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11.发明申请公开(公告)号：US20180233318A1
公开(公告)日：2018-08-16
申请号：US15879120
申请日：2018-01-24
Applicant: KLA-Tencor Corporation
Inventor： Robert Haynes , Frank Chilese , Moshe E. Preil
Abstract: A multi-column assembly for a scanning electron microscopy (SEM) system is disclosed. The multi-column assembly includes a plurality of electron-optical columns arranged in an array defined by one or more spacings. Each electron-optical column includes one or more electron-optical elements. The plurality of electron-optical columns is configured to characterize one or more field areas on a surface of a sample secured on a stage. The number of electron-optical columns in the plurality of electron-optical columns equals an integer number of inspection areas in a field area of the one or more field areas. The one or more spacings of the plurality of electron-optical columns correspond to one or more dimensions of the inspection areas.
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公开(公告)号：US09544984B2
公开(公告)日：2017-01-10
申请号：US14335442
申请日：2014-07-18
Applicant: KLA-Tencor Corporation
Inventor： Alexander Bykanov , Oleg Khodykin , Daniel C. Wack , Konstantin Tsigutkin , Layton Hale , Joseph Walsh , Frank Chilese , Rudy F. Garcia , Brian Ahr
IPC: G01J1/42 , H05G2/00 , G01J1/16 , G01N21/956 , G03F7/20
CPC classification number: H05G2/008 , G01J1/16 , G01N21/956 , G01N2021/95676 , G01N2201/061 , G03F1/84 , G03F7/70033 , G03F7/70891 , H05H2240/00
Abstract: An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.
Abstract translation: EUV光源包括可旋转的圆柱对称元件，其具有涂覆有等离子体形成目标材料的表面;驱动激光源，被配置为产生足以通过激发等离子体产生EUV光的一个或多个激光脉冲 等离子体形成目标材料，一组聚焦光学元件，其被配置为将一个或多个激光脉冲聚焦到可旋转的圆柱形对称元件的表面上;一组收集光学器件，被配置为接收从所产生的等离子体发出的EUV光，并进一步配置 将照明引导到中间焦点，以及气体管理系统，其包括被配置为将等离子体形成目标材料供应到可旋转的圆柱对称元件的表面的气体供应子系统。
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13.发明申请METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING CONTAMINATION PROTECTION 有权使用极光紫外线灯具有污染防护的方法和装置公开(公告)号：US20140231659A1
公开(公告)日：2014-08-21
申请号：US14176587
申请日：2014-02-10
Applicant: KLA-Tencor Corporation
Inventor： Frank Chilese , John R. Torczynski , Rudy Garcia , Leonard E. Klebanoff , Gildardo R. Delgado , Daniel J. Rader , Anthony S. Geller , Michail A. Gallis
CPC classification number: G01N21/59 , G03F7/70933 , G03F7/70983
Abstract: An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled. to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.
Abstract translation: 一种用于极紫外（EUV）光的装置，包括：A）具有第一端开口，第二端开口和中间开口的管道，所述第一端开口位于第二端开口的中间，B）设置成接收EUV光的光学部件 从第二端开口或通过第二端开口发射光，以及C）处于第一压力的低压气体源流过管道，该气体具有高透光率的EUV光，其流体耦合到中间开口 。 除了或不是气流，装置可具有A）具有热耦合的热控制单元的低压气体。 到所述管道和所述光学部件中的至少一个和/或B）在所述二重体的第一部分和第二部分之间产生电压的电压装置，其间具有接地绝缘部分。
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公开(公告)号：US09810991B2
公开(公告)日：2017-11-07
申请号：US14578301
申请日：2014-12-19
Applicant: KLA-Tencor Corporation
Inventor： Frank Chilese , Gildardo Delgado , Rudy F. Garcia
CPC classification number: G03F7/70033 , G03F7/70925 , G03F7/70933
Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.
