公开(公告)号：US07472071B2

公开(公告)日：2008-12-30

申请号：US09447259

申请日：1999-11-23

Applicant: James D. Marks ,  Robert Weaver ,  Jeremy Shao

Inventor： James D. Marks ,  Robert Weaver ,  Jeremy Shao

IPC: G06F9/44

CPC classification number: G06Q10/10 ,  G06Q10/06311 ,  G06Q40/08 ,  G09B7/00

Abstract: A method, executed by a server, for providing answers on one or more topics from a set of experts on each topic to questions posed by users. Users can direct questions to one or more specific experts, who in turn can answer the questions, refer the questions to other experts, or both. The server automatically organizes and stores questions and answers in various fora. An administrator can take advantage of the design of the system to create or change a forum without having to write or change low-level code.

Abstract translation: 由服务器执行的用于从关于每个主题的一组专家提供关于用户提出的问题的一个或多个主题的答案的方法。 用户可以向一个或多个特定专家提出问题，反过来可以回答问题，将问题转交给其他专家或两者。 服务器自动组织和存储各种论坛的问题和答案。 管理员可以利用系统的设计来创建或更改论坛，而无需编写或更改低级代码。

公开(公告)号：US20070221502A1

公开(公告)日：2007-09-27

申请号：US11739553

申请日：2007-04-24

Applicant: Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

Inventor： Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

IPC: C25D21/12

CPC classification number: G05B19/41875 ,  C25D7/123 ,  C25D17/001 ,  C25D21/12 ,  G05B2219/32182 ,  G05B2219/32216 ,  G05B2219/45031 ,  Y02P90/22 ,  Y02P90/265

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

Abstract translation: 描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。 该设施最初根据处理室的数值或从操作实际处理室得到的实验数据来配置电参数。 在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数值模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。 然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。

公开(公告)号：US20070193993A1

公开(公告)日：2007-08-23

申请号：US11357862

申请日：2006-02-21

Applicant: Randall Burt ,  Jon Chiappone ,  Craig Dallam ,  Robert Weaver

Inventor： Randall Burt ,  Jon Chiappone ,  Craig Dallam ,  Robert Weaver

IPC: B23K35/22

CPC classification number: B23K9/02 ,  B23K35/3053 ,  B23K35/368

Abstract: A stick electrode for depositing an high strength weld metal bead on a workpiece where the yield strength of the weld metal is between 85 ksi and 125 ksi irrespective of the cooling rate. The electrode deposits weld metal having 0.80-1.85% by weight manganese, 0.25-0.50% by weight molybdenum, 1.25-2.50% by weight nickel, and less than 0.07% by weight carbon, wherein the ratios of the carbon, manganese and molybdenum are adjusted to provide a carbon equivalent in deposited weld metal in the range of 0.17 to 0.30 and preferably less than 0.22.

Abstract translation: 用于在工件上沉积高强度焊接金属珠的棒状电极，其中焊接金属的屈服强度在85ksi和125ksi之间，而与冷却速度无关。 电极沉积焊接金属，其具有0.80-1.85重量％的锰，0.25-0.50重量％的钼，1.25-2.50重量％的镍和小于0.07重量％的碳，其中碳，锰和钼的比例为 调整为在0.17至0.30，优选小于0.22的范围内提供沉积焊接金属中的碳当量。

公开(公告)号：US20060000716A1

公开(公告)日：2006-01-05

申请号：US11038455

申请日：2005-01-18

Applicant: Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

Inventor： Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

IPC: C25D21/12 ,  C25D5/00

CPC classification number: C25D5/08 ,  C25D7/123 ,  C25D17/001 ,  C25D17/12 ,  C25D21/12 ,  Y10S204/07

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.

公开(公告)号：US20050183959A1

公开(公告)日：2005-08-25

申请号：US11097508

申请日：2005-03-31

Applicant: Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

Inventor： Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

IPC: C23C14/54 ,  C23C16/52 ,  C25D7/12 ,  C25D21/12 ,  C25D5/02

CPC classification number: C23C16/52 ,  C23C14/545 ,  C25D7/123 ,  C25D21/12

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.

Abstract translation: 描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。 该设备最初根据处理室的数学模型或从操作实际处理室得到的实验数据来初始配置电参数。 在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数学模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。 然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。 在一些实施例中，设备分析施加到工件的种子层的轮廓，并且确定并传送材料沉积工具一组控制参数，这些控制参数被设计成以补偿种子层中的缺陷的方式在工件上沉积材料 。

公开(公告)号：US20050167274A1

公开(公告)日：2005-08-04

申请号：US11097068

申请日：2005-03-31

Applicant: Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

Inventor： Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf

IPC: B23H3/02 ,  C25B9/00 ,  C25C3/16 ,  C25C3/20 ,  C25D5/00 ,  C25D5/02 ,  C25D17/00 ,  C25D21/12 ,  C25F7/00 ,  G06F19/00

CPC classification number: C25D21/12 ,  C25D17/001 ,  C25F3/30

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.

