公开(公告)号：US10770258B2

公开(公告)日：2020-09-08

申请号：US16105632

申请日：2018-08-20

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/153

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20190006143A1

公开(公告)日：2019-01-03

申请号：US16105632

申请日：2018-08-20

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US10090131B2

公开(公告)日：2018-10-02

申请号：US15371557

申请日：2016-12-07

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147

Abstract: An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US09905391B2

公开(公告)日：2018-02-27

申请号：US14826007

申请日：2015-08-13

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang

IPC: H01J1/50 ,  H01J37/05

CPC classification number: H01J37/05 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: A selectively configurable system for directing an electron beam with a limited energy spread to a sample includes an electron source to generate an electron beam having an energy spread including one or more energies, an aperture having an on-axis opening and an off-axis opening, a first assembly of one or more electron lenses with selectively configurable focal powers positioned to collect the beam from the source and direct the beam to the aperture, a second assembly of one or more selectively configurable electron lenses positioned to collect the beam, a sample stage, and an electron inspection sub-system including electron optics positioned to direct the beam onto one or more samples. The first assembly includes an off-axis electron lens for interacting with the beam at an off-axis position and introducing spatial dispersion to the beam when configured with a nonzero focal power, thus filtering the energy spread.

公开(公告)号：US20200118784A1

公开(公告)日：2020-04-16

申请号：US16230325

申请日：2018-12-21

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/12 ,  H01J37/06

Abstract: An optical characterization system utilizing a micro-lens array (MLA) is provided. The system may include an electron source and a MLA including a micro-deflection array (MDA). The MDA may include an insulator substrate and a plurality of hexapole electrostatic deflectors disposed on the insulator substrate. The MDA may further include a plurality of voltage connecting lines configured to electrically couple the plurality of hexapole electrostatic deflectors to one or more voltage sources. The MDA may be configured to split a primary electron beam from the electron source into a plurality of primary electron beamlets. The system may be configured to focus the plurality of primary electron beamlets at a wafer plane.

公开(公告)号：US20180158644A1

公开(公告)日：2018-06-07

申请号：US15371557

申请日：2016-12-07

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/1508 ,  H01J2237/28

Abstract: An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US20170047193A1

公开(公告)日：2017-02-16

申请号：US15231728

申请日：2016-08-08

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Harsh Sinha ,  David Trease ,  David Kaz ,  Wei Ye

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: An electron-optical system for inspecting or reviewing an edge portion of a sample includes an electron beam source configured to generate one or more electron beams, a sample stage configured to secure the sample and an electron-optical column including a set of electron-optical elements configured to direct at least a portion of the one or more electron beams onto an edge portion of the sample. The system also includes a sample position reference device disposed about the sample and a guard ring device disposed between the edge of the sample and the sample position reference device to compensate for one or more fringe fields. One or more characteristics of the guard ring device are adjustable. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

Abstract translation: 用于检查或检查样品的边缘部分的电子光学系统包括被配置为产生一个或多个电子束的电子束源，被配置为固定样品的样品台和包括一组电子光学的电子 - 光学柱 被配置为将一个或多个电子束的至少一部分引导到样品的边缘部分上的元件。 该系统还包括围绕样品设置的样品位置参考装置和设置在样品边缘与样品位置参考装置之间的保护环装置，以补偿一个或多个边缘场。 保护环装置的一个或多个特性是可调节的。 该系统还包括被配置为检测从样品表面发出的电子的检测器组件。

公开(公告)号：US08921782B2

公开(公告)日：2014-12-30

申请号：US13846548

申请日：2013-03-18

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Ichiro Honjo ,  Christopher Malcolm Stanley Sears ,  Liqun Han

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/263 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/1534

Abstract: One embodiment relates to a tilt-imaging scanning electron microscope apparatus. The apparatus includes an electron gun, first and second deflectors, an objective electron lens, and a secondary electron detector. The first deflector deflects the electron beam away from the optical axis, and the second deflector deflects the electron beam back towards the optical axis. The objective lens focuses the electron beam onto a spot on a surface of a target substrate, wherein the electron beam lands on the surface at a tilt angle. Another embodiment relates to a method of imaging a surface of a target substrate using an electron beam with a trajectory tilted relative to a substrate surface. Other embodiments and features are also disclosed.

Abstract translation: 一个实施例涉及一种倾斜成像扫描电子显微镜装置。 该装置包括电子枪，第一和第二偏转器，物镜电子透镜和二次电子检测器。 第一偏转器使电子束偏离光轴，第二偏转器将电子束偏转回光轴。 物镜将电子束聚焦到目标衬底表面上的一个点上，其中电子束以倾斜角落在表面上。 另一实施例涉及使用具有相对于衬底表面倾斜的轨迹的电子束对目标衬底的表面进行成像的方法。 还公开了其它实施例和特征。