Method for manufacturing a semiconductor device
    14.
    发明授权
    Method for manufacturing a semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US07851260B2

    公开(公告)日:2010-12-14

    申请号:US12332146

    申请日:2008-12-10

    IPC分类号: H01L21/00

    摘要: A method for manufacturing a semiconductor device is disclosed. As a part of the method, one surface of a substrate is molded with resin where the substrate and the resin are heated in a first heating process and maintained in a flat condition. The substrate and the resin are returned to room temperature while being maintained in the flat condition after the first heating process. The resin is cut after the substrate and the resin are returned to room temperature from a surface of the resin that is opposite the surface of the resin where the substrate contacts the resin. The substrate is left intact when the resin is cut. Thereafter, the substrate is separated.

    摘要翻译: 公开了一种制造半导体器件的方法。 作为该方法的一部分,基板的一个表面用树脂模制,其中基板和树脂在第一加热过程中被加热并保持在平坦的状态。 在第一加热处理之后,将基板和树脂恢复到室温,同时保持在平坦状态。 在基板之后切割树脂,树脂从与树脂接触的树脂表面相对的树脂表面返回到室温。 当切割树脂时,基材保持不变。 此后,分离基板。