公开(公告)号：US20050145060A1

公开(公告)日：2005-07-07

申请号：US11064588

申请日：2005-02-23

Applicant: Robert Weaver

Inventor： Robert Weaver

IPC: F01M11/02 ,  F16C7/02 ,  F16C33/10 ,  B29C49/00 ,  G05G1/00

CPC classification number: F01M11/02 ,  F01M2011/025 ,  F01M2011/027 ,  F16C7/023 ,  F16C33/10 ,  F16C2360/22 ,  Y10T74/2159

Abstract: An internal combustion engine connecting rod, having an embodiment defining a hollow beam member and a process of manufacture are disclosed. The improvement substantially reduces beam tensile and compressive stress levels through application of elliptical and oval beam sections, conserving reciprocating and rotating connecting rod weight required in high performance engine applications.

Abstract translation: 公开了具有限定中空梁构件的实施例和制造工艺的内燃机连杆。 该改进通过应用椭圆形和椭圆形的梁部分大大降低了梁的拉伸和压缩应力水平，节省了高性能发动机应用中所需的往复和旋转连杆重量。

公开(公告)号：US20050084987A1

公开(公告)日：2005-04-21

申请号：US10970809

申请日：2004-10-20

Applicant: Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf,

Inventor： Gregory Wilson ,  Paul McHugh ,  Robert Weaver ,  Thomas Ritzdorf,

IPC: C23C14/54 ,  C23C16/52 ,  C25D5/00 ,  C25D7/12 ,  C25D17/00 ,  C25D21/12 ,  G06F17/50 ,  G06F19/00 ,  H01L21/00

CPC classification number: C23C16/52 ,  C23C14/545 ,  C25D7/123 ,  C25D21/12 ,  G05B2219/37576 ,  G05B2219/45031

Abstract: A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a mathematical model of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the mathematical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters. In some embodiments, the facility analyzes a profile of the seed layer applied to a workpiece, and determines and communicates to a material deposition tool a set of control parameters designed to deposit material on the workpiece in a manner that compensates for deficiencies in the seed layer.

Abstract translation: 描述了一种用于选择和精炼用于在处理室中处理微电子工件的电参数的设备。 该设备最初根据处理室的数学模型或从操作实际处理室得到的实验数据来初始配置电参数。 在用初始参数配置处理工件之后，测量结果，并且使用基于处理室的数学模型的灵敏度矩阵来选择校正在第一工件的处理中测量的任何缺陷的新参数。 然后将这些参数用于处理可以类似地测量的第二工件，并且用于进一步改进参数的结果。 在一些实施例中，设备分析施加到工件的种子层的轮廓，并且确定并传送材料沉积工具一组控制参数，这些控制参数被设计成以补偿种子层中的缺陷的方式在工件上沉积材料 。

公开(公告)号：US4154255A

公开(公告)日：1979-05-15

申请号：US927281

申请日：1978-07-24

Applicant: Robert Weaver

Inventor： Robert Weaver

IPC: A45B23/00 ,  A45B11/00 ,  A45B25/28

CPC classification number: A45B23/00 ,  A45B2023/0012

Abstract: A novel article retaining web for use with beach umbrellas is disclosed. The web is designed for use with an umbrella having a central supporting pole, a plurality of spokes pivotally attached thereto and a plurality of struts extending from a position along the pole generally upwardly to engage the spokes to brace the same when the umbrella is in the open position. The web is characterized by a substantially circular flexible net having a central aperture defined therein, a substantially inelastic reinforcing strip disposed around the perimeter of the net, and a plurality of attachments periodically disposed along the reinforcing strip, one for each spoke of the umbrella for suspending the web from the umbrellas spokes. The sizing and spacing of the above-mentioned components is such that article access apertures are created between portions of the umbrella located between the spokes and the portions of the webbing suspended from those spokes.

Abstract translation: 披露了一种用于海滩遮阳伞使用的新颖物品。 腹板设计用于具有中央支撑杆的伞形物，多个辐条，其可旋转地附接到其上，并且多个支柱从一般地沿着杆的位置大致向上延伸以接合辐条以在伞处于其中时支撑辐条 开仓 腹板的特征在于具有限定在其中的中心孔的基本圆形的柔性网，围绕网的周边设置的基本上非弹性的加强条，以及沿着加强条周期性地设置的多个附件，一个用于伞的每个轮辐， 将网络从雨伞轮辐上吊起来。 上述部件的尺寸和间距使得在位于轮辐与从这些轮辐悬挂的织带的部分之间的伞的部分之间产生物品进入孔。

公开(公告)号：US20130314728A1

公开(公告)日：2013-11-28

申请号：US13983908

申请日：2012-02-08

Applicant: Robert Weaver

Inventor： Robert Weaver

IPC: G06K15/02

Abstract: A method of printing a product code includes providing a printer and a substrate. A product code is determined. The product code includes a plurality of characters and a key code. The key code includes an interleaved character including a combination of a first character and a second character selected from the plurality of characters. The printer is controlled to print the product code on the substrate.

Abstract translation: 打印产品代码的方法包括提供打印机和基板。 确定产品代码。 产品代码包括多个字符和键码。 键代码包括包括从多个字符中选择的第一个字符和第二个字符的组合的交错字符。 控制打印机在基板上打印产品代码。