公开(公告)号：US20060201545A1

公开(公告)日：2006-09-14

申请号：US11356376

申请日：2006-02-16

Applicant: Stanford Ovshinsky ,  Lin Higley ,  Marshall Muller ,  Timothy Ellison ,  Joachim Doehler ,  Buddie Dotter ,  Steve Heckeroth

Inventor： Stanford Ovshinsky ,  Lin Higley ,  Marshall Muller ,  Timothy Ellison ,  Joachim Doehler ,  Buddie Dotter ,  Steve Heckeroth

IPC: H02N6/00

CPC classification number: H02S20/23 ,  B32B17/10788 ,  H01L31/048 ,  H01L31/0481 ,  Y02B10/12 ,  Y02E10/50

Abstract: The present invention discloses a fire resistant laminate and incorporating the laminate into an encapsulant for a photovoltaic module that may be used in a photovoltaic building material. More particularly, the present invention relates to fire resistant encapsulant that may be used in a triple junction amorphous silicon photovoltaic module that is fire resistant on a wide variety of buildings roofs, including residential housing, and that is flexible and lightweight. A fire resistant additive, such as solid glass spheres, may be added to encapsulant material to produce a fire resistant, cut resistant, lightweight photovoltaic device.

Abstract translation: 本发明公开了一种防火层压板，并将层压材料结合到可用于光伏建筑材料中的用于光伏组件的密封剂中。 更具体地说，本发明涉及可用于三结结非晶硅光伏模块中的耐火密封剂，其在包括住宅外壳在内的各种建筑物屋顶上是耐火的，并且是柔性和重量轻的。 可以向密封剂材料中加入耐火添加剂，例如固体玻璃球，以产生耐火，耐切割，轻质的光伏装置。

公开(公告)号：US20050121423A1

公开(公告)日：2005-06-09

申请号：US10500855

申请日：2003-01-29

Applicant: Wilmert De Bosscher ,  Jurgen Denul ,  Guy Gobin ,  Bart Persone ,  Joachim Doehler

Inventor： Wilmert De Bosscher ,  Jurgen Denul ,  Guy Gobin ,  Bart Persone ,  Joachim Doehler

IPC: B01J3/00 ,  B01J19/08 ,  C23C14/34 ,  C23C14/54 ,  C23C16/46 ,  C23C16/48 ,  C23C16/50 ,  H01J37/02 ,  H01L21/00 ,  H05B3/00 ,  H05B7/00 ,  B23K10/00

CPC classification number: H01J37/026 ,  C23C14/541 ,  C23C16/46 ,  H01L21/67069 ,  H01L21/67115 ,  H05B3/0038 ,  H05B7/00

Abstract: A method of heating in a vacuum atmosphere in the presence of a plasma, comprises the following steps: a) providing infrared radiation means (16) in a vacuum chamber (10); b) providing a first electrical conductor (18) to the infrared radiation means (16); c) providing a second electrical conductor (20) from the infrared radiation means (16); d) putting an electrical voltage over said infrared radiation means (16); e) preventing the first conductor (18) and the second conductor (20) from having an electrical voltage above +55 Volt. The advantage is that arcing is avoided.

Abstract translation: 在等离子体存在下在真空气氛中加热的方法包括以下步骤：a）在真空室（10）中提供红外辐射装置（16）; b）向红外辐射装置（16）提供第一电导体（18）; c）从所述红外辐射装置（16）提供第二电导体（20）; d）在所述红外辐射装置（16）上施加电压; e）防止第一导体（18）和第二导体（20）的电压高于+ 55伏特。 优点是避免了电弧。

公开(公告)号：US06878207B2

公开(公告)日：2005-04-12

申请号：US10368835

申请日：2003-02-19

Applicant: Joachim Doehler ,  Vincent Cannella

Inventor： Joachim Doehler ,  Vincent Cannella

IPC: B01J3/02 ,  B01J19/22 ,  B07B20060101 ,  B07B1/00 ,  C23C14/00 ,  C23C14/56 ,  C23C16/00 ,  C23C16/54 ,  C23F1/00 ,  C25B13/00 ,  C25C7/04 ,  F16J15/34 ,  H01L21/02

CPC classification number: B01J3/02 ,  B01J19/22 ,  C23C14/562 ,  C23C14/564 ,  C23C16/545 ,  F16J15/3452

Abstract: Disclosed herein is an improved gas gate for interconnecting regions of differing gaseous composition and/or pressure, more particularly between atmosphere and a vacuum. The gas gate includes a cylinder within a housing situated between the regions of differing gaseous pressure, wherein the gas gate provides for choke mode transonic flow of air leaks between the regions. A web of substrate material is adapted to move between the regions with at least one roller in a first region and at least one roller in a second region. The rollers are positioned to create sufficient tension as the web advances over the top peripheral portion of the cylinder between the two regions or under the bottom peripheral portion of the cylinder between the two regions.

