公开(公告)号：US20090128829A1

公开(公告)日：2009-05-21

申请号：US12263564

申请日：2008-11-03

申请人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

发明人： Frank Schillke ,  Rolf Freimann ,  Matthias Dreher

IPC分类号： G01B9/02

CPC分类号： G01B11/2441 ,  G01B9/02039

摘要： A method of determining a deviation of an actual shape from a desired shape of an optical surface (12; 103) includes: providing an incoming electromagnetic measuring wave (20; 113), providing two diffractive structures (47, 49; 145, 146, 141, 143) which are respectively designed to reshape the wavefront of an arriving wave, calibrating one of the two diffractive structures (47, 49; 145, 146, 141, 143) by radiating the incoming measuring wave (20; 113) onto the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143) and determining a calibration deviation of the actual wavefront from a desired wavefront of the measuring wave (20; 113) after interaction of the latter with the at least one diffractive structure to be calibrated (47, 49; 145, 146, 141, 143), positioning the two diffractive structures (47; 49; 145, 146, 141, 143) in the optical path of the incoming measuring wave (20; 113) such that individual rays of the measuring wave radiate through both diffractive structures (47; 49; 145, 146, 141, 143), and reshaping the incoming measuring wave (20; 113) by means of the two diffractive structures (47; 49; 145, 146, 141, 143) to form an adapted measuring wave (64; 114), the wavefront of which is adapted to the desired shape of the optical surface (12; 103), positioning the optical surface (12; 103) in the optical path of the adapted measuring wave (64, 114) so that the adapted measuring wave (64; 114) interacts with the optical surface (12; 103) and measuring the wavefront of the adapted measuring wave (64; 114) after interaction of the latter with the optical surface (12; 103).

摘要翻译： 确定实际形状与光学表面（12; 103）的期望形状的偏差的方法包括：提供输入的电磁测量波（20; 113），提供两个衍射结构（47,49; 145,146， 分别被设计成重新形成到达波的波前，通过将进入的测量波（20; 113）辐射到所述两个衍射结构（47,49; 145,146,141,143）中来校准所述两个衍射结构 至少一个待校准的衍射结构（47,49; 145,146,141,143），并且在后者与所述测量波的相互作用之后确定所述实际波前与所述测量波（20; 113）的期望波阵面的校准偏差 至少一个待校准的衍射结构（47,49; 145,146,141,143），将两个衍射结构（47; 49; 145,146,141,143）定位在入射测量波的光路中 20; 113），使得测量波的各个射线通过两个衍射辐射 结构（47; 49; 并且借助于所述两个衍射结构（47; 49; 145,146,141,143）对所述输入测量波（20; 113）重塑，以形成适应的测量波（64; 114 ），其波前适应于光学表面（12; 103）的期望形状，将光学表面（12; 103）定位在适配测量波（64,114）的光路中，使得适配测量 波（64; 114）与光学表面（12; 103）相互作用，并在后者与光学表面（12; 103）相互作用之后测量适应测量波（64; 114）的波前。

公开(公告)号：US20080094600A1

公开(公告)日：2008-04-24

申请号：US11875352

申请日：2007-10-19

申请人： Rolf Freimann

发明人： Rolf Freimann

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03B27/54 ,  G03F7/70208 ,  G03F7/70408

摘要： Illumination devices and masks for microlithography projection exposure systems, as well as related systems and methods, are disclosed.

摘要翻译： 公开了用于微光刻投影曝光系统的照明装置和掩模，以及相关的系统和方法。

公开(公告)号：US07154612B2

公开(公告)日：2006-12-26

申请号：US10420573

申请日：2003-04-22

申请人： Rolf Freimann

发明人： Rolf Freimann

IPC分类号： G01B9/02

CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B11/24 ,  G01B2290/15

摘要： In a method for calibrating a radius test bench for measuring radii of optical elements, in particular of lenses and spherical mirrors, there are provided an illuminating system 1 that generates a spherical wave and a diffractive optical element 3 that retroreflects a spherical wave of a specific radius into itself. The diffractive optical element 3 is introduced into the radius test bench in at least two positions, a first position thereof being a cat's eye position 1 and another position being an autocollimation position, as a result of which it is possible to use the radius of curvature simulated by the diffractive optical element 3 to detect deviations of the radius test bench from this radius of curvature as errors of the radius test bench, and thus to take them into account in the measurements of optical elements to be tested.

公开(公告)号：US06940607B2

公开(公告)日：2005-09-06

申请号：US10153832

申请日：2002-05-21

申请人： Rolf Freimann ,  Maximilian Mayer ,  Stephan Reichelt

发明人： Rolf Freimann ,  Maximilian Mayer ,  Stephan Reichelt

IPC分类号： G01B9/02 ,  G01J9/02 ,  G01M11/02

CPC分类号： G01B9/02072 ,  G01B9/02038 ,  G01B2290/15 ,  G01J9/02

摘要： In the case of a method for absolute calibration of an interferometer with the aid of a spherical output wave, comprising an optical element which retroflects the incident spherical wave itself or via a mirror, at least four measuring procedures are undertaken to determine a wave aberration W. The optical element is measured in the at least four measuring positions intrafocally and extrafocally in at least two different rotational angle positions. It is also possible, in addition, to undertake a measurement via a mirror in the cat's eye position (focus 3).

