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    Reconfigurable logic circuit
    11.
    发明授权
    Reconfigurable logic circuit 有权
    可重构逻辑电路

    公开(公告)号：US07796423B2

    公开(公告)日：2010-09-14

    申请号：US12339638

    申请日：2008-12-19

    申请人： Hideyuki Sugiyama ,  Mizue Ishikawa ,  Tomoaki Inokuchi ,  Yoshiaki Saito ,  Tetsufumi Tanamoto

    发明人： Hideyuki Sugiyama ,  Mizue Ishikawa ,  Tomoaki Inokuchi ,  Yoshiaki Saito ,  Tetsufumi Tanamoto

    IPC分类号： G11C11/00

    CPC分类号： H03K19/1733 ,  G11C11/161 ,  G11C11/1675 ,  G11C11/1697

    摘要： It is made possible to provide a reconfigurable logic circuit with which high integration can be achieved. A reconfigurable logic circuit includes: a multiplexer which includes a plurality of spin MOSFETs each having a source and drain containing a magnetic material, and a selecting portion including a plurality of MOSFETs and selecting a spin MOSFET from the plurality of spin MOSFETs, based on control data transmitted from control lines; a determining circuit which determines whether magnetization of the magnetic material of the source and drain of a selected spin MOSFET, which is selected by the selecting portion, is in a first state or in a second state; and a first and second write circuits which put the magnetization of the magnetic material of the source and drain of the selected spin MOSFET into the second and first states respectively by supplying a write current flowing between the source and drain of the selected spin MOSFET.

    摘要翻译： 可以提供可实现高集成度的可重构逻辑电路。 可重配置逻辑电路包括：多路复用器，其包括多个自旋MOSFET，每个具有包含磁性材料的源极和漏极，以及包括多个MOSFET的选择部分，并且基于控制从多个自旋MOSFET中选择自旋MOSFET 从控制线传输的数据; 确定电路，其确定由选择部分选择的所选择的自旋MOSFET的源极和漏极的磁性材料的磁化是处于第一状态还是处于第二状态; 以及第一和第二写入电路，其通过提供在选定的自旋MOSFET的源极和漏极之间流动的写入电流，将所选自旋MOSFET的源极和漏极的磁性材料的磁化分别置于第二和第一状态。

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    12.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号：US20120168838A1

    公开(公告)日：2012-07-05

    申请号：US13419947

    申请日：2012-03-14

    申请人： Takao MARUKAME ,  Mizue Ishikawa ,  Tomoaki Inokuchi ,  Hideyuki Sugiyama ,  Yoshiaki Saito

    发明人： Takao MARUKAME ,  Mizue Ishikawa ,  Tomoaki Inokuchi ,  Hideyuki Sugiyama ,  Yoshiaki Saito

    IPC分类号： H01L29/772 ,  H01L21/336

    CPC分类号： H01L29/66984 ,  H01L21/823814 ,  H01L21/84 ,  H01L21/845 ,  H01L29/41766 ,  H01L29/456 ,  H01L29/49 ,  H01L29/66075

    摘要： A semiconductor device according to an embodiment includes: a semiconductor layer; source and drain regions in the semiconductor layer; a magnetic metal semiconductor compound film on each of the source and drain regions, the magnetic metal semiconductor compound film including the same semiconductor as a semiconductor of the semiconductor layer and a magnetic metal; a gate insulating film on the semiconductor layer between the source region and the drain region; a gate electrode on the gate insulating film; a gate sidewall formed at a side portion of the gate electrode, the gate sidewall being made of an insulating material; a film stack formed on the magnetic metal semiconductor compound film on each of the source and drain regions, the film stack including a magnetic layer; and an oxide layer formed on the gate sidewall, the oxide layer containing the same element as an element in the film stack.

