公开(公告)号：US5309197A

公开(公告)日：1994-05-03

申请号：US868705

申请日：1992-04-15

申请人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

发明人： Tetsuya Mori ,  Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

CPC分类号： G03F9/7088 ,  G03F9/00

摘要： A projection exposure apparatus includes a projection lens system for projecting an image of a pattern of an original on a substrate having a photosensitive layer, by using a sensitizing beam; a first detection optical system for detecting a mark of the substrate through the projection lens system and with a first non-sensitizing beam, the first detection optical system producing first information related to the position of the mark; a second detection optical system for detecting the mark of the substrate without the projection lens system and with a second nonsensitizing beam having a bandwidth broader than that of the first non-sensitizing beam, the second detection optical system producing second information related to the position of the mark; and a detector for detecting an error included in the first information, by using the first and second information.

摘要翻译： 投影曝光装置包括：投影透镜系统，用于通过使用敏化光束将原稿的图案的图像投影在具有感光层的基板上; 第一检测光学系统，用于通过投影透镜系统和第一非感光束检测基板的标记，第一检测光学系统产生与标记的位置相关的第一信息; 第二检测光学系统，用于在没有投影透镜系统的情况下检测基板的标记，并且具有比第一非敏感光束宽的带宽的第二非敏感光束，第二检测光学系统产生与位置相关的第二信息 标记; 以及用于通过使用第一和第二信息来检测包括在第一信息中的错误的检测器。

公开(公告)号：US5148214A

公开(公告)日：1992-09-15

申请号：US759953

申请日：1991-09-17

申请人： Masakatsu Ohta ,  Hideki Ina ,  Akiyoshi Suzuki

发明人： Masakatsu Ohta ,  Hideki Ina ,  Akiyoshi Suzuki

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/70 ,  G03F7/2002

摘要： A mark detecting device usable in an alignment and exposure apparatus for aligning an alignment mark of a mask with an alignment mark of a wafer and for exposing a resist layer provided on the surface of the wafer to a pattern of the mask with radiation. The device includes a system for detecting light from the wafer, the detecting system including a photodetecting device for detecting light and a wavelength selecting element disposed in a path of light from the wafer to the photodetecting device so as to allow introduction of light of a predetermined wavelength into the light path from outside the light path to illuminate the wafer, and a portion for forming a photoprint of the alignment mark of the mask in the resist layer provided on the surface of the wafer, the photoprint forming portion being arranged, for the formation of the photoprint, to direct, to the wafer, the light of the predetermined wavelength from the outside of the light path and by way of the mask and the wavelength selecting element, wherein the photodetecting device is effective to detect the light from the wafer to detect the alignment mark of the wafer and the photoprint of the alignment mark of the mask.

摘要翻译： 一种可用于对准和曝光装置的标记检测装置，用于将掩模的对准标记与晶片的对准标记对准，并且用于将设置在晶片表面上的抗蚀剂层暴露于具有辐射的掩模图案。 该装置包括用于检测来自晶片的光的系统，所述检测系统包括用于检测光的光检测装置和布置在从晶片到光电检测装置的光的路径中的波长选择元件，以便允许引入预定的 波长从光路外部的光路径照射晶片，以及用于形成在设置在晶片表面上的抗蚀剂层中的掩模的对准标记的照相印记的部分，所述照相印刷形成部分被布置为 形成照相印记，从光路的外部引导预定波长的光，并通过掩模和波长选择元件引导到晶片，其中光检测器件有效地检测来自晶片的光 以检测晶片的对准标记和掩模的对准标记的照相印刷。

公开(公告)号：US5133603A

公开(公告)日：1992-07-28

申请号：US735692

申请日：1991-07-23

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G03F9/00

CPC分类号： G03F9/7065

摘要： An observation device for use in observation of a first object and a second object onto which a pattern of the first object is to be projected, the observation device includes a light source; a polarization beam splitter provided between the light source and the first object, for receiving light from the light source and for directing the same to the first and second objects; a first phase converting element provided between the first and second objects, for changing the state of polarization of the light from the light source as incident on the first phase converting element; and a second phase converting element provided to be disposed or to be selectively disposed between the first object and the polarization beam splitter, for changing the state of polarization of reflection light from the first object as incident on the second phase converting element; wherein the first and second objects can be observed by detecting, through the polarization beam splitter, reflection light reflected by the second object ane passing through the first object or by detecting the reflection light and reflection light from the first object.

