公开(公告)号：US06838015B2

公开(公告)日：2005-01-04

申请号：US09945596

申请日：2001-09-04

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Pamela Jones ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B7/00 ,  C11D7/08 ,  C11D7/26 ,  C11D7/28 ,  C11D7/50 ,  C11D11/00 ,  H01L21/02 ,  H01L21/311 ,  H01L21/3213 ,  C09K13/00 ,  C09K13/04 ,  C09K13/06 ,  H01L21/302 ,  H01L21/3065

CPC分类号： H01L21/02071 ,  B08B7/0021 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/50 ,  C11D11/0047 ,  H01L21/31116

摘要： A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

公开(公告)号：US06683008B1

公开(公告)日：2004-01-27

申请号：US10299130

申请日：2002-11-19

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： H01L21302

CPC分类号： G03F7/426 ,  G03F7/422 ,  H01L21/31133

摘要： A process of removing photoresist, previously subjected to ion implantation, from the surface of a workpiece. The process involves contacting the workpiece with a composition which includes liquid or supercritical carbon dioxide and between about 2% and about 20% of an alkanol having the structural formula CxX2x+1OH, where X is fluorine, hydrogen or mixtures thereof; and x is an integer of 1 to 8, said percentages being by volume, based on the total weight of the composition.

摘要翻译： 从工件表面除去预先进行离子注入的光致抗蚀剂的工艺。 该方法包括使工件与包含液体或超临界二氧化碳的组合物和约2％至约20％的具有结构式CxX2x + 1OH的链烷醇接触，其中X为氟，氢或其混合物; 并且x是1至8的整数，所述百分比是基于组合物的总重量的体积。

公开(公告)号：US06454869B1

公开(公告)日：2002-09-24

申请号：US09893206

申请日：2001-06-27

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B304

CPC分类号： C11D3/3738 ,  B08B7/0021 ,  C11D1/004 ,  C11D3/18 ,  C11D3/245 ,  C11D11/0047 ,  G03F7/42 ,  H01L21/6704 ,  Y10S134/902

摘要： A process of cleaning semiconductor processing, handling and manufacturing equipment in which such equipment is contacted with a cleaning effective amount of liquid or supercritical carbon dioxide.

摘要翻译： 一种清洁半导体处理，处理和制造设备的方法，其中这种设备与清洁有效量的液体或超临界二氧化碳接触。

公开(公告)号：US06739346B2

公开(公告)日：2004-05-25

申请号：US10207509

申请日：2002-07-29

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B310

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US06398875B1

公开(公告)日：2002-06-04

申请号：US09893231

申请日：2001-06-27

申请人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Dario L. Goldfarb ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B304

CPC分类号： H01L21/02054 ,  H01L21/02063 ,  H01L21/67034 ,  Y10S134/902

摘要： A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

摘要翻译： 一种干燥包括设置在其上的至少一个微电结构的半导体晶片的工艺，其包括使含水薄膜覆盖的半导体晶片与包括液体或超临界二氧化碳和表面活性剂的组合物接触。

公开(公告)号：US06653233B2

公开(公告)日：2003-11-25

申请号：US09893266

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft ,  Richard P. Volant

IPC分类号： H01L2144

CPC分类号： H01L21/7684 ,  H01L21/02063

摘要： A process of providing a semiconductor device with electrical interconnection capability wherein a sacrificial material is introduced into topographical features of the semiconductor device prior to chemical mechanical polishing so that debris formed during chemical mechanical polishing is incapable of falling into topographical features present on the semiconductor device. The sacrificial material is thereupon removed by liquid or supercritical carbon dioxide.

公开(公告)号：US06457480B1

公开(公告)日：2002-10-01

申请号：US09893208

申请日：2001-06-27

申请人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

发明人： John Michael Cotte ,  Kenneth John McCullough ,  Wayne Martin Moreau ,  Keith R. Pope ,  John P. Simons ,  Charles J. Taft

IPC分类号： B08B900

CPC分类号： B08B7/0021

摘要： A process and apparatus for cleaning filters prior to recycling or disposal. In this process and apparatus liquid or supercritical carbon dioxide contacts the plugged pores of a filter under conditions in which carbon dioxide remains in the liquid or supercritical state.

摘要翻译： 用于在再循环或处理之前清洁过滤器的方法和设备。 在该方法和装置中，液体或超临界二氧化碳在二氧化碳保持在液体或超临界状态的条件下接触过滤器的堵塞孔。

公开(公告)号：US6066267A

公开(公告)日：2000-05-23

申请号：US342710

申请日：1999-06-29

申请人： David L. Rath ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Harald F. Okorn-Schmidt ,  Karen P. Madden ,  Keith R. Pope

发明人： David L. Rath ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Harald F. Okorn-Schmidt ,  Karen P. Madden ,  Keith R. Pope

IPC分类号： H01L21/306 ,  H01L21/308 ,  H01L21/311 ,  H01L21/302

CPC分类号： H01L21/31116

摘要： Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.

摘要翻译： 使用含有含氟化合物，某些有机溶剂和水的组合物来蚀刻氮化硅。

公开(公告)号：US06254796B1

公开(公告)日：2001-07-03

申请号：US09221596

申请日：1998-12-29

申请人： David L. Rath ,  Glenn W. Gale ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Karen P. Madden ,  Harald F. Okorn-Schmidt ,  Keith R. Pope

发明人： David L. Rath ,  Glenn W. Gale ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Karen P. Madden ,  Harald F. Okorn-Schmidt ,  Keith R. Pope

IPC分类号： H01L21302

CPC分类号： H01L21/31111 ,  C03C15/00 ,  C09K13/08

摘要： A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.

摘要翻译： 使用含有含氟化合物和某些有机溶剂的组合物选择性地蚀刻硅酸盐玻璃。 优选的组合物还包括水。

公开(公告)号：US5965465A

公开(公告)日：1999-10-12

申请号：US932865

申请日：1997-09-18

申请人： David L. Rath ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Harald F. Okorn-Schmidt ,  Karen P. Madden ,  Keith R. Pope

发明人： David L. Rath ,  Rangarajan Jagannathan ,  Kenneth J. McCullough ,  Harald F. Okorn-Schmidt ,  Karen P. Madden ,  Keith R. Pope

IPC分类号： H01L21/306 ,  H01L21/308 ,  H01L21/311 ,  H01L21/02

CPC分类号： H01L21/31116

摘要： Silicon nitride is etched employing a composition containing a fluoride containing compound, certain organic solvents, and water.