摘要翻译： 在借助于球面输出波的干涉仪的绝对校准方法的情况下，包括反射入射的球面波本身或通过反射镜的光学元件，进行至少四个测量程序以确定波像差W 光学元件在至少两个不同的旋转角度位置中的至少四个测量位置处被测量。 此外，还可以通过猫眼中的镜子进行测量（对焦3）。

公开(公告)号：US08537333B2

公开(公告)日：2013-09-17

申请号：US12983735

申请日：2011-01-03

申请人： Rolf Freimann ,  Ulrich Wegmann

发明人： Rolf Freimann ,  Ulrich Wegmann

IPC分类号： G03B27/42

CPC分类号： G03F7/70491 ,  G01B9/02018 ,  G01B9/02028 ,  G01B9/02065 ,  G01B9/0209 ,  G01B11/002 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2021/95676 ,  G03F7/70 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/7085

摘要： An optical imaging device, in particular for microlithography, including an imaging unit adapted to image an object point on an image point and a measurement device. The imaging unit has a first optical element group having at least one first optical element. The imaging device is adapted to participate in the imaging of the object point on the image point, and the measurement unit is adapted to determine at least one image defect occurring on the image point when the object point is imaged. The measuring device includes at least one measurement light source, one second optical element group and at least one detection unit. The measurement light source transmits at least one measurement light bundle. The second optical element group includes at least one optical reference element and one second optical element, the elements adapted to direct the at least one measurement light bundle to the at least one detection unit, to produce at least one detection signal. The second optical element has a defined spatial relationship with the first optical element. The optical reference element has an at least partially reflecting first optical surface and the second optical element has an at least partially reflecting second optical surface. The measurement device is adapted to determine the at least one image defect using the at least one detection signal. The first optical surface and the second optical surface are positioned relative to one another such that a multiple reflection of the at least one measurement light bundle occurs between them.

摘要翻译： 一种光学成像装置，特别是用于微光刻，包括适于对图像点上的物点进行成像的成像单元和测量装置。 成像单元具有具有至少一个第一光学元件的第一光学元件组。 成像装置适于参与图像点上的对象点的成像，并且测量单元适于确定当对象点成像时在图像点上发生的至少一个图像缺陷。 测量装置包括至少一个测量光源，一个第二光学元件组和至少一个检测单元。 测量光源透射至少一个测量光束。 第二光学元件组包括至少一个光学参考元件和一个第二光学元件，所述元件适于将至少一个测量光束引导到至少一个检测单元，以产生至少一个检测信号。 第二光学元件与第一光学元件具有限定的空间关系。 光学参考元件具有至少部分反射的第一光学表面，并且第二光学元件具有至少部分反射的第二光学表面。 测量装置适于使用至少一个检测信号来确定至少一个图像缺陷。 第一光学表面和第二光学表面相对于彼此定位，使得在它们之间发生至少一个测量光束的多次反射。

公开(公告)号：US08537332B2

公开(公告)日：2013-09-17

申请号：US12507694

申请日：2009-07-22

申请人： Rolf Freimann

发明人： Rolf Freimann

IPC分类号： G03B27/42

CPC分类号： G03F7/70941 ,  G01J1/04 ,  G01J1/0411 ,  G01J1/0437 ,  G01J1/4228 ,  G01J1/4257 ,  G03F7/70133 ,  G03F7/70591 ,  G03F7/706 ,  G03F7/7085

摘要： A projection exposure tool (10) for microlithography with a measuring apparatus (36) disposed in an optical path (28) of the projection exposure tool (10) for the locally and angularly resolved measurement of an irradiation strength distribution. The measuring apparatus (36) includes a measuring field with an arrangement (56) of focusing optical elements (42) disposed at respective individual points of the measuring field (41), a common image plane (44) for the focusing optical elements (42), a locally resolving radiation detector (46) with a recording surface (48) for the locally resolved recording of a radiation intensity, the recording surface (48) being disposed in the common image plane (44), and the radiation detector outputting radiation intensity signals for a plurality of angle values indicative of a respective angularly resolved irradiation strength distribution for at least one of the individual measuring field points.

