomotaka Tsuchimura

IPC: G03F7/039 ,  G03F1/50 ,  G03F1/76 ,  G03F7/32 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/039 ,  G03F1/50 ,  G03F1/76 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2039 ,  G03F7/2059 ,  G03F7/32

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.

公开(公告)号：US09482947B2

公开(公告)日：2016-11-01

申请号：US14035139

申请日：2013-09-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei Yamaguchi ,  Hidenori Takahashi ,  Michihiro Shirakawa ,  Shohei Kataoka ,  Shoichi Saitoh ,  Fumihiro Yoshino

IPC: G03F7/039 ,  G03F7/32 ,  G03F7/038 ,  C08F20/28 ,  C08F220/28 ,  G03F7/004 ,  G03F7/11 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/0382 ,  C08F20/28 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  C08F2220/283 ,  C08F220/42 ,  C08F2220/1825

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.

公开(公告)号：US20230123203A1

公开(公告)日：2023-04-20

申请号：US17884181

申请日：2022-08-09

Applicant: FUJIFILM Corporation

Inventor： Taro MIYOSHI ,  Shuhei Yamaguchi

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/038 ,  C08F212/14 ,  C08F220/30 ,  C07C51/41 ,  C07C381/12

Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.

公开(公告)号：US10248019B2

公开(公告)日：2019-04-02

申请号：US13725483

申请日：2012-12-21

Applicant: FUJIFILM CORPORATION

Inventor： Shohei Kataoka ,  Kaoru Iwato ,  Kana Fujii ,  Sou Kamimura ,  Yuichiro Enomoto ,  Keita Kato ,  Shuhei Yamaguchi

IPC: G03F7/004 ,  C07C303/32 ,  C07C309/04 ,  C07C309/06 ,  C07C309/07 ,  C07C309/10 ,  C07C309/12 ,  C07C309/13 ,  C07C309/14 ,  C07D211/96 ,  G03F7/039 ,  G03F7/20 ,  G03F7/32 ,  G03F7/075 ,  G03F7/11

Abstract: A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

公开(公告)号：US09423689B2

公开(公告)日：2016-08-23

申请号：US14164389

申请日：2014-01-27

Applicant: FUJIFILM Corporation

Inventor： Shuhei Yamaguchi ,  Hidenori Takahashi ,  Michihiro Shirakawa ,  Fumihiro Yoshino

IPC: G03F7/038 ,  C08F20/10 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20

CPC classification number: G03F7/0382 ,  C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）由下式（I）表示的重复单元的树脂或（a1）由下式（I）表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤， （II），基于树脂（P）中的所有重复单元为20摩尔％以上，（B）在光化射线或辐射照射时能够产生酸的化合物; （ii）曝光胶片的步骤，以形成曝光胶片; 和（iii）通过使用包含有机溶剂的显影剂形成负图案来显影所述曝光的薄膜的步骤。

公开(公告)号：US10120281B2

公开(公告)日：2018-11-06

申请号：US15176345

申请日：2016-06-08

Applicant: FUJIFILM Corporation

Inventor： Koutarou Takahashi ,  Tomotaka Tsuchimura ,  Shuhei Yamaguchi ,  Natsumi Yokokawa ,  Hidehiro Mochizuki

IPC: G03F7/20 ,  G03F7/24 ,  G03F7/038 ,  G03F7/32 ,  G03F1/24 ,  G03F1/50 ,  G03F1/78

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) having a phenolic hydroxyl group, and a crosslinking agent (C) having two or more hydroxymethyl groups or alkoxymethyl groups in total within the molecule, wherein the composition contains a crosslinking agent (C1) having a molecular weight of 420 or more and also having two to four hydroxymethyl groups or alkoxymethyl groups in total within the molecule in a proportion of 60 mol % to 100 mol % based on the total amount of the crosslinking agent (C) including the crosslinking agent (C1), and in which the total concentration of the hydroxymethyl groups or the alkoxymethyl groups of the crosslinking agent (C) relative to 1 g of the solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.30 mmol/g or more.

公开(公告)号：US10101656B2

公开(公告)日：2018-10-16

申请号：US15444481

申请日：2017-02-28

Applicant: FUJIFILM Corporation

Inventor： Shuhei Yamaguchi

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027 ,  C08F220/26 ,  C08F220/30 ,  G03F1/50 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes an alkali-soluble resin (A) and a compound (B) exemplified below, the compound (B) has a specific structure within a molecule.