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1.发明授权公开(公告)号：US09733569B2
公开(公告)日：2017-08-15
申请号：US14697068
申请日：2015-04-27
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Jin-Ho Ju
CPC分类号： G03F7/32 , G02B5/1866 , G03F1/38 , G03F7/0007 , G03F7/16 , G03F7/20 , G03F7/2053
摘要： A mask includes a transparent substrate and a light blocking pattern. The light blocking pattern includes a light blocking part and a diffraction pattern. The light blocking part is disposed on the transparent substrate and is configured to block light. The diffraction pattern includes a plurality of protrusion parts and is configured to diffract the light. The plurality of protrusion parts protrudes from a side of the blocking part and is separated from each other.
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公开(公告)号：US09069258B2
公开(公告)日：2015-06-30
申请号：US13835567
申请日：2013-03-15
发明人： Bong-Yeon Kim , Min Kang , Seung-Bo Shim , Jong-kwang Lee , Jin-Ho Ju , Jeong-Won Kim , Tae-Gyun Kim , Chul-Won Park , Jun-Hyuk Woo , Hyun-Joo Lee
IPC分类号： G03F1/42
CPC分类号： G03F1/42
摘要： A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
摘要翻译： 掩模可以包括电路区域和像素区域。 电路区域包括电路图案。 像素区域包括在长度方向上延伸的像素图案和处于像素图案的端部并且与电路区域相邻的辅助图案。
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3.发明申请公开(公告)号：US20140076847A1
公开(公告)日：2014-03-20
申请号：US13857554
申请日：2013-04-05
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译： 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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4.发明授权Phase shift mask, patterning method using the same and method of manufacturing display panel using the same 有权相移掩模，使用其的图案化方法以及使用其的显示面板的制造方法公开(公告)号：US09395619B2
公开(公告)日：2016-07-19
申请号：US14307797
申请日：2014-06-18
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Dong-Eon Lee , Jun-Hyuk Woo , Hyun-Joo Lee , Sang-Uk Lim , Jin-Ho Ju
CPC分类号： G03F1/26 , G02F2001/136231 , G03F7/20 , G03F7/40 , H01L27/1288
摘要： A phase shift device includes a phase shift mask which includes a transparent substrate, and a phase shift pattern which is provided on the transparent substrate, and includes a first area having a first thickness, a second area having a second thickness which is less than the first thickness, a first opening having a first opening width and defined at the first area, and a second opening having a second opening width and defined at the second area.
摘要翻译： 相移装置包括：包括透明基板的相移掩模和设置在透明基板上的相移图案，并且包括具有第一厚度的第一区域，第二区域的第二厚度小于 第一厚度，具有第一开口宽度并限定在第一区域的第一开口，以及具有第二开口宽度并限定在第二区域的第二开口。
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5.发明申请公开(公告)号：US20170371238A1
公开(公告)日：2017-12-28
申请号：US15699955
申请日：2017-09-08
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
摘要： A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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公开(公告)号：US09778558B2
公开(公告)日：2017-10-03
申请号：US14752415
申请日：2015-06-26
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
摘要： A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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7.发明授权公开(公告)号：US08911926B2
公开(公告)日：2014-12-16
申请号：US13857554
申请日：2013-04-05
发明人： Jeong-Won Kim , Min Kang , Bong-Yeon Kim , Jin-Ho Ju , Dong-Min Kim , Tae-Gyun Kim , Joo-Kyoung Park , Chul-Won Park , Jun-Hyuk Woo , Won-Young Lee , Hyun-Joo Lee , Eun Jeagal
摘要： A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask.
摘要翻译： 公开了一种形成金属图案的方法。 在该方法中，在基底基板上形成金属层。 将光致抗蚀剂组合物涂覆在金属层上以形成涂层。 光致抗蚀剂组合物包括粘合剂树脂，光敏剂，巯基丙酸化合物和溶剂。 涂层被曝光。 部分去除涂层以形成光致抗蚀剂图案。 通过使用光致抗蚀剂图案作为掩模来对金属层进行构图。
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公开(公告)号：US10338463B2
公开(公告)日：2019-07-02
申请号：US15699955
申请日：2017-09-08
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
摘要： A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
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9.发明申请MASK FOR PHOTOLITHOGRAPHY, METHOD OF MANUFACTURING THE SAME AND METHOD OF MANUFACTURING SUBSTRATE USING THE SAME 有权用于光刻机的掩模，其制造方法和使用其制造基板的方法公开(公告)号：US20160033857A1
公开(公告)日：2016-02-04
申请号：US14752415
申请日：2015-06-26
发明人： Yong Son , Min Kang , Bong-Yeon Kim , Hyun-Joo Lee , Hyang-Shik Kong , Jin-Ho Ju , Kyoung-Sik Kim , Seung-Hwa Baek
摘要： A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.
摘要翻译： 用于光刻的掩模包括：透明基板; 在所述透明基板上的相移图案，并且被配置为改变光的相位; 透明基板上的介电层; 和在介电层上的负折射率超材料层。
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