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42 条记录 (耗时 0.024 秒)

    Masked curing catalyst for acid-curable compositions
    11.
    发明授权
    Masked curing catalyst for acid-curable compositions 失效
    用于酸可固化组合物的掩蔽固化催化剂

    公开(公告)号：US4636575A

    公开(公告)日：1987-01-13

    申请号：US682451

    申请日：1984-12-17

    申请人： Rudolf Kirchmayr

    发明人： Rudolf Kirchmayr

    IPC分类号： C08K5/42 ,  C07C143/68

    CPC分类号： C08K5/42 ,  Y10S260/38

    摘要： Compounds of formula II and X ##STR1## wherein X is O, S, SO.sub.2, methylene, isopropylidene or NCOR.sub.7 where R.sub.7 is alkyl or phenyl, Y is a direct bond or methylene, n is 1 or 2, R.sub.4 is alkyl, phenyl, naphthyl, cycloalkyl, aralkyl, camphoryl, CF.sub.3, CCl.sub.3, F or NH.sub.2 ; or is alkylene, phenylene or naphthylene, R.sub.5 is hydrogen or halogen, R.sub.6 is hydrogen, alkyl, phenyl or cyano, R.sub.8 is substituted phenyl, substituted naphthyl, anthryl or phenanthryl, R.sub.9 is alkyl R.sub.10 is alkyl or substituted phenyl, and R.sub.11 is alkyl, substituted phenyl, naphthyl, camphoryl, alkylene, phenylene or naphthylene, are latent curing catalysts for acid-curable stoving lacquers. They are distinguished by satisfactory solubility in the acid-curable resin systems, can be stored virtually indefinitely in the dark and, when exposed to shortwave light, make it possible to cure the resins by acid catalysts at a relatively low temperature.

    摘要翻译： 式II和X的化合物其中X是O，S，SO 2，亚甲基，异亚丙基或NCOR 7，其中R 7是烷基或苯基，Y是直接键或亚甲基，n是1或2 R 4是烷基，苯基，萘基，环烷基，芳烷基，樟脑基，CF 3，CCl 3，F或NH 2; 或是亚烷基，亚苯基或亚萘基，R5是氢或卤素，R6是氢，烷基，苯基或氰基，R8是取代的苯基，取代的萘基，蒽基或菲基，R9是烷基，R10是烷基或取代的苯基，R11是烷基 取代的苯基，萘基，樟脑基，亚烷基，亚苯基或亚萘基是用于酸可固化烘烤漆的潜在固化催化剂。 它们的特征在于在酸可固化的树脂体系中具有令人满意的溶解性，可以在黑暗中实际上无限期地储存，并且当暴露于短波光时，可以在较低的温度下通过酸催化剂固化树脂。

    1,2-Oxaphospholanes
    18.
    发明授权
    1,2-Oxaphospholanes 失效
    1,2-氧磷杂环己烷

    公开(公告)号：US4045518A

    公开(公告)日：1977-08-30

    申请号：US615455

    申请日：1975-09-22

    申请人： Helmut Zondler ,  Emil Saladin ,  Rudolf Kirchmayr

    发明人： Helmut Zondler ,  Emil Saladin ,  Rudolf Kirchmayr

    IPC分类号： C07F9/40 ,  C07F9/6571 ,  C08K5/5357 ,  C07F9/15 ,  C08K5/53

    CPC分类号： C08K5/5357 ,  C07F9/4006 ,  C07F9/657181

    摘要： 2-Oxo-2-alkoxy-5-dialkylphosphono-1,2-oxaphospholanes of the formula ##STR1## in which R.sub.1 to R.sub.7 are hydrocarbon radicals can be prepared from .alpha.,.beta.-unsaturated ketones and 2 or more moles of a dialkyl phosphite. Obviously .alpha.-ketophosphonates are intermediates of this reaction, as these compounds react with 1 or more moles of dialkyl phosphite in yielding the oxaphospholanes too. Both reactions are promoted by alkaline catalysts.The new oxaphospholane derivatives are considerably stable against thermal decomposition. They are compatible with polymeric materials and can be used as flame protecting agent for plastics and resins, for example, in polyurethane foams.

