公开(公告)号：US4438724A

公开(公告)日：1984-03-27

申请号：US407983

申请日：1982-08-13

Applicant: Joachim Doehler ,  David A. Gattuso ,  Kevin R. Hoffman

Inventor： Joachim Doehler ,  David A. Gattuso ,  Kevin R. Hoffman

IPC: H01L31/04 ,  C23C16/54 ,  F16J15/16 ,  F16J15/40 ,  H01J37/18 ,  H01J37/32 ,  H01L21/205 ,  C23C13/10

CPC classification number: C23C16/545 ,  F16J15/168 ,  F16J15/40 ,  H01J37/18 ,  H01J37/32

Abstract: A grooved passageway surface in a magnetic gas gate, the gas gate adapted to operatively connect two adjacent chambers, in the first chamber of which process gases are introduced for depositing a first layer upon a magnetic substrate and in the second chamber of which process gases are introduced for depositing a second layer atop the first layer. Since it is important to prevent the second chamber gases from contaminating the first chamber gases, a constant pressure differential established between the chambers is employed to provide a substantially unidirectional flow of gases from the first chamber into the second chamber. Magnetic gas gates have been used in the prior art to reduce the size of gas gate passageways by creating a magnetic field which urges the unlayered surface of the substrate toward a wall of the passageway. Although, thereby reducing the size of the passageway opening and correspondingly reducing the back diffusion of gases from the second chamber, the passageway is simultaneously divided into a relatively large flow channel and a relatively narrow flow channel. The present invention is concerned with reducing the back diffusion of gases through the relatively narrow flow channel. This is accomplished by forming a plurality of elongated grooves in the passageway wall toward which the unlayered surface of the substrate is urged. The grooves are substantially coextensive with the length of the passageway so as to operatively interconnect the adjacent chambers. The flow channels thus established are able to accommodate a sufficient flow rate of process gases to further reduce the back diffusion of process gases.

Abstract translation: 在磁性气体门中的沟槽通道表面，气门适于可操作地连接两个相邻的腔室，在其第一腔室中引入了工艺气体以便在磁性衬底上沉积第一层，而在第二腔室中，工艺气体为 引入用于在第一层顶上沉积第二层。 由于重要的是防止第二室气体污染第一室气体，所以在室之间建立的恒定压差用于提供基本上单向的气体从第一室到第二室。 在现有技术中已经使用磁性气门来通过产生一个磁场来减小气体浇口通道的尺寸，所述磁场迫使衬底的未层叠表面朝向通道的壁。 尽管由此减小了通道开口的尺寸并相应地减少了气体从第二室的反向扩散，但是通道同时被分成相当大的流动通道和相对窄的流动通道。 本发明涉及通过相对窄的流动通道减少气体的反向扩散。 这是通过在通道壁中形成多个细长槽来实现的，所述多个细长凹槽被迫使衬底的未层表面朝向该槽延伸。 槽与通道的长度基本上共同延伸，以便可操作地连接相邻的室。 如此建立的流动通道能够适应足够的工艺气体流量，以进一步减少工艺气体的反向扩散。

公开(公告)号：US20110281378A1

公开(公告)日：2011-11-17

申请号：US12780406

申请日：2010-05-14

Applicant: Joachim Doehler

Inventor： Joachim Doehler

IPC: H01L21/66 ,  G01F1/66

CPC classification number: G01F1/667

Abstract: A system and method for measuring the velocity of gas flow between multiple plasma deposition chambers is provided. A passage atmospherically linking two plasma processing chambers conducts a gas flow therebetween due to differential pressures within the respective chambers. The gas flow velocity is measured by a linear or non-linear ultrasonic energy acoustic path between two transducers located exteriorly to the chambers using the difference in transit time in a forward and reverse direction due to the velocity of gas in the passage. The pressure of process gas in one or more chambers is adjustable based on the measured velocity of gas flow in the passage.

