公开(公告)号：US07282711B2

公开(公告)日：2007-10-16

申请号：US10491939

申请日：2002-10-04

申请人： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

发明人： Dieter Winkler ,  Pavel Adamec ,  Achim Göhl ,  Helmut Banzhof

IPC分类号： H01J37/21

CPC分类号： H01J37/28 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/216 ,  H01J2237/2446 ,  H01J2237/2826 ,  H01J2237/30433 ,  H01J2237/3045

摘要： The invention provides electron multiple beam devices (1) for probing or structuring a non-transparent specimen (20) with primary electron beams (14) with an array of electron beam sources (3) to generate multiple primary electron beams (14), an electron sensor (12) with electron sensor segments (12a) to detect electrons of the primary electron beams (14) and at least one anode (7) to direct the primary electron beams (14) towards the electron sensor (12). The electron sensor (12) serves to inspect the primary electron beams (14), calibrate the positions of the primary electron beams (14) and possibly adjust final focus length (13) and currents of the primary electron beams before or after a probing or structuring the upper surface (20a) of a non-transparent specimens (20). Further, methods to inspect primary electron beams (14), to adjust final focus lengths (13) and to calibrate the multiple electron beam device (1) are provided.

摘要翻译： 本发明提供了用于用具有电子束源阵列（3）的一次电子束（14）探测或构造非透明样品（20）以产生多个一次电子束（14）的电子多光束装置（1）， 电子传感器（12），其具有用于检测一次电子束（14）的电子和至少一个阳极（7）的电子传感器段（12a），以将一次电子束（14）引向电子传感器（12）。 电子传感器（12）用于检查一次电子束（14），校准一次电子束（14）的位置，并可能在探测之前或之后校准一次电子束的最终聚焦长度（13）和电流 构造不透明样品（20）的上表面（20a）。 此外，提供了检查一次电子束（14），调整最终聚焦长度（13）和校准多个电子束装置（1）的方法。

公开(公告)号：US09153413B2

公开(公告)日：2015-10-06

申请号：US12528307

申请日：2008-02-22

申请人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

发明人： Gilad Almogy ,  Avishai Bartov ,  Juergen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC分类号： G21K7/00 ,  H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US20110163229A1

公开(公告)日：2011-07-07

申请号：US12528306

申请日：2008-02-22

申请人： Juergen Frosien ,  Helmut Banzhof ,  Pavel Adamec

发明人： Juergen Frosien ,  Helmut Banzhof ,  Pavel Adamec

IPC分类号： G01N23/225 ,  G01N23/227 ,  G01N23/22 ,  G01N23/203 ,  H01J1/50

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A scanning charged particle beam device (100) is described. The scanning charged particle beam device includes a beam emitter (102) for emitting a primary electron beam, a first scan stage for scanning the beam over a specimen, an achromatic beam separator (130) adapted for separating a signal electron beam from the primary electron beam, and a detection unit (172,174,178) for detecting signal electrons.

摘要翻译： 描述扫描带电粒子束装置（100）。 扫描带电粒子束装置包括用于发射一次电子束的射束发射器（102），用于扫描试样上的束的第一扫描级，适于从一次电子分离信号电子束的消色束分离器（130） 以及用于检测信号电子的检测单元（172,174,178）。

公开(公告)号：US20100320382A1

公开(公告)日：2010-12-23

申请号：US12528307

申请日：2008-02-22

申请人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

发明人： Gilad Almogy ,  Avishai Bartov ,  Jürgen Frosien ,  Pavel Adamec ,  Helmut Banzhof

IPC分类号： G01N23/00 ,  H01J37/147

CPC分类号： H01J37/05 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/0635 ,  H01J2237/1508 ,  H01J2237/2449 ,  H01J2237/2817

摘要： A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

摘要翻译： 描述了多光束扫描电子束装置（100）。 具有列的多头扫描电子束装置包括用于发射多个电子束（12,13,14）的多光束发射器（110），至少一个共同的电子束光学元件（130） 用于多个电子束中的至少两个的开口，并适用于共同影响多个电子束中的至少两个，用于单独影响多个电子束的至少一个单独的电子束光学元件（140），共同的目标 透镜组件（150），用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束，并且适于将多个电子束聚焦到样本（20）上以产生多个信号 光束（121,131,141）和检测组件（170），用于分别检测相应检测元件上的每个信号光束。

公开(公告)号：US08164067B2

公开(公告)日：2012-04-24

申请号：US12701463

申请日：2010-02-05

申请人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

发明人： Pavel Adamec ,  Helmut Banzhof ,  Ivo Liska

IPC分类号： G01N23/22 ,  G01N23/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2446

摘要： It is provided a charged particle beam device for inspecting a specimen, comprising a charged particle beam source adapted to generate a primary charged particle beam; an objective lens device adapted to direct the primary charged particle beam onto the specimen; and a detector device comprising one or more charged particle detectors adapted to detect a secondary charged particle beam generated by the primary charged particle beam at the specimen and passing through the objective lens device, the secondary charged particle beam comprising a first group of secondary charged particles starting from the specimen with high starting angles and a second group of secondary charged particles starting from the specimen with low starting angles; wherein at least one of the charged particle detectors is adapted to detect depending on the starting angles one group of the first and the second groups of secondary charged particles.