Abstract translation: 本文公开了一种改进的气门，用于互连不同气体成分和/或压力的区域，更特别地在大气和真空之间。 气门包括在位于不同气体压力的区域之间的壳体内的气缸，其中气门提供区域之间的空气泄漏的扼流模式跨音速流动。 衬底材料的网状物适于在区域之间在第一区域中具有至少一个辊和在第二区域中的至少一个辊之间移动。 当纸幅在两个区域之间的两个区域之间或在圆筒的底部周边部分之间在两个区域之间前进到圆柱体的顶部周边部分时，辊被定位成产生足够的张力。

公开(公告)号：US06463874B1

公开(公告)日：2002-10-15

申请号：US09637945

申请日：2000-08-11

Applicant: Buddie R. Dotter, II ,  Joachim Doehler ,  Timothy Ellison ,  Masatsugo Izu ,  Herbert C. Ovshinsky

Inventor： Buddie R. Dotter, II ,  Joachim Doehler ,  Timothy Ellison ,  Masatsugo Izu ,  Herbert C. Ovshinsky

IPC: C23C1600

CPC classification number: H01J37/32192 ,  C23C14/562 ,  C23C16/0245 ,  C23C16/511 ,  C23C16/545

Abstract: Apparatus and method for the vacuum deposition of at least two different layers of thin film material onto a substrate by two different vacuum deposition processes. Also disclosed is a novel linear applicator for using microwave enhanced CVD to uniformly deposit a thin film of material over an elongated substrate.

Abstract translation: 通过两种不同的真空沉积工艺将至少两层薄膜材料真空沉积到衬底上的装置和方法。 还公开了一种用于使用微波增强CVD在细长衬底上均匀沉积材料薄膜的新型线性涂布器。

公开(公告)号：US4419533A

公开(公告)日：1983-12-06

申请号：US354285

申请日：1982-03-03

Applicant: Wolodymyr Czubatyj ,  Rajendra Singh ,  Joachim Doehler ,  David D. Allred ,  Jaime M. Reyes

Inventor： Wolodymyr Czubatyj ,  Rajendra Singh ,  Joachim Doehler ,  David D. Allred ,  Jaime M. Reyes

IPC: H01L31/04 ,  H01L31/052 ,  H01L31/075 ,  H01L31/20 ,  H01L31/06

CPC classification number: H01L31/202 ,  H01L31/056 ,  H01L31/075 ,  Y02E10/52 ,  Y02E10/548 ,  Y02P70/521

Abstract: There is disclosed new and improved photovoltaic devices which provide increased short circuit currents and efficiencies over that previously obtainable from prior devices. The disclosed devices include incident radiation directing means for directing at least a portion of the incident light through the active region or regions thereof at angles sufficient to substantially confine the directed radiation in the devices. This allows substantially total utilization of photogenerated electron-hole pairs. Further, because the light is directed through the active region or regions at such angles, the active regions can be made thinner to also increase collection efficiencies.The incident radiation directors can be random surface or bulk reflectors to provide random scattering of the light, or periodic surface or bulk reflector to provide selective scattering of the light.While the present invention is applicable to photovoltaic devices formed from any type of semiconductor material, as for example, crystalline, polycrystalline, or amorphous semiconductor alloys or any combination thereof, disclosure herein is primarily directed to photovoltaic devices formed from amorphous silicon alloys preferably incorporating fluorine as a density of states reducing element. The disclosure is also directed to, without limitation, photovoltaic devices of the p-i-n configuration, both as single cells and multiple cells arranged in tandem.

Abstract translation: 公开了新的和改进的光伏器件，其提供比以前从现有器件获得的更高的短路电流和效率。 所公开的装置包括入射辐射导向装置，用于将入射光的至少一部分引导通过其有效区域或其区域，其角度足以基本上限制装置中的定向辐射。 这样可以大幅度地利用光生电子 - 空穴对。 此外，由于光以这样的角度被引导通过有源区域或者区域，所以可以使有源区域更薄以增加收集效率。 入射辐射导向器可以是随机表面或体反射器，以提供光的随机散射，或周期性表面或体反射器以提供光的选择性散射。 尽管本发明可应用于由任何类型的半导体材料形成的光电器件，例如晶体，多晶或非晶半导体合金或其任何组合，但是本文的公开内容主要涉及由非晶硅合金形成的光伏器件，优选掺入氟 作为减少元素的状态密度。 本公开还涉及但不限于p-i-n配置的光伏器件，既作为串联排列的单个单元和多个单元。