Abstract translation: 提供了一种用于测量多个等离子体沉积室之间的气流速度的系统和方法。 大气连接两个等离子体处理室的通道由于各个室内的压差而导致其间的气流。 由于通道中气体的速度，使用位于室外的两个换能器之间的线性或非线性的超声波能量声路径来测量气流速度，其使用正向和反向方向上的通过时间差。 一个或多个室中的处理气体的压力可以基于测量的通道中气流的速度来调节。

公开(公告)号：US20100252606A1

公开(公告)日：2010-10-07

申请号：US12418066

申请日：2009-04-03

Applicant: Mark Lycette ,  Joachim Doehler ,  James Blyth

Inventor： Mark Lycette ,  Joachim Doehler ,  James Blyth

IPC: B65H23/26

CPC classification number: B65H23/16

Abstract: A system for the continuous deposition of a semiconductor material onto one or more webs of substrate material which are advanced therethrough includes a web transport system having a plurality of web support assemblies. Each web support assembly includes a base having a primary support arm pivotally mounted thereto so as to be displaceable from a first position to a second position. The support includes a first biasing member in mechanical communication with the primary support arm. The first biasing member operates to impart a first biasing force to the primary support arm so as to move it from its first position to its second position. The support includes a dancer arm which is pivotally mounted to the primary support arm so as to be displaceable from a first position to a second position relative to the primary support arm. The system further includes a second biasing member in mechanical communication with the dancer arm. The second biasing member operates to impart a second biasing force to the dancer arm so as to move it from its first position to its second position. A roller is rotatably supported on the dancer arm. The roller is configured to engage a portion of the web. The web support assembly operates to maintain continuous contact between the roller and the moving web of substrate material as it passes through the deposition system.

Abstract translation: 用于将半导体材料连续沉积到一个或多个先进的基底材料网上的系统包括具有多个网状物支撑组件的腹板输送系统。 每个腹板支撑组件包括具有枢转地安装在其上的主支撑臂的基座，以便能够从第一位置移动到第二位置。 支撑件包括与主支撑臂机械连通的第一偏置构件。 第一偏置构件操作以向主支撑臂施加第一偏压力，以便将其从其第一位置移动到其第二位置。 该支撑件包括一个浮动臂，该臂可枢转地安装到主支撑臂上，以便能够相对于主支撑臂从第一位置移动到第二位置。 该系统还包括与舞蹈臂机械连通的第二偏置构件。 第二偏置构件操作以向浮动臂施加第二偏压力，以使其从其第一位置移动到其第二位置。 滚轮可旋转地支撑在舞蹈臂上。 辊被构造成接合网的一部分。 幅材支撑组件在通过基底材料通过沉积系统时操作以保持辊和基底材料的移动幅材之间的连续接触。

公开(公告)号：US20100071766A1

公开(公告)日：2010-03-25

申请号：US12284557

申请日：2008-09-23

Applicant: Joachim Doehler ,  Scott Jones ,  Kevin Hoffman ,  Tongyu Liu

Inventor： Joachim Doehler ,  Scott Jones ,  Kevin Hoffman ,  Tongyu Liu

IPC: H01L31/0352 ,  H01L29/82 ,  H01L31/18

CPC classification number: H01L31/18 ,  H01L21/02422 ,  H01L21/02425 ,  H01L21/02428 ,  H01L21/02521 ,  H01L31/02

Abstract: A semiconductor device is provided in accordance with an exemplary embodiment. The semiconductor device includes a semiconductive layer disposed over a multi-layer substrate. The multi-layer substrate includes a plurality of dissimilar regions, one of which is an inner magnetic region and the remainder of the multi-layer substrate is thermally symmetrical about the inner magnetic region.

Abstract translation: 根据示例性实施例提供半导体器件。 半导体器件包括设置在多层衬底上的半导体层。 多层基板包括多个不同的区域，其中之一是内部磁性区域，多层基板的其余部分关于内部磁性区域热对称。

公开(公告)号：US20100006142A1

公开(公告)日：2010-01-14

申请号：US12460061

申请日：2009-07-13

Applicant: Yang Li ,  Scott Jones ,  Vin Cannella ,  Arun Kumar ,  Joachim Doehler ,  Kais Younan

Inventor： Yang Li ,  Scott Jones ,  Vin Cannella ,  Arun Kumar ,  Joachim Doehler ,  Kais Younan

IPC: H01L31/0248 ,  C23C16/00 ,  C23C14/34 ,  C25B9/00 ,  H01L21/306 ,  H05H1/24

CPC classification number: H01J37/32091 ,  H01J37/32009 ,  H01J37/32577 ,  H01L31/206 ,  Y02E10/50 ,  Y02P70/521

Abstract: Deposition apparatus for uniformly forming material on a substrate in accordance with an exemplary embodiment is provided. The deposition apparatus includes an energy source, an electrode in a facing, spaced relationship with respect to the substrate, and interface structure joined to the electrode. The interface structure is configured to electrically couple energy from the energy source through and about the interface structure to the electrode for formation of a substantially uniform electric field between the electrode and a predetermined area of the substrate when the interface structure is supplied with energy from the energy source.