摘要翻译： 提供了一种用于检查样本的带电粒子束装置，包括适于产生初级带电粒子束的带电粒子束源; 适于将初级带电粒子束引导到样本上的物镜装置; 以及检测器装置，其包括一个或多个带电粒子检测器，其适于检测在所述样本处由所述初级带电粒子束产生的并通过所述物镜装置的次级带电粒子束，所述次级带电粒子束包括第一组次级带电粒子 从具有较高起始角度的样品开始，第二组二次带电粒子从起始角低的样品开始; 其中所述带电粒子检测器中的至少一个适于根据起始角度检测一组第一和第二组次级带电粒子。

公开(公告)号：US07268361B2

公开(公告)日：2007-09-11

申请号：US10483114

申请日：2002-07-01

申请人： Pavel Adamec ,  Dieter Winkler

发明人： Pavel Adamec ,  Dieter Winkler

IPC分类号： H01L29/06 ,  H01L21/00

CPC分类号： H01J1/3044 ,  H01J2201/319

摘要： The invention provides an electron beam device 1 comprising at least one field emission cathode 3 and at least one extracting electrode 5, whereby the field emission cathode 5 comprises a p-type semiconductor region 7 connected to an emitter tip 9 made of a semiconductor material, an n-type semiconductor region 11 forming a pn-diode junction 13 with the p-type semiconductor region 7 a first electric contact 15 on the p-type semiconductor region 7 and a second electric contact 17 on the n-type semiconductor region 11. The p-type semiconductor region 7 prevents the flux of free electrons to the emitter unless electrons are injected into the p-type semiconductor region 7 by the pn-diode junction 13. This way, the field emission cathode 3 can generate an electron beam where the electron beam current is controlled by the forward biasing second voltage V2 across the pn-diode junction. Such electron beam current has an improved current value stability. In addition the electron beam current does not have to be stabilized anymore by adjusting, the voltage between emitter tip 9 and extracting electrode 5 which would interfere with the electric field of electron beam optics. The present invention further provides the field emission cathode as described above and an array of field emission cathodes. The invention further provides a method to generate at least one electron beam.

摘要翻译： 本发明提供一种包括至少一个场发射阴极3和至少一个提取电极5的电子束装置1，由此场发射阴极5包括连接到由半导体材料制成的发射极尖端9的p型半导体区域7， 在p型半导体区域7上形成p型二极管结13的n型半导体区域11，p型半导体区域7上的第一电接触15和n型半导体区域11上的第二电接触17。 p型半导体区域7防止自由电子束流到发射极，除非电子被pn二极管结13注入到p型半导体区域7中。这样，场发射阴极3可以产生电子束，其中 电子束电流由跨越pn二极管结的正向偏置第二电压V 2控制。 这种电子束电流具有改善的电流值稳定性。 此外，电子束电流不必通过调节发射极尖端9和提取电极5之间的电压，这将干扰电子束光学器件的电场。 本发明还提供如上所述的场致发射阴极和场发射阴极阵列。 本发明还提供了一种产生至少一个电子束的方法。

公开(公告)号：US20060192145A1

公开(公告)日：2006-08-31

申请号：US11396751

申请日：2006-04-03

申请人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

发明人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

IPC分类号： G21G5/00

CPC分类号： H01J37/285 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/049 ,  H01J2237/2855 ,  H01J2237/2857

摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam resulting in a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

摘要翻译： 提供一种带电粒子束装置，其包括用于产生带电粒子的一次束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主束的准直之间切换，导致 适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度;用于聚集所述带电粒子的一次束的聚光透镜;用于偏转所述主要束带电的扫描装置 颗粒，用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。 此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。

公开(公告)号：US07638777B2

公开(公告)日：2009-12-29

申请号：US10564752

申请日：2004-05-17

申请人： Hans-Peter Feuerbaum ,  Jürgen Frosien ,  Uli Hoffmann ,  Dieter Winkler ,  Pavel Adamec

发明人： Hans-Peter Feuerbaum ,  Jürgen Frosien ,  Uli Hoffmann ,  Dieter Winkler ,  Pavel Adamec