摘要翻译： 一种用于观察要投射第一物体的图案的第一物体和第二物体的观察装置，所述观察装置包括光源; 设置在光源和第一物体之间的偏振光束分离器，用于从光源接收光并将其引导到第一和第二物体; 设置在第一和第二物体之间的第一相位转换元件，用于当入射在第一相位转换元件上时改变来自光源的光的偏振状态; 以及第二相位转换元件，被设置为选择性地设置在所述第一物体和所述偏振光束分离器之间，用于改变入射在所述第二相位转换元件上的来自所述第一物体的反射光的偏振状态; 其中可以通过偏振分束器检测由第二物体通过第一物体反射的反射光或通过检测来自第一物体的反射光和反射光来观察第一和第二物体。

公开(公告)号：US4834540A

公开(公告)日：1989-05-30

申请号：US69225

申请日：1987-07-02

申请人： Masao Totsuka ,  Akiyoshi Suzuki ,  Hideki Ina

发明人： Masao Totsuka ,  Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G01B11/00 ,  G01R31/308 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7076 ,  G01R31/308

摘要： A projection exposure apparatus for projecting a pattern, formed on a reticle, upon a wafer by way of a projection lens system is disclosed. The apparatus includes an alignment system wherein light is projected upon an alignment mark of the wafer by use of the projection lens system, and the light diffracted by an edge of the wafer alignment mark is guidingly directed from between the projection lens system and the wafer to a photoelectric detector without intervention of the projection lens system. From the photodetector, an alignment signal corresponding to the position of the wafer alignment mark is obtained and, on the basis of the alignment mark signal, the wafer and the reticle are brought into a predetermined positional relation. With the disclosed alignment system, the wafer alignment mark can be detected without being affected by a photoresist layer applied to the wafer surface, with the result that the reticle and the wafer can be aligned more accurately.

摘要翻译： 公开了一种用于通过投影透镜系统将形成在掩模版上的图案投射在晶片上的投影曝光装置。 该装置包括对准系统，其中通过使用投影透镜系统将光投射到晶片的对准标记上，并且由晶片对准标记的边缘衍射的光从投影透镜系统和晶片之间引导引导到 光电探测器，无需投影镜头系统的干预。 从光电检测器获得与晶片对准标记的位置对应的对准信号，并且基于对准标记信号，使晶片和标线片成为预定的位置关系。 利用公开的对准系统，可以检测晶片对准标记，而不受施加到晶片表面的光致抗蚀剂层的影响，结果可以更准确地对准标线片和晶片。

公开(公告)号：US4645924A

公开(公告)日：1987-02-24

申请号：US553123

申请日：1983-11-18

申请人： Akiyoshi Suzuki ,  Hideki Ina

发明人： Akiyoshi Suzuki ,  Hideki Ina

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01J3/14

CPC分类号： G03F9/7065 ,  G03F9/7069

摘要： An observation apparatus includes a laser beam source for producing a laser beam, a condensing optical system for constituting an optical path to condense the laser beam onto an object, a scanner for repeatedly scanning the object with the laser beam, an observation optical system for allowing an operator to observe the object, a photoreceptor for receiving the laser beam reflected by the object and producing an electric signal, a retractable refracting or diffusing optical element, across the condensing optical path, wherein the beam reflected by the object is detected by the photoreceptor when the object is scanned with the condensed laser beam, and the beam reflected by the object is observed through the observation optical system when the object is scanned with the diffused laser beam.

摘要翻译： 观察装置包括用于产生激光束的激光束源，用于构成用于将激光束冷凝到物体上的光路的聚光系统，用激光束重复扫描物体的扫描器，用于允许 用于观察物体的操作者，用于接收由物体反射的激光束并产生电信号的光感受器，横过聚光光路的可伸缩折射或漫射光学元件，其中被物体反射的光束由感光体检测 当用聚光激光束扫描物体时，当物体用漫射激光束扫描时，通过观察光学系统观察被物体反射的光束。

公开(公告)号：US08564761B2

公开(公告)日：2013-10-22

申请号：US12393767

申请日：2009-02-26

申请人： Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

发明人： Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

IPC分类号： G03B27/72

CPC分类号： G01B11/2441 ,  G01B9/02063 ,  G01B9/02072 ,  G01B9/0209 ,  G01B11/0608 ,  G01B2290/70 ,  G03F9/7026 ,  G03F9/7049

摘要： A surface shape measuring apparatus includes an illumination system and a light receiving system. The illumination system splits wide-band light from a light source into measurement light and reference light, illuminates the measurement light to obliquely enter a surface of the film, and illuminates the reference light to obliquely enter a reference mirror. The light receiving system combines the measurement light reflected by the surface of the film and the reference light reflected by the reference mirror with each other and introduces the combined light to a photoelectric conversion element. An incident angle of the measurement light upon the surface of the film and an incident angle of the reference light upon the reference mirror are each larger than the Brewster's angle. S-polarized light and p-polarized light included in the measurement light entering a surface of the substrate have equal intensity on the photoelectric conversion element.