Abstract translation: 提供了根据示例性实施例的用于在基板上均匀形成材料的沉积装置。 沉积设备包括能量源，相对于衬底面对且间隔开的电极以及与电极接合的界面结构。 接口结构被配置为将来自能量源的能量通过和围绕界面结构电耦合到电极，用于在电极和衬底的预定区域之间形成基本均匀的电场，当界面结构被从 能量源。

公开(公告)号：US6028393A

公开(公告)日：2000-02-22

申请号：US10648

申请日：1998-01-22

Applicant: Masatsugu Izu ,  Joachim Doehler ,  Scott Jones

Inventor： Masatsugu Izu ,  Joachim Doehler ,  Scott Jones

IPC: C23C8/36 ,  C23C16/517 ,  H01J7/24

CPC classification number: C23C8/36 ,  C23C16/517

Abstract: A novel high speed, high quality plasma enhanced surface modification or CVD thin-film deposition method and apparatus. The invention employs both microwave and e-beam energy for creation of a plasma of excited species which modify the surface of substrates or are deposited onto substrates to form the desired thin film. The invention also employs a gas jet system to introduce the reacting species to the plasma. This gas jet system allows for higher deposition speed than conventional PECVD processes while maintaining the desired high quality of the deposited materials.

Abstract translation: 一种新颖的高速，高质量等离子体增强表面改性或CVD薄膜沉积方法和装置。 本发明采用微波和电子束能量来产生激发物质的等离子体，其改变衬底的表面或沉积到衬底上以形成所需的薄膜。 本发明还采用气体喷射系统将反应物质引入等离子体。 该气体喷射系统允许比常规PECVD工艺更高的沉积速度，同时保持所需的高质量的沉积材料。

公开(公告)号：US4893584A

公开(公告)日：1990-01-16

申请号：US174659

申请日：1988-03-29

Applicant: Joachim Doehler ,  Jeffrey M. Krisko

Inventor： Joachim Doehler ,  Jeffrey M. Krisko

IPC: C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H05H1/46

CPC classification number: H01J37/32229 ,  H01J37/32192 ,  H01J37/32238 ,  H05H1/46

Abstract: Microwave energy apparatus adapted to sustain a substantially uniform plasma over a relatively large area. In the broadest form of the invention, an isolating window is disposed about the microwave applicator, said isolating window formed from a material through which the microwave energy can be transmitted from the applicator into a plasma reaction vessel and said isolating window configured in a shape which is substantially optimized to withstand compressive forces. In this manner, the thickness of the isolating window may be minimized to provide for rapid thermal cooling, wherby high power densities may be achieved without cracking the window.

公开(公告)号：US4736304A

公开(公告)日：1988-04-05

申请号：US848934

申请日：1986-04-07

Applicant: Joachim Doehler

Inventor： Joachim Doehler

IPC: C23C16/52 ,  G05B19/042 ,  C23C18/40

CPC classification number: C23C16/52 ,  G05B19/0423 ,  G05B19/0428 ,  G05B2219/24115 ,  G05B2219/24199

Abstract: There are disclosed a method and apparatus for improved operation of one or more deposition systems. A minimum expenditure malfunction recovery system provides for a variable recovery related to the current hardware and actual states of the system. A simplified input and output (I/O) device is provided to control the data flow in the system without addressing and decoding complexity. A flexible operation system is also provided for a plurality of deposition systems whose operation easily can be varied without reprogramming of the operating sequence.

Abstract translation: 公开了一种用于改进一个或多个沉积系统的操作的方法和装置。 最小支出故障恢复系统提供与当前硬件和系统的实际状态相关的可变恢复。 提供简化的输入和输出（I / O）设备来控制系统中的数据流，而不需要解码和解码复杂度。 还为多个沉积系统提供灵活的操作系统，其操作容易地可以改变而不重新编程操作顺序。

公开(公告)号：US4440107A

公开(公告)日：1984-04-03

申请号：US397190

申请日：1982-07-12

Applicant: Joachim Doehler ,  Vincent Cannella ,  Richard O. Gray, Jr.

Inventor： Joachim Doehler ,  Vincent Cannella ,  Richard O. Gray, Jr.

