公开(公告)号：US20070085033A1

公开(公告)日：2007-04-19

申请号：US11243363

申请日：2005-10-03

Applicant: Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

IPC: G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract translation: 电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。 在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半 在写平面处电子束对着的角度。 光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。 还描述了用于电子束柱的多功能模块。

公开(公告)号：US07763866B2

公开(公告)日：2010-07-27

申请号：US10576547

申请日：2004-10-19

Applicant: Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

Inventor： Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC: G21K5/00

CPC classification number: H01J37/09 ,  H01J2237/0455

Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

Abstract translation: 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 30）阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），第一装置（24）用于移动第一构件（20）以调整 带电粒子束（7）的阻挡的第一部分（7a）的尺寸以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US20100320382A1

公开(公告)日：2010-12-23

申请号：US12528307

申请日：2008-02-22

Applicant: Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

Inventor： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC: G01N23/00 ,  H01J37/147

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

Abstract: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

Abstract translation: 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US08294096B2

公开(公告)日：2012-10-23

申请号：US13089059

申请日：2011-04-18

Applicant: Helmut Banzhof

Inventor： Helmut Banzhof

IPC: G21K1/08 ,  G01N23/00

CPC classification number: H01J37/28 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2809 ,  H01J2237/2814

Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.

Abstract translation: 提供带电粒子束装置，包括：带电粒子束源，适于在轴上产生带电粒子束; 光学像差校正装置和物镜装置，其限定校正后的光束孔径角度，以减小衍射; 和带电粒子束倾斜装置; 其中所述光学像差校正装置和所述物镜装置适于为所述带电粒子束提供小于校正的光束孔径角的光束孔径角; 并且其中所述带电粒子束倾斜装置适于提供等于或小于所述校正光束孔径角的光束倾斜角度。 此外，提供了一种操作带电粒子束装置的方法。

公开(公告)号：US08164067B2

公开(公告)日：2012-04-24

申请号：US12701463

申请日：2010-02-05

Applicant: Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

Inventor： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

IPC: G01N23/22 ,  G01N23/00

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2446

Abstract: It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

Abstract translation: 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

公开(公告)号：US20070257207A1

公开(公告)日：2007-11-08

申请号：US10576547

申请日：2004-10-19

Applicant: Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

Inventor： Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J2237/0455

Abstract: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

Abstract translation: 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 （30）阻挡所述带电粒子束源（5）和所述聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），用于移动所述第一构件（20）的第一装置（24） 以调节带电粒子束（7）的阻塞的第一部分（7a）的尺寸，以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US07282711B2

公开(公告)日：2007-10-16

申请号：US10491939

申请日：2002-10-04

Applicant: Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

Inventor： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

IPC: H01J37/21

CPC classification number: H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

Abstract: The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

Abstract translation: 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。