公开(公告)号：US20130055818A1

公开(公告)日：2013-03-07

申请号：US13224112

申请日：2011-09-01

Applicant: Joachim Doehler

Inventor： Joachim Doehler

IPC: G01L11/02

CPC classification number: G01L11/02 ,  G01N15/14 ,  G01N21/51 ,  G01N21/73 ,  G01N2021/215 ,  H01J37/32816 ,  H01J37/32935 ,  H01J37/32981 ,  H01J37/3299

Abstract: Processes of identifying small pressure irregularities in a system used for continuous plasma deposition are provided. Sensitive light scattering is used to detect the presence of nucleated particles in a detection area that is outside the plasma region of high electric field whereby the presence of the particles indicates a pressure abnormality in the plasma deposition chamber. The pressure of the plasma deposition chamber is then adjusted to reduce or eliminate the presence of particles within the detection area and to optimize deposition of material on a substrate.

Abstract translation: 提供了确定用于连续等离子体沉积的系统中的小压力不规则性的方法。 敏感光散射用于检测在高电场等离子体区域外的检测区域中有核粒子的存在，由此存在颗粒表示等离子体沉积室中的压力异常。 然后调整等离子体沉积室的压力以减少或消除检测区域内的颗粒的存在并优化材料在基底上的沉积。

公开(公告)号：US20060278163A1

公开(公告)日：2006-12-14

申请号：US11376997

申请日：2006-03-16

Applicant: Stanford Ovshinsky ,  Herbert Ovshinsky ,  Masat Izu ,  Joachim Doehler ,  Kevin Hoffman ,  James Key ,  Mark Lycette

Inventor： Stanford Ovshinsky ,  Herbert Ovshinsky ,  Masat Izu ,  Joachim Doehler ,  Kevin Hoffman ,  James Key ,  Mark Lycette

IPC: C23C16/00

CPC classification number: C23C16/545 ,  C23C14/0078 ,  C23C14/351 ,  C23C14/542 ,  C23C14/562 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/458 ,  C23C16/4586 ,  C23C16/517 ,  C23C16/52

Abstract: A apparatus for depositing one or more thin film layers on one or more continuous web or discrete substrates. The apparatus includes a pay-out unit for dispensing one or a plurality of webs, a deposition unit that deposits a series of one or more thin film layers thereon, and a take-up unit that receives and stores the webs following deposition. In a preferred embodiment, deposition occurs through plasma enhanced chemical vapor deposition in which a plasma region is formed between a cathode in the deposition unit and one or more vertically-oriented webs. The instant deposition apparatus includes a support system for guiding and stabilizing the transport of one or more webs or substrates through the deposition chambers. The support system includes a magnetic guidance assembly and an edge-stabilizing assembly that operate to inhibit perturbations of the motion of a web or substrate in directions other than the direction of transport through the apparatus.

Abstract translation: 一种用于在一个或多个连续幅材或分立衬底上沉积一个或多个薄膜层的装置。 该装置包括用于分配一个或多个网的放出单元，在其上沉积一系列一个或多个薄膜层的沉积单元，以及在沉积之后接收和存储网的卷取单元。 在优选实施例中，通过等离子体增强化学气相沉积发生沉积，其中在沉积单元中的阴极和一个或多个垂直取向的网之间形成等离子体区域。 即时沉积设备包括用于引导和稳定通过沉积室的一个或多个卷材或基底的输送的支撑系统。 所述支撑系统包括磁性引导组件和边缘稳定组件，所述磁性引导组件和边缘稳定组件可操作以抑制幅材或衬底在不同于穿过所述设备的传送方向的方向上的运动的扰动。

公开(公告)号：US06209482B1

公开(公告)日：2001-04-03

申请号：US08942308

申请日：1997-10-01

Applicant: Joachim Doehler

Inventor： Joachim Doehler

IPC: C23C1600

CPC classification number: H01J37/32229 ,  H01J37/32192

Abstract: A microwave apparatus for sustaining a substantially uniform plasma over a relatively large area. The microwave apparatus comprises a vacuum vessel for sustaining the plasma in a plasma region thereof. The apparatus further comprises a nonevanescent microwave applicator having means for controlling the cutoff frequency thereof. The microwave applicator may comprise a waveguide and a volume of dielectric material disposed within the waveguide. Alternately, the microwave applicator may comprise ridge waveguide.

