公开(公告)号：US20250004370A1

公开(公告)日：2025-01-02

申请号：US18392365

申请日：2023-12-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Beomseok KIM ,  Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Changheon LEE ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/038 ,  C08F12/22 ,  G03F7/004 ,  G03F7/20

Abstract: Provided are a polymer including a first repeating unit represented by Formula 1, a resist composition including the polymer, and a method of forming a pattern using the resist composition: wherein descriptions of L11 to L14, a11 to a13, A11, X11, R11, R12, b12 and p in Formula 1 are provided in the present specification.

公开(公告)号：US20220171284A1

公开(公告)日：2022-06-02

申请号：US17238355

申请日：2021-04-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Eunkyung LEE ,  Sumin KIM ,  Hyunwoo KIM ,  Juhyeon PARK ,  Giyoung SONG ,  Sukkoo HONG ,  Yoonhyun KWAK ,  Youngmin NAM ,  Byunghee SOHN ,  Sunyoung LEE ,  Aram JEON ,  Sungwon CHOI

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07D333/76

Abstract: Disclosed are a photoacid generator, a photoresist composition including the same, and a method of preparing the photoacid generator. The photoacid generator may include a compound represented by Formula 1: wherein, in Formula 1, CY, A1, A2, and B are respectively described in the specification.

公开(公告)号：US20180305545A1

公开(公告)日：2018-10-25

申请号：US15958549

申请日：2018-04-20

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Chanjae AHN ,  Jungha CHAE ,  Won Suk CHANG ,  A Ra JO ,  Sang Soo JEE ,  Sungwon CHOI

IPC: C08L79/08 ,  C08G73/10 ,  C08G73/14

CPC classification number: C08L79/08 ,  C08G73/1007 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1078 ,  C08G73/14 ,  C08J5/18 ,  C08J2379/08 ,  C08L2203/16 ,  C08L2203/20

Abstract: A poly(amide-imide) copolymer including a reaction product of at least one tetracarboxylic acid dianhydride, at least one diamine, and at least one dicarboxylic acid derivative, wherein the at least one tetracarboxylic acid dianhydride includes a tetracarboxylic acid dianhydride represented by Chemical Formula 1, the at least one diamine includes a diamine represented by Chemical Formula 2, and the at least one dicarboxylic acid derivative includes a dicarboxylic acid derivative represented by Chemical Formula 3: wherein, R1 to R3, X1 and X2 are the same as defined in the specification.

公开(公告)号：US20180230278A1

公开(公告)日：2018-08-16

申请号：US15656376

申请日：2017-07-21

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Sunghyun HAN ,  Chanjae AHN ,  Won Suk CHANG ,  A Ra JO ,  Sungwon CHOI

IPC: C08J5/18 ,  C08G73/14 ,  C08G73/10 ,  G01N3/42 ,  G01N3/44

CPC classification number: C08J5/18 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/1078 ,  C08G73/14 ,  C08J2379/08 ,  G01N3/42 ,  G01N3/44 ,  G01N2203/0091 ,  G01N2203/0282

Abstract: A polyimide film, which is a reaction product of a diamine including an amide structural unit in an amount of greater than about 0 mol % and less than or equal to about 80 mol % and an aromatic dianhydride, wherein the polyimide film has a Martens hardness of about 14 N/mm2 to about 120 N/mm2 at a thickness of about 30 μm to about 100 μm.

公开(公告)号：US20180022875A1

公开(公告)日：2018-01-25

申请号：US15720992

申请日：2017-09-29

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sungwon CHOI ,  Chanjae AHN ,  Hyunjeong JEON ,  Sang Soo JEE ,  Byunghee SOHN ,  Won Suk CHANG

IPC: C08G77/455 ,  C08L83/12 ,  C08G77/04 ,  C08G73/14

CPC classification number: C08G77/455 ,  C08G73/1007 ,  C08G73/1017 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08G73/14 ,  C08G77/04 ,  C08G77/16 ,  C08G77/18 ,  C08G77/80 ,  C08L79/08 ,  C08L83/12 ,  C09D179/08 ,  C08L83/04

Abstract: A composition including a polyamideimide precursor modified with an alkoxysilane group and an oligosilica compound, wherein the oligosilica compound is a condensation reaction product of an organosilane diol and an alkoxysilane compound.

公开(公告)号：US20170101509A1

公开(公告)日：2017-04-13

申请号：US15291603

申请日：2016-10-12

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  Samsung SDI Co., Ltd.

