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公开(公告)号：US20160139504A1
公开(公告)日：2016-05-19
申请号：US14678743
申请日：2015-04-03
发明人： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
CPC分类号： G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
摘要： A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
摘要翻译： 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 发送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。
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公开(公告)号：US09575405B2
公开(公告)日：2017-02-21
申请号：US14678743
申请日：2015-04-03
发明人： Jun-Hyuk Woo , Jeong-Won Kim , Kwang-Woo Park , Dong-Eon Lee , Seung-Bo Shim , Jin-Ho Ju
CPC分类号： G03F1/38 , G03F1/54 , G03F1/58 , G03F1/80 , G03F7/0007
摘要： A photo mask includes a transparent substrate and a mask pattern. The mask pattern is disposed on the transparent substrate. The mask pattern includes a blocking portion for blocking light and a transmitting portion for transmitting the light. The transmitting portion is adjacent to the blocking portion. The blocking portion includes a first blocking layer, a photo guide layer and a second blocking layer. The first blocking layer is disposed on the transparent substrate. The first blocking layer transmits a portion of the light. The first blocking layer includes a plurality of blocking patterns including a first blocking material. The photo guide layer is disposed on the first blocking layer. The photoguide layer guides the transmitted portion of the light to a side surface of the photoguide layer. The second blocking layer reflects the transmitted portion of the light.
摘要翻译： 光掩模包括透明基板和掩模图案。 掩模图案设置在透明基板上。 掩模图案包括用于遮挡光的阻挡部分和用于透射光的透射部分。 传送部分与阻挡部分相邻。 阻挡部分包括第一阻挡层，光引导层和第二阻挡层。 第一阻挡层设置在透明基板上。 第一阻挡层透射光的一部分。 第一阻挡层包括多个阻挡图案，包括第一阻挡材料。 光引导层设置在第一阻挡层上。 光导层将光的透射部分引导到光导层的侧表面。 第二阻挡层反射光的透射部分。
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3.发明授权公开(公告)号：US08911926B2
公开(公告)日：2014-12-16
申请号：US13857554
申请日：2013-04-05
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译： 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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4.发明授权公开(公告)号：US09490278B2
公开(公告)日：2016-11-08
申请号：US14740378
申请日：2015-06-16
发明人： Kwang-Woo Park , Jeong-Won Kim , Jun-Hyuk Woo , Gwui-Hyun Park , Jin-Ho Ju
CPC分类号： H01L27/1288 , G02B1/08 , G02B5/3033 , G02B5/3058 , G02F1/1303 , G03F1/38 , H01L29/66969 , H01L29/7869
摘要： According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.
摘要翻译： 根据本发明的示例性实施例，光掩模包括透明基板和偏振图案。 偏光图案设置在透明基板上。 偏光图案使光线偏光。
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公开(公告)号：US09069258B2
公开(公告)日：2015-06-30
申请号：US13835567
申请日：2013-03-15
发明人： Bong-Yeon Kim , Min Kang , Seung-Bo Shim , Jong-kwang Lee , Jin-Ho Ju , Jeong-Won Kim , Tae-Gyun Kim , Chul-Won Park , Jun-Hyuk Woo , Hyun-Joo Lee
IPC分类号： G03F1/42
CPC分类号： G03F1/42
摘要： A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
摘要翻译： 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。
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6.发明授权Photoresist composition and method of manufacturing thin film transistor substrate using the same 有权光刻胶组合物和使用其制造薄膜晶体管基板的方法公开(公告)号：US09176383B2
公开(公告)日：2015-11-03
申请号：US14531758
申请日：2014-11-03
发明人： Jeong-Won Kim , Ki-Hyun Cho , Kwang-Woo Park , Chul-Won Park , Jin-Ho Ju , Dong-Min Kim , Eun Jeagal
IPC分类号： G03F7/075 , G03F7/039 , G03F7/022 , G03F7/30 , G03F7/36 , G03F7/42 , H01L21/027 , H01L27/12 , H01L21/3213
CPC分类号： G03F7/0752 , G03F7/0048 , G03F7/022 , G03F7/0233 , G03F7/0236 , G03F7/039 , G03F7/0757 , G03F7/30 , G03F7/36 , G03F7/42 , H01L21/0271 , H01L21/0274 , H01L21/32133 , H01L21/32139 , H01L27/1288
摘要： A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
摘要翻译： 光致抗蚀剂组合物可以包括酚醛清漆树脂，二叠氮基感光性化合物，下述化学式1表示的表面活性剂和溶剂。 R1和R2可以表示氢原子或烷基，x可以是10-50，y可以是10-50。
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7.发明授权Display substrate having a thin film transistor and method of manufacturing the same 有权具有薄膜晶体管的显示基板及其制造方法公开(公告)号：US09117768B2
公开(公告)日：2015-08-25
申请号：US14148386
申请日：2014-01-06
发明人： Ki-Hyun Cho , Jeong-Won Kim , Kwang-Woo Park , Chul-Won Park
IPC分类号： H01L21/311 , H01L27/12 , H01L27/32
CPC分类号： H01L21/31116 , H01L21/31105 , H01L21/31111 , H01L27/1225 , H01L27/1248 , H01L27/127 , H01L27/1288 , H01L27/3244 , H01L27/3248 , H01L27/3258 , H01L27/326 , H01L27/3262 , H01L27/3276
摘要： In a method for manufacturing a display substrate, a thin film transistor is formed on a base substrate. The thin film transistor includes a gate electrode, an active pattern, a source electrode and a drain electrode. A first passivation layer is formed to cover the thin film transistor. A second passivation layer is formed on the first passivation layer. A photoresist pattern is formed to partially expose the second passivation layer. The first passivation layer and the second passivation layer are partially removed to form a contact hole exposing the drain electrode. A pixel electrode layer is formed on the second passivation layer, the drain electrode and the photoresist pattern. A portion of the pixel electrode layer and the second photoresist pattern are removed to form a pixel electrode. The portion of the pixel electrode layer is disposed on a top surface and a sidewall of the photoresist pattern.
摘要翻译： 在显示基板的制造方法中，在基底基板上形成薄膜晶体管。 薄膜晶体管包括栅电极，有源图案，源电极和漏电极。 形成第一钝化层以覆盖薄膜晶体管。 在第一钝化层上形成第二钝化层。 形成光致抗蚀剂图案以部分地暴露第二钝化层。 部分去除第一钝化层和第二钝化层以形成暴露漏电极的接触孔。 在第二钝化层，漏电极和光致抗蚀剂图案上形成像素电极层。 去除像素电极层和第二光致抗蚀剂图案的一部分以形成像素电极。 像素电极层的部分设置在光致抗蚀剂图案的顶表面和侧壁上。
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8.发明申请公开(公告)号：US20140076847A1
公开(公告)日：2014-03-20
申请号：US13857554
申请日：2013-04-05
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译： 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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