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11.发明授权公开(公告)号：US11173464B2
公开(公告)日：2021-11-16
申请号：US16411061
申请日：2019-05-13
Applicant: HRL Laboratories, LLC
Inventor： Christopher S. Roper , Shanying Cui , Adam F. Gross
Abstract: Some variations provide a method of assembling a plurality of particles into particle assemblies, comprising: (a) obtaining a first fluid containing particles and a solvent for the particles; (b) obtaining a second fluid not fully miscible with the first fluid; (c) obtaining a third fluid that is a co-solvent for the first fluid and the second fluid; (d) combining the first fluid and the second fluid to generate an emulsion containing droplets of the first fluid in the second fluid; (e) adding the third fluid to the emulsion; and (f) dissolving out the solvent from the droplets into the third fluid, thereby forming particle assemblies. Some variations also provide an assembly of nanoparticles, wherein the assembly has a volume from 1 μm3 to 1 mm3, a packing fraction from 20% to 100%, and/or an average relative surface roughness less than 1%, wherein the assembly is not disposed on a substrate.
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12.发明授权公开(公告)号：US10240065B2
公开(公告)日：2019-03-26
申请号：US15391749
申请日：2016-12-27
Applicant: HRL Laboratories, LLC
Inventor： Andrew P. Nowak , Adam F. Gross , April R. Rodriguez , Shanying Cui
IPC: C08G18/00 , C09D175/08 , C08G18/10 , C08G18/24 , C08G18/75 , C08G18/50 , C08G18/48 , C08G18/08 , C08G18/34 , C09D7/61 , C08K3/08
Abstract: We have demonstrated reversibly reducing metal-ion crosslinkages in polymer systems, by harnessing light, creating a dynamic and reversible bond. The reduction induces chemical and physical changes in the polymer materials. Some variations provide a polymer composition comprising: a polymer matrix containing one or more ionic species; one or more photosensitizers; and one or more metal ions capable of reversibly changing from a first oxidation state to a second oxidation state when in the presence of the photosensitizers and light. Some embodiments employ urethane-based ionomers capable of changing their crosslinked state under the influence of a change in counterion valance, using light or chemical reducing agents. This invention provides films, coatings, or objects that are reversible, re-mendable, self-healing, mechanically adjustable, and/or thermoplastic/thermoset-switchable.
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公开(公告)号：US10189718B1
公开(公告)日：2019-01-29
申请号：US15241536
申请日：2016-08-19
Applicant: HRL Laboratories, LLC
Inventor： Adam F. Gross , Shanying Cui , John J. Vajo , Christopher S. Roper
IPC: B01J19/00 , C01G49/02 , C30B29/12 , C30B29/22 , C30B7/10 , C30B7/14 , C30B29/62 , C30B33/06 , C01F17/00 , C01G49/00 , B01L3/00
Abstract: Methods to fabricate tightly packed arrays of nanoparticles are disclosed, without relying on organic ligands or a substrate. In some variations, a method of assembling particles into an array comprises dispersing particles in a liquid solution; introducing a triggerable pH-control substance capable of generating an acid or a base; and triggering the pH-control substance to generate an acid or a base within the liquid solution, thereby titrating the pH. During pH titration, the particle-surface charge magnitude is reduced, causing the particles to assemble into a particle array. Other variations provide a device for assembling particles into particle arrays, comprising a droplet-generating microfluidic region; a first-fluid inlet port; a second-fluid inlet port; a reaction microfluidic region, disposed in fluid communication with the droplet-generating microfluidic region; and a trigger source configured to trigger generation of an acid or a base from at least one pH-control substance contained within the reaction microfluidic region.
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14.发明授权公开(公告)号：US12272475B2
公开(公告)日：2025-04-08
申请号：US17682478
申请日：2022-02-28
Applicant: HRL Laboratories, LLC
Inventor： Shanying Cui , Xin N. Guan , Adam F. Gross , Florian G. Herrault
Abstract: Some variations provide a magnetically anisotropic structure comprising a hexaferrite film disposed on a substrate, wherein the hexaferrite film contains a plurality of discrete and aligned magnetic hexaferrite particles, wherein the hexaferrite film is characterized by an average film thickness from about 1 micron to about 500 microns, and wherein the hexaferrite film contains less than 2 wt % organic matter. The hexaferrite film does not require a binder. Discrete particles are not sintered or annealed together because the maximum processing temperature to fabricate the structure is 500° C. or less, such as 250° C. or less. The magnetic hexaferrite particles may contain barium hexaferrite (BaFe12O19) and/or strontium hexaferrite (SrFe12O19). The hexaferrite film may be characterized by a remanence-to-saturation magnetization ratio of at least 0.7. Methods of making and using the magnetically anisotropic structure are also described.
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公开(公告)号：US20230414809A1
公开(公告)日：2023-12-28
申请号：US18464884
申请日：2023-09-11
Applicant: HRL LABORATORIES, LLC
Inventor： Adam F. Gross , Kevin Geary , Shanying Cui
CPC classification number: A61L2/10 , G02B6/0065 , G02B5/008 , A61L2/26 , G02B6/0023 , A61L2/238 , G02B6/102 , A61L2202/11 , G02B6/0043 , G02B6/0066 , G02B6/003
Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured is to refract a suitable amount of UV light in response to a particular type of residue or application.