Inventor： Sang Soo JEE ,  Hyunjeong JEON ,  Sungwon CHOI ,  Byunghee SOHN ,  Kyeong-sik JU

IPC: C08G73/14 ,  C08J5/18 ,  C08G73/10

CPC classification number: C08G73/14 ,  C08G73/1028 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1067 ,  C08J5/18 ,  C08J2379/08

Abstract: A poly(imide-amide) copolymer includes: an imide structural unit which is a reaction product of a first diamine and a dianhydride, and an amide structural unit which is a reaction product of a second diamine and a diacyl halide, wherein each of the first diamine and the second diamine includes 2,2′-bis-trifluoromethyl-4,4′-biphenyldiamine, and at least one of the first diamine and the second diamine further includes a compound represented by Chemical Formula 1, wherein the dianhydride includes 3,3′,4,4′-biphenyltetracarboxylic dianhydride and 4,4′-hexafluoroisopropylidene diphthalic anhydride, wherein the diacyl halide includes terephthaloyl chloride (TPCI), and wherein an amount of the compound represented by Chemical Formula 1 is less than or equal to about 10 mole percent based on the total amount of the first diamine and the second diamine: NH2-A-NH2  Chemical Formula 1 wherein in Chemical Formula 1, A is the same as described in the detailed description.

公开(公告)号：US20160194448A1

公开(公告)日：2016-07-07

申请号：US14747061

申请日：2015-06-23

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SAMSUNG SDI CO., LTD.

Inventor： Sun Jin SONG ,  A Ra JO ,  Sungwon CHOI ,  Byunghee SOHN

IPC: C08G73/10

CPC classification number: C08G73/1067 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/14 ,  C08J7/047 ,  C08J2379/04 ,  G06F1/1652

Abstract: A window for a display device including a plastic substrate including a poly(imide-amide) copolymer and a hard-coating layer disposed on at least one side of the plastic substrate, wherein the plastic substrate has pencil scratch hardness of greater than or equal to about 3H under a vertical load of about 1 kilogram according to ASTM D3363 and a yellow index (YI) of less than or equal to 3 according to ASTM E313.

Abstract translation: 一种用于显示装置的窗口，包括包含聚（酰亚胺 - 酰胺）共聚物的塑料基材和设置在所述塑料基材的至少一侧上的硬涂层，其中所述塑料基材具有大于或等于 根据ASTM D3363，在约1千克的垂直载荷下约3H，根据ASTM E313，黄色指数（YI）小于或等于3。

公开(公告)号：US20240327338A1

公开(公告)日：2024-10-03

申请号：US18483895

申请日：2023-10-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Aram JEON ,  Hana KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Kyuhyun IM ,  Jinwon JEON ,  Sungwon CHOI

IPC: C07C309/58 ,  C07C309/42 ,  G03F7/004 ,  G03F7/029 ,  G03F7/20

CPC classification number: C07C309/58 ,  C07C309/42 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/029 ,  G03F7/2004

Abstract: Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:


A11+B11−  Formula 1



wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,










wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.

公开(公告)号：US20240319595A1

公开(公告)日：2024-09-26

申请号：US18612246

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hoyoon PARK ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Minsang KIM ,  Beomseok KIM ,  Hana KIM ,  Hyeran KIM ,  Chanjae AHN ,  Kyuhyun IM ,  Sungwon CHOI

IPC: G03F7/039

CPC classification number: G03F7/039

Abstract: Provided are a photoreactive polymer compound including a first repeating unit represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:




A description of Formula 1 is provided herein.

公开(公告)号：US20240319594A1

公开(公告)日：2024-09-26

申请号：US18493192

申请日：2023-10-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Chanjae AHN ,  Cheol KANG ,  Minsang KIM ,  Beomseok KIM ,  Changki KIM ,  Hana KIM ,  Hyeran KIM ,  Changheon LEE ,  Sungwon CHOI ,  Hyunseok CHOI

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F212/28 ,  C08F220/1806 ,  C08F220/1807 ,  G03F7/038

Abstract: Provided are a resist composition and a pattern forming method using the same. The resist composition includes a polymer including a first repeating unit repeating unit Formula 1, a photoacid generator, and an organic solvent.




In Formula 1, L11 to L13, a11 to a13, A11 to A13, R11 to R14, b12 to b14, and p are the same as described in the detailed description.