    摘要翻译： 根据实施例的半导体器件包括：半导体层; 半导体层中的源极和漏极区域; 在源极和漏极区域中的每一个上的磁性金属半导体化合物膜，包括与半导体层的半导体相同的半导体的磁性金属半导体化合物膜和磁性金属; 源极区域和漏极区域之间的半导体层上的栅极绝缘膜; 栅极绝缘膜上的栅电极; 栅极侧壁，其形成在所述栅电极的侧部，所述栅极侧壁由绝缘材料制成; 在所述源极和漏极区域中的每一个上形成在所述磁性金属半导体化合物膜上的膜堆叠，所述膜堆叠包括磁性层; 以及形成在栅极侧壁上的氧化物层，所述氧化物层包含与膜堆叠中的元件相同的元件。

    Spin MOSFET and reconfigurable logic circuit
    13.
    发明授权
    Spin MOSFET and reconfigurable logic circuit 有权
    旋转MOSFET和可重构逻辑电路

    公开(公告)号：US08026561B2

    公开(公告)日：2011-09-27

    申请号：US12725561

    申请日：2010-03-17

    申请人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa

    发明人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa

    IPC分类号： H01L21/02

    CPC分类号： H01L43/02 ,  B01D53/1493 ,  B01D53/62 ,  G11C11/16 ,  G11C11/161 ,  G11C11/1673 ,  G11C11/1675 ,  G11C11/1695 ,  H01L28/00 ,  H01L29/0843 ,  H01L29/0895 ,  H01L29/66984 ,  H01L43/10

    摘要： A spin MOSFET includes: a first ferromagnetic layer provided on an upper face of a semiconductor substrate, and having a fixed magnetization direction perpendicular to a film plane; a semiconductor layer provided on an upper face of the first ferromagnetic layer, including a lower face opposed to the upper face of the first ferromagnetic layer, an upper face opposed to the lower face, and side faces different from the lower face and the upper face; a second ferromagnetic layer provided on the upper face of the semiconductor layer, and having a variable magnetization direction perpendicular to a film plane; a first tunnel barrier provided on an upper face of the second ferromagnetic layer; a third ferromagnetic layer provided on an upper face of the first tunnel barrier; a gate insulating film provided on the side faces of the semiconductor layer; and a gate electrode provided on the side faces of the semiconductor layer with the gate insulating film being interposed therebetween.

    摘要翻译： 自旋MOSFET包括：设置在半导体衬底的上表面上并且具有与膜平面垂直的固定磁化方向的第一铁磁层; 设置在所述第一铁磁层的上表面上的半导体层，包括与所述第一铁磁层的上表面相对的下表面，与所述下表面相对的上表面，以及与所述下表面和所述上表面不同的侧面 ; 第二铁磁层，设置在所述半导体层的上表面上，并且具有与膜平面垂直的可变磁化方向; 设置在所述第二铁磁层的上表面上的第一隧道势垒; 设置在所述第一隧道屏障的上表面上的第三铁磁层; 设置在所述半导体层的侧面上的栅极绝缘膜; 以及设置在半导体层的侧面上的栅电极，其间插入有栅极绝缘膜。

    SPIN MOSFET AND RECONFIGURABLE LOGIC CIRCUIT USING THE SPIN MOSFET
    15.
    发明申请
    SPIN MOSFET AND RECONFIGURABLE LOGIC CIRCUIT USING THE SPIN MOSFET 有权
    旋转MOSFET和使用旋转MOSFET的可重新配置的逻辑电路

    公开(公告)号：US20100019798A1

    公开(公告)日：2010-01-28

    申请号：US12486999

    申请日：2009-06-18

    申请人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Mizue Ishikawa ,  Takao Marukame

    发明人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Mizue Ishikawa ,  Takao Marukame