    摘要翻译： 其中R 1至R 7为烃基的式“IMAGE”的2-氧代-2-烷氧基-5-二烷基膦酰基-1,2-氧代磷杂环戊烷可以由α，β-不饱和酮和2或更多摩尔的亚磷酸二烷基酯制备 。 显然，α-酮膦酸盐是该反应的中间体，因为这些化合物也与1摩尔或更多摩尔的亚磷酸二烷基酯反应，产生氧代山梨醇。 两种反应均由碱性催化剂促进。

    Propiophenone derivatives as photoinitiators for photopolymerization
    19.
    发明授权
    Propiophenone derivatives as photoinitiators for photopolymerization 失效
    用于光聚合的苯丙酮衍生物作为光引发剂

    公开(公告)号：US4795766A

    公开(公告)日：1989-01-03

    申请号：US880654

    申请日：1986-06-30

    申请人： Werner Rutsch ,  Rudolf Kirchmayr ,  Rinaldo Husler ,  Kurt Dietliker

    发明人： Werner Rutsch ,  Rudolf Kirchmayr ,  Rinaldo Husler ,  Kurt Dietliker

    IPC分类号： C08F2/00 ,  C07C45/00 ,  C07C45/71 ,  C07C49/175 ,  C07C49/35 ,  C07C49/577 ,  C07C49/83 ,  C07C49/84 ,  C07C67/00 ,  C07C313/00 ,  C07C323/22 ,  C07D309/12 ,  C07D317/26 ,  C07F7/18 ,  C08F2/50 ,  C08F4/00 ,  C09D4/00 ,  C09D5/00 ,  C09D11/00 ,  C09D11/10 ,  D21H19/20 ,  D21H19/24 ,  G03F7/031 ,  C07D317/72

    CPC分类号： G03F7/031 ,  C07C45/71 ,  C07C49/83 ,  C07C49/84 ,  C07D317/26 ,  C07F7/1852 ,  C08F2/50 ,  Y10S522/901

    摘要： Propiophenones of the formula I ##STR1## in which R.sup.1 is hydrogen or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, allyl or benzyl, R.sup.2 is hydrogen, C.sub.1 -C.sub.8 -alkyl, C.sub.1 -C.sub.4 -alkyl which is substituted by C.sub.1 -C.sub.4 -alkoxy or --OH, --(CH.sub.2 --CH.sub.2 --O).sub.n --R.sup.5 where n is 2 to 20 and R.sup.5 is H or C.sub.1 -C.sub.4 -alkyl, --Si(CH.sub.3).sub.3, benzyl, C.sub.3 -C.sub.6 -alkenyl, C.sub.3 -C.sub.4 -alkynyl or 2-tetrahydrofuranyl, or R.sup.1 and R.sup.2 together are a C.sub.1 -C.sub.6 -alkylidene radical or a C.sub.2 -C.sub.6 -alkylidene radical which is substituted by hydroxyl, C.sub.1 -C.sub.4 -alkoxy or phenyl, a linear or branched C.sub.2 -C.sub.6 -alkanediyl radical, a benzylidene, cyclopentylidene or cyclohexylidene radical or a 2,2,2-trichloroethylidene, 2-furylimethylidene or dimethylsilylidene radical, R.sup.3 is phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl, C.sub.1 -C.sub.4 -alkoxy or C.sub.1 -C.sub.4 -alkylthio radicals, and is also benzoylphenyl, phenoxyphenyl or phenylthiophenyl, R.sup.4 is C.sub.1 -C.sub.4 -alkyl, or phenyl which is unsubstituted or substituted by one or more --Cl, C.sub.1 -C.sub.4 -alkyl or C.sub.1 -C.sub.4 -alkoxy radicals, and R.sup.5 is hydrogen or C.sub.1 -C.sub.4 -alkyl, or R.sup.4 and R.sup.5 together are a trimethylene or tetramethylene radical, and R.sup.6 is hydrogen, C.sub.1 -C.sub.4 -alkyl, --CCl.sub.3 or phenyl, subject to the condition that, if R.sup.2, R.sup.5 and R.sup.6 at the same time are hydrogen and R.sup.3 and R.sup.4 ar at the same time phenyl, R.sup.1 must not be hydrogen or C.sub.1 -C.sub.4 -alkyl, also, if R.sup.3 and R.sup.4 at the same time are phenyl and R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 and R.sup.2 together must not be alkylidene or benzylidene, and also, if R.sup.3 and R.sup.4 at the same time are p-methoxyphenyl and R.sup.2, R.sup.5 and R.sup.6 are at the same time hydrogen, R.sup.1 must not be hydrogen, and, finally, if R.sup.2 and R.sup.5 at the same time are hydrogen and R.sup.3, R.sup.4 and R.sup.6 are at the same time phenyl, R.sup.1 must not be hydrogen, are valuable initiators for the photopolymerization of ethylenically unsaturated compounds.