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公开(公告)号：US20150253675A1
公开(公告)日：2015-09-10
申请号：US14578301
申请日：2014-12-19
Applicant: KLA-Tencor Corporation
Inventor： Frank Chilese , Gildardo Delgado , Rudy F. Garcia
IPC: G03F7/20
CPC classification number: G03F7/70033 , G03F7/70925 , G03F7/70933
Abstract: A system for cleaning or suppressing contamination or oxidation in a EUV optical setting includes an illumination source, a detector, a first set of optical elements to direct light from the illumination source to a specimen and a second set of optical elements to receive illumination from the specimen and direct the illumination to the detector. The system also includes one or more vacuum chambers for containing the first and second set of optical elements and containing a selected purge gas ionizable by the light emitted by the illumination source. The first or second set of optical elements includes an electrically biased optical element having at least one electrically biased surface. The electrically biased optical element has a bias configuration suitable to attract one or more ionic species of the selected purge gas to the electrically biased surface in order to clean contaminants from the electrically biased surface.
Abstract translation: 用于清洁或抑制EUV光学设置中的污染或氧化的系统包括照明源，检测器，用于将来自照明源的光引导到样本的第一组光学元件和第二组光学元件，以从 标本并将照明指示到检测器。 该系统还包括一个或多个真空室，用于容纳第一组光学元件和第二组光学元件并且包含可由照射源发射的光可离子化的选定的吹扫气体。 第一或第二组光学元件包括具有至少一个电偏置表面的电偏置光学元件。 电偏置光学元件具有适于将所选择的净化气体的一种或多种离子种类吸引到电偏压表面的偏置构型，以便从电偏压表面清洁污染物。
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Patent Agency Ranking
公开(公告)号：US20140151580A1
公开(公告)日：2014-06-05
申请号：US14082676
申请日：2013-11-18
Applicant: KLA-Tencor Corporation
Inventor： Daimian Wang , Frank Chilese
IPC: G02B27/09
CPC classification number: G02B19/0095 , G02B27/0994 , G03F1/22 , G03F1/84 , Y10T29/49002
Abstract: The present invention is a light homogenizer or light tunnel with highly reflective sides that enable the focusing of EUV illumination. The sides of the homogenizer are cut from a highly polished silicon wafer. The wafer is coated with a reflective coating before the strips are cut from the wafer. The invention also includes a method for flattening the strips and applying a backing to the strips enabling easier manipulation of the strips during assembly and use.
Abstract translation: 本发明是具有高反射侧的光均化器或光通道，其能够聚焦EUV照明。 从高度抛光的硅晶片切割均质器的侧面。 在晶片从晶片切割之前，晶片被涂覆有反射涂层。 本发明还包括一种用于使条带平坦化并将背衬施加到条上的方法，使得在组装和使用期间能够更容易地操纵条。
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17.发明申请SMART MEMORY ALLOYS FOR AN EXTREME ULTRA-VIOLET (EUV) RETICLE INSPECTION TOOL 审中-公开用于超级超紫外线（EUV）试剂检测工具的智能记忆合金公开(公告)号：US20130270461A1
公开(公告)日：2013-10-17
申请号：US13860198
申请日：2013-04-10
Applicant: KLA-TENCOR CORPORATION
Inventor： Gildardo Delgado , Frank Chilese
Abstract: An apparatus for actinic extreme ultra-violet (EUV) reticle inspection including at least one shape memory metal actuator adapted to displace an inspection component in an EUV inspection tool. An apparatus for actinic EUV reticle inspection including a tilt mechanism including at least one shape memory metal actuator adapted to angularly displace an inspection component in an EUV inspection tool. An apparatus for actinic EUV reticle inspection, including a translation stage adapted to fixedly connect to an inspection component, at least one flexure stage, and at least one shape memory metal actuator adapted to displace the translation stage.