IPC分类号： H01J1/50

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/047 ,  H01J2237/0635

摘要： The present invention provides a charged particle beam device. The device comprises an emitter array for emitting a plurality of charged particle beams. The plurality of charged particle beams are imaged with a lens. An electrode unit is provided for accelerating the plurality of charged particle beams. The potential differences between a first potential of the emitter array, a second potential of the electrode unit, and a third potential of a specimen, are controlled by a first control unit and a second control unit. Thereby, the second potential is capable of accelerating the plurality of charged particle beams with respect to the first potential, and the third potential is capable of decelerating the plurality of charged particle beams with respect to the second potential.

摘要翻译： 本发明提供一种带电粒子束装置。 该装置包括用于发射多个带电粒子束的发射极阵列。 多个带电粒子束用透镜成像。 提供电极单元用于加速多个带电粒子束。 第一控制单元和第二控制单元控制发射极阵列的第一电位与电极单元的第二电位和第三电位之间的电位差。 因此，第二电位能够相对于第一电位加速多个带电粒子束，并且第三电位能够使多个带电粒子束相对于第二电位减速。

公开(公告)号：US06943349B2

公开(公告)日：2005-09-13

申请号：US10258869

申请日：2001-04-27

申请人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

发明人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

IPC分类号： G01Q30/02 ,  H01J37/04 ,  H01J37/09 ,  H01J37/26 ,  G21K1/08 ,  G01N23/00 ,  H01J3/14 ,  H01J37/28

CPC分类号： H01J37/04 ,  H01J37/09 ,  H01J37/266

摘要： The present invention provides an improved column for a charged particle beam device. The column comprises an aperture plate having multiple apertures to produce multiple beams of charged particles and a deflector to influence the beams of charged particles so that each beam appears to come from a different source. Furthermore, an objective lens is used in order to focus the charged-particle beams onto the specimen. Due to the deflector, multiple images of the source are created on the surface of the specimen whereby all the images can be used for parallel data acquisition. Accordingly, the speed of data acquisition is increased. With regard to the focusing properties of the objective lens, the beams of charged particles can basically be treated as independent particle beams which do not negatively affect each other. Accordingly, each beam basically provides the same resolution as the beam of a conventional charged particle beam device.

摘要翻译： 本发明提供了一种用于带电粒子束装置的改进的柱。 柱包括具有多个孔的孔板，以产生多个带电粒子束和偏转器，以影响带电粒子束，使得每个束似乎来自不同的源。 此外，使用物镜以将带电粒子束聚焦到样本上。 由于偏转器，在样品的表面上产生了源的多个图像，从而所有图像可以用于并行数据采集。 因此，数据采集的速度增加。 关于物镜的聚焦特性，带电粒子束基本上可以被视为不会相互影响的独立的粒子束。 因此，每个光束基本上提供与常规带电粒子束装置的光束相同的分辨率。

公开(公告)号：US07045781B2

公开(公告)日：2006-05-16

申请号：US10759392

申请日：2004-01-16

申请人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

发明人： Pavel Adamec ,  Ralf Degenhardt ,  Hans-Peter Feuerbaum ,  Harry Munack ,  Dieter Winkler

IPC分类号： H01J37/28

CPC分类号： H01J37/285 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/049 ,  H01J2237/2855 ,  H01J2237/2857

摘要： A charged particle beam apparatus is provided which comprises a charged particle source for producing a primary beam of charged particles, aperture means for collimating said primary beam of charged particles, wherein said aperture means is adapted to switch between a collimation of said primary beam to a width appropriate for serial imaging of a sample as well as a collimation of said primary beam to a width appropriate for parallel imaging of said sample, a condenser lens for condensing said primary beam of charged particles, scanning means for deflecting said primary beam of charged particles, an objective lens for focusing said condensed primary beam, a sectorized detector for detecting a secondary charged particles. Also, several different operation modes of the beam apparatus are described allowing for serial imaging as well as parallel imaging.

摘要翻译： 提供一种带电粒子束装置，其包括用于产生带电粒子的主束的带电粒子源，用于准直所述带电粒子的一次束的孔径装置，其中所述孔口装置适于在所述主光束的准直之间切换 适合于样本的串行成像的宽度以及所述主光束的准直到适合于所述样品的平行成像的宽度，用于聚集所述带电粒子的一次束的聚光透镜，用于偏转所述带电粒子的一次束的扫描装置 用于聚焦所述冷凝的主光束的物镜，用于检测次级带电粒子的扇形检测器。 此外，描述了束装置的几种不同的操作模式，允许串行成像以及平行成像。