Optical arrangement in a projection exposure apparatus for EUV lithography
    11.
    发明授权
    Optical arrangement in a projection exposure apparatus for EUV lithography 有权
    用于EUV光刻的投影曝光装置中的光学布置

    公开(公告)号:US09298111B2

    公开(公告)日:2016-03-29

    申请号:US13405882

    申请日:2012-02-27

    摘要: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译: 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状,可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY
    12.
    发明申请
    OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY 有权
    投影曝光装置的光学布置

    公开(公告)号:US20120188523A1

    公开(公告)日:2012-07-26

    申请号:US13405882

    申请日:2012-02-27

    IPC分类号: G03B27/70 G02B7/182

    摘要: An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement.

    摘要翻译: 光学装置包括多个光学元件和承载光学元件的载体结构。 载体结构由至少两个可释放地互连的模块组成。 每个模块由至少一个载体结构子元件组成。 子载体由多个载体结构子元件和/或模块产生。 子结构具有至少在区域中对应于投影曝光装置中的可用光束路径而变化的几何形状,可用光束路径被定义为可以在场平面中从所有场点传播的所有光束的包络 到投影曝光装置的像平面。 用于EUV光刻的投影曝光装置包括这种光学装置。

    Optical assembly
    14.
    发明授权
    Optical assembly 有权
    光学组件

    公开(公告)号:US07929227B2

    公开(公告)日:2011-04-19

    申请号:US12829491

    申请日:2010-07-02

    IPC分类号: G02B7/02

    摘要: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

    摘要翻译: 一种光学组件,其以特别是在物镜或照明或曝光系统中的布置被支撑在壳体的内部,其包括至少一个光学元件,特别是透镜,反射镜或孔,其中所述至少一个元件 由至少一个操纵器影响的特征在于,所述至少一个操纵器布置在壳体的外部或者通过解耦装置的完全或大部分分离的保持装置中,并且提供 操纵器和元件之间的有效耦合将被装置的内部中的操纵器影响。

    LOW-CONTAMINATION OPTICAL ARRANGEMENT
    17.
    发明申请
    LOW-CONTAMINATION OPTICAL ARRANGEMENT 有权
    低污染光学布置

    公开(公告)号:US20110194091A1

    公开(公告)日:2011-08-11

    申请号:US13023840

    申请日:2011-02-09

    IPC分类号: G03B27/54

    摘要: An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor.

    摘要翻译: 光学装置具有能够透射光束的多个光学元件。 提供了从光学元件的表面沿着从光学元件发射的光束的方向或入射在光学元件上的光束延伸的部分壳体,并且其形状适合于光束的形状。 至少部分地由部分壳体被与其机械分离的测量结构所包围。 测量结构具有至少一个传感器。

    Low-contamination optical arrangement
    18.
    发明授权
    Low-contamination optical arrangement 有权
    低污染光学布置

    公开(公告)号:US09316930B2

    公开(公告)日:2016-04-19

    申请号:US13023840

    申请日:2011-02-09

    IPC分类号: G03B27/54 G03F7/20

    摘要: An optical arrangement has a plurality of optical elements capable of transmitting a beam. A partial housing is provided which extends from a surface of an optical element in the direction of the beam emanating from the optical element, or of the beam incident on the optical element, and whose shape is adapted to the shape of the beam. The partial housing is surrounded at least partially by a measurement structure which is mechanically decoupled therefrom. The measurement structure has at least one sensor.

    摘要翻译: 光学装置具有能够透射光束的多个光学元件。 提供了从光学元件的表面沿着从光学元件发射的光束的方向或入射在光学元件上的光束延伸的部分壳体,并且其形状适合于光束的形状。 至少部分地由部分壳体被与其机械分离的测量结构所包围。 测量结构具有至少一个传感器。