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    PERPENDICULAR MAGNETIC WRITE HEAD HAVING A CONFORMAL, WRAP-AROUND, TRAILING MAGNETIC SHIELD FOR REDUCED ADJACENT TRACK INTERFERENCE
    11.
    发明申请
    PERPENDICULAR MAGNETIC WRITE HEAD HAVING A CONFORMAL, WRAP-AROUND, TRAILING MAGNETIC SHIELD FOR REDUCED ADJACENT TRACK INTERFERENCE 有权
    具有一致性，缠绕，跟踪磁屏蔽的平滑磁头，用于减少相邻的跟踪干扰

    公开(公告)号：US20070211384A1

    公开(公告)日：2007-09-13

    申请号：US11744054

    申请日：2007-05-03

    申请人： Wen-Chien Hsiao ,  Yimin Hsu ,  Vladimir Nikitin ,  Aron Pentek ,  Yi Zheng

    发明人： Wen-Chien Hsiao ,  Yimin Hsu ,  Vladimir Nikitin ,  Aron Pentek ,  Yi Zheng

    IPC分类号： G11B5/147

    CPC分类号： G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A perpendicular magnetic write head having a conformal wrap around trailing shield. The write head includes a write pole that can be configured with a trapezoidal shape as viewed from the Air Bearing Surface (ABS) and which includes a wrap around trailing magnetic shield. The magnetic shield has a trailing portion that is separated from the leading edge of the writ pole by a non-magnetic trailing gap, and has side shield portions that are separated from first and second side portions of the write pole by first and second non-magnetic side gaps. The magnetic shield can be configured with notches at either side of the trailing portion of magnetic shield. These notches can extend in the trailing direction by a distance that is preferably ¼ to 1 times the trailing gap thickness. The width of the straight, trailing portion of the shield is preferable ½ to 1 times of the main pole width.

    摘要翻译： 垂直磁性写头，其具有围绕后屏蔽的保形包裹。 写入头包括写入极，其可以被配置为从空气轴承表面（ABS）观察到的梯形形状，并且包括围绕尾部磁屏蔽的包裹。 磁屏蔽具有通过非磁性拖尾间隙与写极的前缘分离的后部，并且具有通过第一和第二非隔离部分与写入极的第一和第二侧部分离的侧面屏蔽部分， 磁侧隙。 磁屏蔽可以在磁屏蔽的尾部的任一侧配置有凹口。 这些凹口可以在拖尾方向上延伸一段距离，优选为后缘间隙厚度的1/4至1倍。 屏蔽的直的后部的宽度优选为主极宽度的1/2至1倍。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    13.
    发明授权
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号：US07576951B2

    公开(公告)日：2009-08-18

    申请号：US11411556

    申请日：2006-04-25

    申请人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    发明人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译： 用于垂直磁记录的磁写头，具有带有凹后缘的写极。 磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能，例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。

    Perpendicular magnetic write head having a wrap around trailing shield with a flux return path
    15.
    发明申请
    Perpendicular magnetic write head having a wrap around trailing shield with a flux return path 审中-公开
    垂直磁性写头，具有带有通量返回路径的后挡板的包裹物

    公开(公告)号：US20080112088A1

    公开(公告)日：2008-05-15

    申请号：US11598417

    申请日：2006-11-13

    申请人： Wen-Chien David Hsiao ,  Yimin Hsu ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Aron Pentek ,  Yi Zheng

    发明人： Wen-Chien David Hsiao ,  Yimin Hsu ,  Edward Hin Pong Lee ,  Vladimir Nikitin ,  Aron Pentek ,  Yi Zheng

    IPC分类号： G11B5/33

    CPC分类号： G11B5/1278 ,  G11B5/11

    摘要： A magnetic write head for perpendicular magnetic recording that has write pole, a return pole and a trailing shield that is magnetically connected with magnetic return pole. The write head includes a magnetic pedestal and first and second magnetic studs that connect the trailing shield with the pedestal. The studs are laterally spaced a distance that is not greater than 5 um from the nearest side of the write pole. In other words, the studs are spaced from each other a distance that is no greater than the width of the leading edge of the write pole plus 10 um. This spacing of the studs prevents saturation of the trailing shield, maximizing field gradient and ensuring optimal magnetic write performance.

    摘要翻译： 用于垂直磁记录的磁头，具有写磁极，与磁返回极磁性连接的返回极和后屏蔽。 写头包括一个磁性基座和将尾部屏蔽与基座相连的第一和第二磁性螺柱。 螺柱横向间隔开距离写柱最近侧不超过5um的距离。 换句话说，螺柱彼此间隔开不大于写入极的前缘的宽度加上10um的距离。 螺栓的这种间距防止后挡板的饱和，使场梯度最大化并确保最佳磁写性能。

    Process to open connection vias on a planarized surface
    17.
    发明申请
    Process to open connection vias on a planarized surface 有权
    在平坦化表面上打开连接通孔的过程

    公开(公告)号：US20070245557A1

    公开(公告)日：2007-10-25

    申请号：US11411555

    申请日：2006-04-25

    申请人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    发明人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    IPC分类号： H01K3/10

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49044 ,  Y10T29/49126 ,  Y10T29/49139 ,  Y10T29/49153 ,  Y10T29/49155 ,  Y10T29/49165 ,  Y10T29/49169

    摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A substrate such as an alumina fill layer, magnetic shaping layer, etc. is formed with region having a contact pad formed therein. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over the substrate and is covered with a thick layer of alumina. The alumina can be applied by a high deposition rate process that does not form voids or seams in the alumina layer. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer. The mask can then be lifted off and an electrically conductive material can be deposited into the via. Forming the via by a subtractive method rather than by a liftoff process allows the alumina to be deposited in a manner that does not result in voids. The use of reactive ion milling allows the via to be well defined and formed with substantially vertical side walls rather than in a conical or outward spreading fashion as would be formed by other material removal processes such as wet etching.

    摘要翻译： 在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。 在其中形成有形成有接触垫的区域形成诸如氧化铝填充层，磁性成形层等的基板。 诸如磁极和/或磁性后屏蔽的结构形成在衬底之上，并被厚层氧化铝覆盖。 可以通过在氧化铝层中不形成空隙或接缝的高沉积速率工艺来施加氧化铝。 然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。 掩模结构形成有设置在接触垫上方的开口。 然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。 然后可以将掩模剥离，并且可以将导电材料沉积到通孔中。 通过减法法而不是通过剥离工艺形成通孔允许以不会导致空隙的方式沉积氧化铝。 使用反应离子研磨允许通孔被良好地限定并且形成有基本垂直的侧壁，而不是以其它材料去除工艺（例如湿蚀刻）形成的锥形或向外扩展方式。

    Process to open connection vias on a planarized surface
    19.
    发明授权
    Process to open connection vias on a planarized surface 有权
    在平坦化表面上打开连接通孔的过程

    公开(公告)号：US07523550B2

    公开(公告)日：2009-04-28

    申请号：US11411555

    申请日：2006-04-25

    申请人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    发明人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    IPC分类号： H01K3/10

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49044 ,  Y10T29/49126 ,  Y10T29/49139 ,  Y10T29/49153 ,  Y10T29/49155 ,  Y10T29/49165 ,  Y10T29/49169

    摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over a substrate and is covered with a thick layer of alumina. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer.

    摘要翻译： 在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。 诸如磁极和/或磁性后屏蔽的结构形成在衬底上并被厚层氧化铝覆盖。 然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。 掩模结构形成有设置在接触垫上方的开口。 然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。