    IPC分类号： H03K19/0944 ,  H01L29/00

    CPC分类号： H01L29/66984 ,  B82Y25/00 ,  H01F10/3272 ,  H01F10/3286

    摘要： It is made possible to provide a spin MOSFET that can minimize the increase in production costs and can perform both spin injection writing and reading. A spin MOSFET includes: a substrate that has a semiconductor region of a first conductivity type; first and second ferromagnetic stacked films that are formed at a distance from each other on the semiconductor region, and each have the same stacked structure comprising a first ferromagnetic layer, a nonmagnetic layer, and a second ferromagnetic layer stacked in this order, the second ferromagnetic stacked film having a film-plane area different from that of the first ferromagnetic stacked film; a gate insulating film that is formed on a portion of the semiconductor region, the portion being located between the first ferromagnetic stacked film and the second ferromagnetic stacked film; and a gate that is formed on the gate insulating film.

    摘要翻译： 可以提供一种可以使生产成本增加最小化的自旋MOSFET，并且可以执行自动注入写入和读取两种操作。 自旋MOSFET包括：具有第一导电类型的半导体区域的衬底; 第一和第二铁磁层叠膜，其形成在半导体区域上彼此间隔一定距离处，并且各自具有包括依次层叠的第一铁磁层，非磁性层和第二铁磁层的相同层叠结构，第二铁磁体 具有与第一铁磁性层叠膜不同的膜面积的层叠膜; 形成在所述半导体区域的一部分上的所述栅绝缘膜，所述栅极绝缘膜位于所述第一铁磁层叠膜和所述第二铁磁性堆叠膜之间; 以及形成在栅极绝缘膜上的栅极。

    SPIN MOSFET AND RECONFIGURABLE LOGIC CIRCUIT
    17.
    发明申请
    SPIN MOSFET AND RECONFIGURABLE LOGIC CIRCUIT 有权
    旋转MOSFET和可重新配置的逻辑电路

    公开(公告)号：US20120019283A1

    公开(公告)日：2012-01-26

    申请号：US13228852

    申请日：2011-09-09

    申请人： Yoshiaki SAITO ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa

    发明人： Yoshiaki SAITO ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa

    IPC分类号： H03K19/173 ,  H01L29/82

    CPC分类号： H01L43/02 ,  B01D53/1493 ,  B01D53/62 ,  G11C11/16 ,  G11C11/161 ,  G11C11/1673 ,  G11C11/1675 ,  G11C11/1695 ,  H01L28/00 ,  H01L29/0843 ,  H01L29/0895 ,  H01L29/66984 ,  H01L43/10

    摘要： A spin MOSFET includes: a first ferromagnetic layer provided on a semiconductor substrate, and having a fixed magnetization direction perpendicular to a film plane; a semiconductor layer provided on the first ferromagnetic layer, including a lower face opposed to the upper face of the first ferromagnetic layer, an upper face opposed to the lower face, and side faces different from the lower and upper faces; a second ferromagnetic layer provided on the upper face of the semiconductor layer, and having a variable magnetization direction perpendicular to a film plane; a first tunnel barrier provided on the second ferromagnetic layer; a third ferromagnetic layer provided on the first tunnel barrier; a gate insulating film provided on the side faces of the semiconductor layer; and a gate electrode provided on the side faces of the semiconductor layer with the gate insulating film being interposed therebetween.

    摘要翻译： 自旋MOSFET包括：设置在半导体衬底上并具有与膜平面垂直的固定磁化方向的第一铁磁层; 设置在所述第一铁磁层上的半导体层，包括与所述第一铁磁层的上表面相对的下表面，与所述下表面相对的上表面，以及与所述下表面和所述上表面不同的侧面; 第二铁磁层，设置在所述半导体层的上表面上，并且具有与膜平面垂直的可变磁化方向; 设置在第二铁磁层上的第一隧道势垒; 设置在第一隧道屏障上的第三铁磁层; 设置在所述半导体层的侧面上的栅极绝缘膜; 以及设置在半导体层的侧面上的栅电极，其间插入有栅极绝缘膜。

    Spin transistor, integrated circuit, and magnetic memory
    19.
    发明授权
    Spin transistor, integrated circuit, and magnetic memory 有权
    旋转晶体管，集成电路和磁存储器