摘要翻译： 表面形状测量装置包括照明系统和光接收系统。 照明系统将来自光源的宽带光分解为测量光和参考光，照射测量光以倾斜地进入胶片的表面，并照亮参考光以倾斜地进入参考镜。 光接收系统将由膜的表面反射的测量光与由参考反射镜反射的参考光相互组合，并将组合的光引入光电转换元件。 在薄膜表面上的测量光的入射角和参考反射镜上的参考光的入射角均大于布鲁斯特角。 入射到衬底表面的测量光中包括的S偏振光和p偏振光在光电转换元件上具有相等的强度。

公开(公告)号：US08414279B2

公开(公告)日：2013-04-09

申请号：US12562052

申请日：2009-09-17

申请人： Eigo Kawakami ,  Kazuyuki Kasumi ,  Hideki Ina

发明人： Eigo Kawakami ,  Kazuyuki Kasumi ,  Hideki Ina

IPC分类号： B29C43/22 ,  B29B17/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint apparatus molds resin dispensed on a shot region of a substrate with a mold and forms a pattern of resin on the shot region. The apparatus includes a mold stage configured to hold the mold, a substrate stage configured to hold the substrate, a drive mechanism configured to change a relative positional relationship between the mold stage and the substrate stage in an X-Y plane that defines a coordinate of the shot region and a Z-axis direction perpendicular to the X-Y plane, and a controller. The controller is configured to control the drive mechanism so that the mold and the shot region perform relative vibration, in the X-Y plane, with respect to a relative position where the mold and the shot region align, and a distance between the mold and the shot region decreases in the Z-axis direction in parallel with the vibration, and the resin is molded by the mold.

摘要翻译： 压印装置用模具模制分配在基板的注射区域上的树脂，并在注射区域上形成树脂图案。 该装置包括：模具台，其被配置为保持模具;衬底台架，其被配置为保持基板;驱动机构，其构造成在限定射击坐标的XY平面内改变模具台架和基板台架之间的相对位置关系 区域和垂直于XY平面的Z轴方向，以及控制器。 控制器被配置为控制驱动机构，使得模具和射击区域在XY平面中相对于模具和射击区域对准的相对位置以及模具和射击之间的距离执行相对振动 Z轴方向的区域与振动平行地减小，树脂由模具成型。

公开(公告)号：US07981304B2

公开(公告)日：2011-07-19

申请号：US12388179

申请日：2009-02-18

申请人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

发明人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

IPC分类号： C03C15/00

CPC分类号： B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

摘要： A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

摘要翻译： 该模具能够在将待固化的树脂材料设置在模具和待加工构件之间的状态下与要处理的构件高度准确地对准，并且由第一材料和对准构成的基板2010构成 标记2102由与第一材料不同的第二材料形成。 第一材料和第二材料在紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。

公开(公告)号：US20090286172A1

公开(公告)日：2009-11-19

申请号：US12465567

申请日：2009-05-13

申请人： Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi ,  Hideki Ina

发明人： Koichi Sentoku ,  Takahiro Matsumoto ,  Satoru Oishi ,  Hideki Ina

IPC分类号： G03F7/20 ,  G01B11/24 ,  G03B27/54

CPC分类号： G03B27/54 ,  G01B11/24 ,  G01J3/45 ,  G01J2003/1213 ,  G01J2003/1226 ,  G03F9/7003 ,  G03F9/7015 ,  G03F9/7026 ,  G03F9/7088

摘要： A surface shape measurement apparatus is configured to measure a surface shape of an object to be measured, and includes a beam splitter configured to split white light from a light source into two light beams, a pair of prisms each configured to increase an incident angle of each light beam that has been split by the beam splitter and directed to the object or a reference surface, each prism having an antireflection part that is formed at a period of a wavelength of the white light or smaller and has a moth-eye shape, a superimposition unit configured to superimpose object light from the object with reference light from the reference surface and has passed the second prism, and to generate white interference light, and a Lyot filter configured to discretely separate the white interference light for each of a plurality of wavelengths.

摘要翻译： 表面形状测量装置被配置为测量待测物体的表面形状，并且包括：分束器，被配置为将来自光源的白光分成两束光束;一对棱镜，每个棱镜被配置为增加入射角 已经被分束器分离并被引导到物体或参考表面的每个光束，每个棱镜具有在白色光的波长或更小的周期形成并具有蛾眼形状的抗反射部分， 叠加单元，被配置为用来自所述参考表面的参考光叠加来自所述物体的物体光并且已经通过所述第二棱镜，并且产生白色干涉光;以及Lyot滤波器，其被配置为离散地分离所述白色干涉光， 波长。

公开(公告)号：US20090283938A1

公开(公告)日：2009-11-19

申请号：US12509996

申请日：2009-07-27

申请人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

发明人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

IPC分类号： B29C59/16 ,  B29C35/08

CPC分类号： G03F7/0002 ,  B29C35/08 ,  B29C59/16 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G03F9/703 ,  G03F9/7042 ,  G03F9/7065

摘要： An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

摘要翻译： 用于将模具图案压印到基板或基板上的部件上的压印装置包括用于照射与基板相对设置的模具表面和基板的表面的光源; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。 分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。