Abstract translation: 一种用于在相对大的区域上维持基本均匀的等离子体的微波装置。 微波装置包括用于在其等离子体区域中维持等离子体的真空容器。 该装置还包括一个非瞬时微波施加器，其具有用于控制其截止频率的装置。 微波施加器可以包括布置在波导内的波导和一定体积的介电材料。 或者，微波施加器可以包括脊波导。

公开(公告)号：US4883686A

公开(公告)日：1989-11-28

申请号：US199062

申请日：1988-05-26

Applicant: Joachim Doehler ,  Stephen J. Hudgens ,  Stanford R. Ovshinsky ,  Buddie Dotter II ,  Lester R. Peedin ,  Jeffrey M. Krisko ,  Annette Krisko

Inventor： Joachim Doehler ,  Stephen J. Hudgens ,  Stanford R. Ovshinsky ,  Buddie Dotter II ,  Lester R. Peedin ,  Jeffrey M. Krisko ,  Annette Krisko

IPC: C23C16/50 ,  C23C16/44 ,  C23C16/452 ,  C23C16/455 ,  C23C16/511 ,  H01L21/205

CPC classification number: C23C16/4551 ,  C23C16/452 ,  C23C16/455 ,  C23C16/45514 ,  Y10S505/741

Abstract: A method of forming a high flux of activated species, such as ions, of an energy transferring gas by employing a substantial pressure differential between a first conduit in which the energy transferring gas is introduced into a vacuumized enclosure and the background pressure which exits in said enclosure. In one embodiment, the flow rate of the energy transferring gas flowing through said first conduit, when taken in conjunction with said pressure differential, causes the high flux of activated species of the energy transferring gas to collide with a precursor deposition/etchant gas, remotely introduced into the enclosure through a second conduit, for forming deposition/etchant species therefrom. In an alternate embodiment, the pressure differential causes those activated species, themselves, to be either deposited upon or etched away from the surface of a remotely positioned substrate.

公开(公告)号：US4450786A

公开(公告)日：1984-05-29

申请号：US466995

申请日：1983-02-16

Applicant: Joachim Doehler ,  David A. Gattuso ,  Kevin R. Hoffman

Inventor： Joachim Doehler ,  David A. Gattuso ,  Kevin R. Hoffman

IPC: C23C16/54 ,  F16J15/16 ,  F16J15/40 ,  H01J37/18 ,  H01J37/32 ,  C23C13/08

CPC classification number: H01J37/3244 ,  C23C16/545 ,  F16J15/168 ,  F16J15/40 ,  H01J37/18 ,  Y10S277/906

Abstract: An improved magnetic gas gate is adapted to operatively interconnect two adjacent chambers, in the first chamber of which process gases are introduced for depositing a first layer upon a magnetic substrate and in the second chamber of which process gases are introduced for depositing a second layer atop the first layer. Since it is important to prevent the second chamber gases from contaminating the first chamber gases, a constant pressure differential established between the chambers is employed to provide a substantially unidirectional flow of gases from the first chamber into the second chamber. Magnetic gas gates have been used in the prior art to reduce the size of gas gate passageways by creating a magnetic field which urges the unlayered surface of the substrate toward a wall of the passageway. Although the size of the passageway opening is thereby reduced with a corresponding reduction in back diffusion of gases from the second chamber, the passageway is simultaneously divided into a relatively large flow channel and a relatively narrow flow channel. The present invention reduces the back diffusion of gases through the relatively narrow flow channel by forming a plurality of elongated grooves in the passageway wall toward which the unlayered surface of the substrate is urged. The grooves are substantially coextensive with the length of the passageway so as to operatively interconnect the adjacent chambers. The flow channels thus established are adapted to accommodate a sufficient flow of inert sweep gases to further reduce the back diffusion of process gases through the narrow flow channel.

Abstract translation: 改进的磁性气体门适于可操作地互连两个相邻的室，在其中引入工艺气体的第一室中用于在磁性基底上沉积第一层，并且在其第二室中引入工艺气体以沉积第二层 第一层。 由于重要的是防止第二室气体污染第一室气体，所以在室之间建立的恒定压差用于提供基本上单向的气体从第一室到第二室。 在现有技术中已经使用磁性气门来通过产生一个磁场来减小气体浇口通道的尺寸，所述磁场迫使衬底的未层叠表面朝向通道的壁。 虽然通道开口的尺寸因此随着气体从第二室的反向扩散的相应减小而减小，但是通道同时被分成相当大的流动通道和相对窄的流动通道。 本发明通过在通道壁中形成多个细长凹槽来减少气体通过相对较窄的流动通道的反向扩散，所述基底的非层状表面被推向所述通道壁。 槽与通道的长度基本上共同延伸，以便可操作地连接相邻的室。 如此建立的流动通道适于容纳足够的惰性吹扫气体流，以进一步减少工艺气体通过窄流动通道的反向扩散。