IPC: H01L31/04 ,  C23C16/54 ,  H01J37/34 ,  H01L21/205 ,  H01L21/677 ,  C23C13/10

CPC classification number: H01L21/67709 ,  C23C16/545 ,  H01J37/3277 ,  H01J37/34 ,  H01L21/6776

Abstract: An apparatus for producing improved large area photovoltaic devices by substantially reducing the warpage of relatively large area, relatively thin webs of magnetic substrate material which travel through a plurality of high temperature, low pressure glow discharge deposition chambers. As the web of the substrate material moves through the deposition chambers, it assumes a normal, elongated path of travel. Due to the elevated deposition temperature, the elongated path of travel, the force of gravity, etc., the web has a tendency to warp. Warpage of the web is undesirable as it promotes the deposition of non-uniform semiconductor alloy layers. The improvement of the present invention contemplates the establishment of at least one magnetic field within each deposition chamber which is adapted to urge the web of substrate material out of its normal path of travel into a flat, substantially planar path of travel. The new flat path of travel serves to substantially reduce warpage of the web which permits uniform amorphous semiconductor alloy layers to be deposited. In alternate embodiments, the web of substrate material may be urged into sliding contact with a plurality of stationary ceramic magnets or the web may be urged into rolling contact with a plurality of rotatable magnetic elements which may either be hollow, ceramic magnets or electromagnets.

Abstract translation: 通过大幅减少行进通过多个高温，低压辉光放电沉积室的较大面积的，相对较薄的磁性基片材料的网状物的翘曲来制造改进的大面积光伏器件的装置。 当衬底材料的网状物移动通过沉积室时，其呈现正常的，延长的行进路径。 由于沉积温度升高，延伸的行进路径，重力等，纤网具有翘曲的倾向。 纤维网的翘曲是不期望的，因为其促进非均匀半导体合金层的沉积。 本发明的改进设想在每个沉积室内建立至少一个磁场，该磁场适于将衬底材料幅材推出其正常行进路径进入平坦的基本上平行的行进路径。 新的平行路径用于大幅度地减少网状物的翘曲，这允许沉积均匀的非晶半导体合金层。 在替代实施例中，衬底材料的网可以被推动成与多个固定的陶瓷磁体滑动接触，或者可以将卷材推动成与可以是中空的，陶瓷磁体或电磁体的多个可旋转的磁性元件滚动接触。

公开(公告)号：US20100252605A1

公开(公告)日：2010-10-07

申请号：US12418025

申请日：2009-04-03

Applicant: Mark Lycette ,  Joachim Doehler ,  James Blyth

Inventor： Mark Lycette ,  Joachim Doehler ,  James Blyth

IPC: B65H23/26

CPC classification number: B65H23/16 ,  B65H2402/542

Abstract: A web support assembly for a moving web of substrate material includes a base having a primary support arm pivotally mounted thereto so as to be displaceable from a first position to a second position. The web support assembly includes a first biasing member in mechanical communication with the primary support arm. The first biasing member operates to impart a first biasing force to the primary support arm so as to move it from its first position to its second position. The system includes a dancer arm which is pivotally mounted to the primary support arm so as to be displaceable from a first position to a second position relative primary support arm. The web support assembly further includes a second biasing member in mechanical communication with the dancer arm. The second biasing member operates to impart a second biasing force to the dancer arm so as to move it from its first position to its second position. A roller is rotatably supported on the dancer arm. The roller is configured to engage a portion of the web. The web support assembly operates to maintain continuous contact between the roller and the moving web of substrate material as it passes through a multi-station processing system.

Abstract translation: 用于移动的基材材料的幅材支撑组件包括具有枢转地安装在其上的主支撑臂的基座，以便能够从第一位置移动到第二位置。 腹板支撑组件包括与主支撑臂机械连通的第一偏置构件。 第一偏置构件操作以向主支撑臂施加第一偏压力，以便将其从其第一位置移动到其第二位置。 该系统包括枢转地安装到主支撑臂的浮动臂，以便能够从第一位置移动到相对主支撑臂的第二位置。 腹板支撑组件还包括与舞蹈臂机械连通的第二偏压构件。 第二偏置构件操作以向浮动臂施加第二偏压力，以使其从其第一位置移动到其第二位置。 滚轮可旋转地支撑在舞蹈臂上。 辊被构造成接合网的一部分。 幅材支撑组件在通过多工位处理系统时操作以保持辊和衬底材料的移动幅材之间的连续接触。