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11.发明授权公开(公告)号：US09134603B2
公开(公告)日：2015-09-15
申请号：US13856477
申请日：2013-04-04
Inventor： Min Kang , Bong-Yeon Kim , Jeong Won Kim , Hyang-Shik Kong , Jin Ho Ju , Kyoung Sik Kim , Seung Hwa Baek , Jun Hyuk Woo , Hyun Joo Lee
IPC: G03F1/38
Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.
Abstract translation: 用于曝光的光掩模包括：透明基板; 位于所述透明基板上的遮光图案层; 位于所述遮光图案层上并包括电介质材料的第一电介质层; 以及负折射率层，其位于所述第一电介质层上并且包括金属。 用于曝光的光掩模的表面等离子体激元准结合模式与将光照射到光掩模进行曝光的光曝光器的光源的波长范围重叠。
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公开(公告)号：US08895214B2
公开(公告)日：2014-11-25
申请号：US14180234
申请日：2014-02-13
Applicant: Samsung Display Co., Ltd.
Inventor： Bong-Yeon Kim , Min Kang , Jeong Won Kim , Jin Ho Ju , Jun Hyuk Woo , Hyun Joo Lee
IPC: G03F1/32
Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
Abstract translation: 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。
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13.发明申请公开(公告)号：US20140076847A1
公开(公告)日：2014-03-20
申请号：US13857554
申请日：2013-04-05
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
CPC classification number: G03F7/022 , B05D3/107 , B21B27/10 , B21B45/02 , G03F7/00 , G03F7/0045 , G03F7/40
Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
Abstract translation: 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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14.发明申请公开(公告)号：US20170371238A1
公开(公告)日：2017-12-28
申请号：US15699955
申请日：2017-09-08
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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公开(公告)号：US09778558B2
公开(公告)日：2017-10-03
申请号：US14752415
申请日：2015-06-26
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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Patent Agency Ranking
16.发明授权公开(公告)号：US08911926B2
公开(公告)日：2014-12-16
申请号：US13857554
申请日：2013-04-05
Applicant: Samsung Display Co., Ltd.
Inventor： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
CPC classification number: G03F7/022 , B05D3/107 , B21B27/10 , B21B45/02 , G03F7/00 , G03F7/0045 , G03F7/40
Abstract: A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
Abstract translation: 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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公开(公告)号：US08691479B1
公开(公告)日：2014-04-08
申请号：US13779482
申请日：2013-02-27
Applicant: Samsung Display Co., Ltd.
Inventor： Bong-Yeon Kim , Min Kang , Jeong Won Kim , Jin Ho Ju , Jun Hyuk Woo , Hyun Joo Lee
IPC: G03F1/32
Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.
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公开(公告)号：US10338463B2
公开(公告)日：2019-07-02
申请号：US15699955
申请日：2017-09-08
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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19.发明授权Manufacturing method of reflective polarizer plate and display device including the same 有权反射偏振板的制造方法及包括其的显示装置公开(公告)号：US09400346B2
公开(公告)日：2016-07-26
申请号：US14572937
申请日：2014-12-17
Applicant: Samsung Display Co., Ltd.
Inventor： Tae-Woo Kim , Cheol-Kyu Kim , Min Kang , Min-Hyuck Kang , Bong-Yeon Kim , Seung-Won Park , Moon-Gyu Lee
CPC classification number: G02B5/3058 , B82Y20/00 , G02B5/3041 , Y10S977/762
Abstract: A display device includes a reflective polarizer plate including a first substrate defining an opening area and a non-opening area, and a wire grid polarizer which is disposed on a surface of the first substrate and includes a polarizing part including a plurality of nano wire patterns which is arranged in the opening area to be spaced apart from each other, and a reflecting part including a metal film provided in the non-opening area.
Abstract translation: 一种显示装置，包括：反射偏振板，包括限定开口区域和非开口区域的第一基板;以及线栅偏振器，其设置在所述第一基板的表面上，并且包括偏振部件，所述偏振部件包括多个纳米线图案 其布置在彼此间隔开的开口区域中，以及反射部分，其包括设置在非开口区域中的金属膜。
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20.发明申请MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME 有权用于光刻机的掩模，其制造方法和使用其制造基板的方法公开(公告)号：US20160033857A1
公开(公告)日：2016-02-04
申请号：US14752415
申请日：2015-06-26
Inventor： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
Abstract: A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
Abstract translation: 用于光刻的掩模包括：透明基板; 在所述透明基板上的相移图案，并且被配置为改变光的相位; 透明基板上的介电层; 和在介电层上的负折射率超材料层。
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