Abstract translation: 一种用于光化极紫外（EUV）掩模版检查的装置，其包括至少一种形状记忆金属致动器，其适于移动EUV检查工具中的检查部件。 一种用于光化性EUV掩模版检查的装置，包括倾斜机构，该倾斜机构包括至少一种形状记忆金属致动器，其适于使EUV检查工具中的检查部件成角度地移位。 一种用于光化性EUV掩模版检查的装置，包括适于固定地连接到检查部件的平移台，至少一个挠曲台，以及适于移动平移台的至少一个形状记忆金属致动器。
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公开(公告)号：US20130235357A1
公开(公告)日：2013-09-12
申请号：US13790764
申请日：2013-03-08
Applicant: KLA-TENCOR CORPORATION
Inventor： Gildardo Delgado , Frank Chilese
IPC: G03F7/20
CPC classification number: G03F7/70908
Abstract: Controlling particles near a reticle of a lithography or reticle inspection system may include generating a curtain of ultraviolet light about a reticle protection area of a reticle by illuminating a region surrounding the reticle protection area with ultraviolet light having sufficient energy to induce a charge on one or more particles traversing the curtain of ultraviolet light, generating an electric field in a region positioned between the generated curtain of ultraviolet light and the reticle protection area, the electric field generated between a first charging element and a second charging element having an opposite charge to the first charging element, directing one or more charged particles to the first charging element or the second charging element using the generated electric field; and capturing the one or more charged particles on the first charging element or the second charging element.
Abstract translation: 在光刻或掩模版检查系统的掩模版附近的控制颗粒可以包括通过用足够的能量的紫外线照射掩模版保护区域周围的区域来在掩模版保护区域附近产生紫外光幕，以在一个或 更多的粒子穿过紫外线的窗帘，在位于所生成的紫外光之间的区域和标线保护区域之间产生电场，在第一充电元件和具有相反电荷的第二充电元件之间产生的电场 第一充电元件，使用所产生的电场将一个或多个带电粒子引导到第一充电元件或第二充电元件; 以及捕获所述第一充电元件或所述第二充电元件上的所述一个或多个带电粒子。
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19.发明授权公开(公告)号：US10021773B2
公开(公告)日：2018-07-10
申请号：US15265515
申请日：2016-09-14
Applicant: KLA-Tencor Corporation
Inventor： Alexey Kuritsyn , Brian Ahr , Rudy F. Garcia , Frank Chilese , Oleg Khodykin
IPC: H05G2/00
CPC classification number: H05G2/008
Abstract: The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.
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公开(公告)号：US09448343B2
公开(公告)日：2016-09-20
申请号：US13837765
申请日：2013-03-15
Applicant: KLA-Tencor Corporation
Inventor： Damon Kvamme , Frank Chilese
IPC: G01N21/88 , G02B5/08 , G02B5/09 , G03F1/84 , G01N21/956
CPC classification number: G02B5/0891 , G01N21/8806 , G01N21/956 , G02B5/09 , G03F1/84
Abstract: An apparatus for inspecting a photomask, comprising an illumination source for generating a light which illuminates a target substrate, objective optics for receiving and projecting the light which is reflected from the target substrate, the objective optics includes a first mirror arranged to receive and reflect the light which is reflected from the target substrate, a second mirror which is arranged to receive and reflect the light which is reflected by the first mirror, a third mirror which is arranged to receive and reflect the light which is reflected by the second mirror, and a segmented mirror which is arranged to receive and reflect the light which is reflected by the third mirror. The segmented mirror includes at least two mirror segments. The apparatus further includes at least one sensor for detecting the light which is projected by the objective optics.
Abstract translation: 一种用于检查光掩模的装置，包括用于产生照射目标基板的光的照明源，用于接收和投射从目标基板反射的光的物镜，所述物镜包括第一反射镜，其布置成接收和反射 从目标基板反射的光，被配置为接收和反射由第一反射镜反射的光的第二反射镜，布置成接收和反射由第二反射镜反射的光的第三反射镜，以及 被布置成接收和反射由第三反射镜反射的光的分段镜。 分段镜包括至少两个镜片段。 该装置还包括至少一个用于检测由物镜光学器件投影的光的传感器。
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