摘要翻译： 一种用于微光刻的投影曝光工具（10），其具有设置在所述投影曝光工具（10）的光路（28）中的用于局部和角度分辨的辐射强度分布测量的测量装置（36）。 测量装置（36）包括测量区域，该测量区域具有设置在测量区域（41）的相应各个点处的聚焦光学元件（42）的布置（56），用于聚焦光学元件（42）的公共图像平面 ），具有用于局部解析的记录辐射强度的记录表面（48）的局部分辨放射线检测器（46），所述记录表面（48）设置在公共图像平面（44）中，并且所述辐射检测器输出辐射 强度信号，用于指示针对各个测量场点中的至少一个的相应的角度分辨的照射强度分布的多个角度值。

公开(公告)号：US09001304B2

公开(公告)日：2015-04-07

申请号：US12838393

申请日：2010-07-16

申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。

公开(公告)号：US20120140241A1

公开(公告)日：2012-06-07

申请号：US13368541

申请日：2012-02-08

申请人： Albrecht Hof ,  Dietmar Neugebauer ,  Rolf Freimann

发明人： Albrecht Hof ,  Dietmar Neugebauer ,  Rolf Freimann

IPC分类号： G01B11/02 ,  G01B9/02 ,  G02B7/182 ,  G01B11/06

CPC分类号： G03F7/70833 ,  G01B9/02027 ,  G01B9/0209 ,  G01B11/2441 ,  G01B2290/15 ,  G03F7/70233 ,  G03F7/70258

摘要： An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component.

摘要翻译： 诸如微光刻投影曝光装置的光学系统包括第一光学部件，第二光学部件和用于在六个自由度中确定第一光学部件和第二光学部件的相对位置的测量装置。 测量装置适于确定六个不同长度测量部分上的第一光学部件和第二光学部件的相对位置。 长度测量部分直接在第一光学部件和第二光学部件之间延伸。

公开(公告)号：US20100020302A1

公开(公告)日：2010-01-28

申请号：US12507694

申请日：2009-07-22

申请人： Rolf Freimann

发明人： Rolf Freimann

IPC分类号： G03B27/52 ,  G01J1/42

CPC分类号： G03F7/70941 ,  G01J1/04 ,  G01J1/0411 ,  G01J1/0437 ,  G01J1/4228 ,  G01J1/4257 ,  G03F7/70133 ,  G03F7/70591 ,  G03F7/706 ,  G03F7/7085

摘要： A projection exposure tool (10) for microlithography with a measuring apparatus (36) disposed in an optical path (28) of the projection exposure tool (10) for the locally and angularly resolved measurement of an irradiation strength distribution. The measuring apparatus (36) includes a measuring field with an arrangement (56) of focusing optical elements (42) disposed at respective individual points of the measuring field (41), a common image plane (44) for the focusing optical elements (42), a locally resolving radiation detector (46) with a recording surface (48) for the locally resolved recording of a radiation intensity, the recording surface (48) being disposed in the common image plane (44), and the radiation detector outputting radiation intensity signals for a plurality of angle values indicative of a respective angularly resolved irradiation strength distribution for at least one of the individual measuring field points.

摘要翻译： 一种用于微光刻的投影曝光工具（10），其具有设置在所述投影曝光工具（10）的光路（28）中的用于局部和角度分辨的辐射强度分布测量的测量装置（36）。 测量装置（36）包括测量区域，该测量区域具有设置在测量区域（41）的相应各个点处的聚焦光学元件（42）的布置（56），用于聚焦光学元件（42）的公共图像平面 ），具有用于局部解析的记录辐射强度的记录表面（48）的局部分辨放射线检测器（46），所述记录表面（48）设置在公共图像平面（44）中，并且所述辐射检测器输出辐射 强度信号，用于指示针对各个测量场点中的至少一个的相应的角度分辨的照射强度分布的多个角度值。

公开(公告)号：US20090231593A1

公开(公告)日：2009-09-17

申请号：US11920838

申请日：2006-05-23

申请人： Rolf Freimann ,  Ulrich Wagemann

发明人： Rolf Freimann ,  Ulrich Wagemann

IPC分类号： G01B9/021

CPC分类号： G02B27/62 ,  G01B9/02039 ,  G01M11/0221 ,  G02B5/32 ,  G03F7/70258

摘要： A method of manufacturing an optical system having plural optical elements mounted relative to each other on a mounting structure of the optical system comprises disposing the optical system in a beam path of an interferometer apparatus having an interferometer optics and a selectable hologram for shaping a beam of measuring light to be incident on surfaces of the optical elements of the optical system; selecting a first hologram of the interferometer apparatus and recording at least one first interference pattern generated by measuring light reflected from a surface of a first optical element; selecting a second hologram of the interferometer apparatus, wherein the second hologram is different from the first hologram, and recording at least one second interference pattern generated by measuring light reflected from a surface of a second optical element, which is different from the first optical element; and adjusting a position of the first optical element relative to the second optical element on the mounting structure based upon the first interference pattern and the second interference pattern.

摘要翻译： 一种制造具有在光学系统的安装结构上相对于彼此安装的多个光学元件的光学系统的方法，包括将光学系统设置在具有干涉仪光学元件和可选全息图的干涉仪装置的光束路径中， 测量入射到光学系统的光学元件的表面上的光; 选择所述干涉仪装置的第一全息图并记录通过测量从第一光学元件的表面反射的光而产生的至少一个第一干涉图案; 选择所述干涉仪装置的第二全息图，其中所述第二全息图不同于所述第一全息图，并且记录通过测量从与所述第一光学元件不同的第二光学元件的表面反射的光而产生的至少一个第二干涉图案 ; 以及基于所述第一干涉图案和所述第二干涉图案，在所述安装结构上调整所述第一光学元件相对于所述第二光学元件的位置。