    摘要翻译： 其中R 1是氢或C 1 -C 4烷基，-Si（CH 3）3，烯丙基或苄基，R 2是氢，C 1 -C 8烷基，C 1 -C 4烷基，其中R 1是氢或C 1 -C 4烷基， 被C 1 -C 4 - 烷氧基或-OH取代， - （CH 2 -CH 2 -O）n -R 5，其中n为2至20，R 5为H或C 1 -C 4烷基，-Si（CH 3）3，苄基，C 3 C 1-6 - 烯基，C 3 -C 4 - 炔基或2-四氢呋喃基，或者R 1和R 2一起是被羟基，C 1 -C 4烷氧基或苯基取代的C 1 -C 6亚烷基或C 2 -C 6亚烷基， 直链或支链的C 2 -C 6烷二基，亚苄基，亚环戊叉基或亚环己基或2,2,2-三氯亚乙基，2-呋喃基亚甲基或二甲基亚甲基基，R3是未取代或被一个或多个-Cl， C1-C4-烷基，C1-C4-烷氧基或C1-C4-烷硫基，也是苯甲酰基苯基，苯氧基苯基或苯硫基苯基，R4是C1-C4-烷基或未被取代或被一个或多个-Cl， C 1 -C 4 - 烷基或C 1 -C 4 - 烷氧基，R 5是氢或C 1-C4-烷基或R4和R5一起是三亚甲基或四亚甲基，并且R 6是氢，C 1 -C 4 - 烷基，-CCl 3或苯基，条件是如果同时为R 2，R 5和R 6 是氢，R3和R4Ar同时是苯基，R1不能是氢或C1-C4-烷基，同样，如果R3和R4同时为苯基，R5和R6同时为氢，R1和 R2一起不能是亚烷基或亚苄基，如果R3和R4同时是对甲氧基苯基，R2，R5和R6同时是氢，R1不能是氢，最后如果R2和 R5同时为氢，R3，R4和R6同时为苯基，R1不能为氢，是烯属不饱和化合物的光聚合的有价值的引发剂。

    Process for preparing relief images using acid-curable resins and masked curing catalysts
    20.
    发明授权
    Process for preparing relief images using acid-curable resins and masked curing catalysts 失效
    使用酸固化树脂和掩蔽固化催化剂制备浮雕图像的方法

    公开(公告)号：US4708926A

    公开(公告)日：1987-11-24

    申请号：US910709

    申请日：1986-09-24

    申请人： Rudolf Kirchmayr ,  Werner Rutsch

    发明人： Rudolf Kirchmayr ,  Werner Rutsch

    IPC分类号： C08K5/42 ,  G03F7/02 ,  B05D3/06

    CPC分类号： C08K5/42 ,  Y10S260/38

    摘要： Compounds of the formula I and II ##STR1## in which R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6, X, Y and n are as defined in claim 1, are latent curing catalysts for preparing relief images with acid-curable resins. They are distinguished by satisfactory solubility in the acid-curable resin systems, can be stored virtually indefinitely in the dark and, when exposed to shortwave light, make it possible to cure the resins by acid catalysis at a relatively low temperature.

    摘要翻译： 其中R 1，R 2，R 3，R 4，R 5和R 6，X，Y和n如权利要求1中所定义的式I和II的化合物是用于制备浮雕图像的潜在固化催化剂 酸固化树脂。 它们的特征在于在可酸固化的树脂体系中具有令人满意的溶解性，可以在黑暗中实际上无限期地储存，并且当暴露于短波光时，可以在相对低的温度下通过酸催化固化树脂。