    公开(公告)号：US08618590B2

    公开(公告)日：2013-12-31

    申请号：US12561475

    申请日：2009-09-17

    申请人： Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa ,  Hideyuki Sugiyama ,  Yoshiaki Saito

    发明人： Tomoaki Inokuchi ,  Takao Marukame ,  Mizue Ishikawa ,  Hideyuki Sugiyama ,  Yoshiaki Saito

    IPC分类号： H01L21/02 ,  G11C11/14

    CPC分类号： H01L29/66984 ,  G11C11/161 ,  G11C11/1673 ,  G11C11/1675 ,  G11C11/1693

    摘要： A spin transistor includes a first ferromagnetic layer, a second ferromagnetic layer, a semiconductor layer between the first and second ferromagnetic layers, and a gate electrode on or above a surface of the semiconductor layer, the surface being between the first and second ferromagnetic layers. The first ferromagnetic layer comprises a ferromagnet which has a first minority spin band located at a high energy side and a second minority spin band located at a low energy side, and has a Fermi level in an area of the high energy side higher than a middle of a gap between the first and second minority spin bands.

    摘要翻译： 自旋晶体管包括第一铁磁层，第二铁磁层，第一和第二铁磁层之间的半导体层，以及在半导体层的表面上或上方的栅电极，该表面位于第一和第二铁磁层之间。 第一铁磁层包括具有位于高能侧的第一少数自旋带和位于低能侧的第二少数自旋带的铁磁体，并且在高能量侧的区域中的费米能级高于中间 第一和第二少数自旋带之间的间隙。

    Spin MOSFET and reconfigurable logic circuit using the spin MOSFET
    20.
    发明授权
    Spin MOSFET and reconfigurable logic circuit using the spin MOSFET 有权
    使用自旋MOSFET的Spin MOSFET和可重构逻辑电路

    公开(公告)号：US08487359B2

    公开(公告)日：2013-07-16

    申请号：US12486999

    申请日：2009-06-18

    申请人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Mizue Ishikawa ,  Takao Marukame

    发明人： Yoshiaki Saito ,  Hideyuki Sugiyama ,  Tomoaki Inokuchi ,  Mizue Ishikawa ,  Takao Marukame

    IPC分类号： H01L27/108

    CPC分类号： H01L29/66984 ,  B82Y25/00 ,  H01F10/3272 ,  H01F10/3286

    摘要： It is made possible to provide a spin MOSFET that can minimize the increase in production costs and can perform both spin injection writing and reading. A spin MOSFET includes: a substrate that has a semiconductor region of a first conductivity type; first and second ferromagnetic stacked films that are formed at a distance from each other on the semiconductor region, and each have the same stacked structure comprising a first ferromagnetic layer, a nonmagnetic layer, and a second ferromagnetic layer stacked in this order, the second ferromagnetic stacked film having a film-plane area different from that of the first ferromagnetic stacked film; a gate insulating film that is formed on a portion of the semiconductor region, the portion being located between the first ferromagnetic stacked film and the second ferromagnetic stacked film; and a gate that is formed on the gate insulating film.

    摘要翻译： 可以提供一种可以使生产成本增加最小化的自旋MOSFET，并且可以执行自动注入写入和读取两种操作。 自旋MOSFET包括：具有第一导电类型的半导体区域的衬底; 第一和第二铁磁层叠膜，其形成在半导体区域上彼此间隔一定距离处，并且各自具有包括依次层叠的第一铁磁层，非磁性层和第二铁磁层的相同层叠结构，第二铁磁体 具有与第一铁磁性层叠膜不同的膜面积的层叠膜; 形成在所述半导体区域的一部分上的所述栅绝缘膜，所述栅极绝缘膜位于所述第一铁磁层叠膜和所述第二铁磁性堆叠膜之间; 以及形成在栅极绝缘膜上的栅极。