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Patent Agency Ranking
公开(公告)号：US11793897B2
公开(公告)日：2023-10-24
申请号：US17036474
申请日：2020-09-29
Applicant: HRL LABORATORIES, LLC
Inventor： Adam F. Gross , Kevin Geary , Shanying Cui
CPC classification number: A61L2/10 , A61L2/238 , A61L2/26 , G02B5/008 , G02B6/0023 , G02B6/0065 , G02B6/102 , A61L2202/11 , G02B6/003 , G02B6/0043 , G02B6/0066
Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.
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公开(公告)号：US11693160B2
公开(公告)日：2023-07-04
申请号：US17322481
申请日：2021-05-17
Applicant: HRL Laboratories, LLC
Inventor： Raymond Sarkissian , Phuong Phuc Nam Bui , Tobias Anton Schaedler , Shanying Cui
CPC classification number: G02B5/0284 , G02B1/005 , G02B5/124 , F02F1/18 , F02K9/00 , F05D2300/504
Abstract: A photonic reflector device includes a first layer, a second layer, and a third layer. The first layer, which functions as a retro-reflector, is formed of a first material contacting a second material and having a non-planar interface therebetween. The second layer, which functions as a photonic crystal, includes third and fourth materials that have different refractive indices from one another and are configured such that the second layer has a periodic optical potential along at least one dimension. The third layer, which functions as a Lambertian scatterer, includes a plurality of inclusions in a first matrix material. In combination, the layers may be optimized to synergistically reflect targeted wavelengths and/or polarizations of light.
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18.发明授权公开(公告)号：US11434171B1
公开(公告)日：2022-09-06
申请号：US17109237
申请日：2020-12-02
Applicant: HRL Laboratories, LLC
Inventor： Xin N. Guan , Shanying Cui , Florian G. Herrault
IPC: C04B35/26 , C04B35/622 , H01F1/117 , H01F1/00
Abstract: Some variations provide a magnetically anisotropic structure comprising a magnetically anisotropic film on a substrate, wherein the magnetically anisotropic film contains a plurality of discrete magnetic hexaferrite particles, wherein the film is characterized by an average film thickness from 1 micron to 5 millimeters, and wherein the magnetically anisotropic film contains from 2 wt % to 75 wt % organic matter. Some variations provide a magnetically anisotropic structure comprising an out-of-plane magnetically anisotropic film on a substrate, wherein the magnetically anisotropic film contains a plurality of discrete magnetic hexaferrite particles, wherein the film is characterized by an average film thickness from 1 micron to 5 millimeters, and wherein the magnetically anisotropic film contains a concentration of hexaferrite particles of at least 40 vol %. The magnetically anisotropic structures are fabricated at low temperatures so that the magnetically anisotropic film may be monolithically integrated into an integrated-circuit fabrication process.
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公开(公告)号：US11254779B1
公开(公告)日：2022-02-22
申请号：US16419171
申请日：2019-05-22
Applicant: HRL Laboratories, LLC
Inventor： Ashley M. Dustin , April R. Rodriguez , Shanying Cui , Andrew P. Nowak , Adam F. Gross
IPC: C08G18/24 , C08G18/48 , C08G18/50 , C09D175/06 , C08G18/08 , C08G18/72 , C09D175/08 , C08G18/46 , C08K3/08 , C08G18/34 , C08G18/75 , C08G18/10
Abstract: Some variations provide a reworkable ionomer composition comprising: a polymer containing a plurality of ionic monomers disposed in a chain backbone of the polymer, wherein the ionic monomers have a monomer charge polarity that is either positive or negative; and a plurality of ionic species disposed within the chain backbone of the polymer, wherein the ionic species have opposite charge polarity compared to the monomer charge polarity, wherein the ionic species and the ionic monomers are ionically bonded, and wherein the ionic species are capable of undergoing a reversible oxidation-state transition of at least +1 or −1 when in the presence of a redox reagent. The polymer may be selected from the group consisting of polyurethanes, polyacrylates, polyamides, polyesters, polyureas, polyurethane-ureas, polysiloxanes, polycarbonates, and combinations thereof. Many options for ionic monomers and ionic species are disclosed. These reworkable ionomers are useful for many commercial applications, including coatings and polymer parts.
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公开(公告)号：US20240358869A1
公开(公告)日：2024-10-31
申请号：US18767463
申请日：2024-07-09
Applicant: HRL LABORATORIES, LLC
Inventor： Adam F. Gross , Kevin Geary , Shanying Cui
CPC classification number: A61L2/10 , A61L2/238 , A61L2/26 , G02B5/008 , G02B6/0023 , G02B6/0065 , G02B6/102 , A61L2202/11 , G02B6/003 , G02B6/0043 , G02B6/0066
Abstract: A self-sanitizing surface structure configured to selectively refract light, a method of fabricating a self-sanitizing surface configured to selectively refract light, and a method of decontaminating a surface using selectively refracted light. A waveguide including a support layer below a propagating layer is positioned over a substrate as a self-sanitizing layer. In the absence of a contaminant or residue on the waveguide, UV light injected into the propagating layer is constrained within the propagating layer due to total internal reflection. When a residue is present on the self-sanitizing surface structure, light may be selectively refracted at or near the interface with the residue along the side of the waveguide to destroy the residue. The self-sanitizing surface structure may be configured to refract a suitable amount of UV light in response to a particular type of residue or application.
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