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100 条记录 (耗时 0.038 秒)

    Display substrate, organic electroluminescent display device, and manufacturing method for display substrate and organic electroluminescent display device
    12.
    发明授权
    Display substrate, organic electroluminescent display device, and manufacturing method for display substrate and organic electroluminescent display device 有权
    显示基板，有机电致发光显示装置以及显示基板和有机电致发光显示装置的制造方法

    公开(公告)号：US09299946B2

    公开(公告)日：2016-03-29

    申请号：US14008535

    申请日：2012-03-27

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L33/14 ,  H01L51/50 ,  H05B33/14 ,  H01L51/56 ,  H01L27/32 ,  H01L51/52

    CPC分类号： H01L51/504 ,  H01L27/3213 ,  H01L27/3218 ,  H01L27/3244 ,  H01L51/5265 ,  H01L51/56 ,  H05B33/145

    摘要： TFT substrate (10) includes a plurality of pixel regions each including light emitting regions of at least three colors, which light emitting regions include light emitting layers (23R(1), 23G, 23R(2), and 23B), respectively, and two adjacent ones of the light emitting regions are a combination other than a combination of (i) a light emitting region included in a light emitting layer (23G) of a color having a highest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance and (ii) a light emitting region included in a light emitting layer (23B) of a color having a lowest current efficiency in a case where the light emitting layers of the light emitting regions of the at least three colors emit light having an identical luminance.

    摘要翻译： TFT基板（10）包括分别包括至少三种颜色的发光区域的多个像素区域，该发光区域分别包括发光层（23R（1），23G，23R（2）和23B），以及 两个相邻的发光区域是除了（i）包含在发光层（23G）中的发光区域的组合之外的组合，在发光层的发光层的情况下具有最高电流效率的颜色 所述至少三种颜色的发光区域发射具有相同亮度的光，以及（ii）包含在具有最低电流效率的颜色的发光层（23B）中的发光区域，在发光层的发光层 至少三种颜色的发光区域发射具有相同亮度的光。

    Vapor deposition device, vapor deposition method, and organic EL display device
    13.
    发明授权
    Vapor deposition device, vapor deposition method, and organic EL display device 有权
    气相沉积装置，气相沉积法和有机EL显示装置

    公开(公告)号：US09240572B2

    公开(公告)日：2016-01-19

    申请号：US13984799

    申请日：2012-03-02

    申请人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

    发明人： Shinichi Kawato ,  Satoshi Inoue ,  Tohru Sonoda ,  Satoshi Hashimoto

    IPC分类号： H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56 ,  C23C16/455 ,  H01L51/00

    CPC分类号： H01L51/56 ,  C23C14/044 ,  C23C14/12 ,  C23C14/562 ,  C23C16/45578 ,  H01L51/0011

    摘要： A vapor deposition device includes a vapor deposition source (60) having a plurality of vapor deposition source openings (61) that discharge vapor deposition particles (91), a limiting unit (80) having a plurality of limiting openings (82), and a vapor deposition mask (70) in which a plurality of mask openings (71) are formed only in a plurality of vapor deposition regions (72) where the vapor deposition particles that have passed through a plurality of limiting openings reach. The plurality of vapor deposition regions are arranged along a second direction that is orthogonal to the normal line direction of the substrate (10) and the movement direction of the substrate, with non-vapor deposition regions (73) where the vapor deposition particles do not reach being sandwiched therebetween. Mask openings through which the vapor deposition particles pass are formed at different positions in the movement direction of the substrate from the positions of the non-vapor deposition regions located on a straight line parallel to the second direction, as viewed along the normal line direction of the substrate. Accordingly, it is possible to stably form a vapor deposition coating film in which edge blurring is suppressed at a desired position on a substrate.

    摘要翻译： 蒸镀装置包括：蒸镀源（60），具有排出气相沉积粒子（91）的多个气相沉积源开口（61），具有多个限制开口（82）的限制单元（80） 气相沉积掩模（70），其中多个掩模开口（71）仅形成在已经通过多个限制孔的气相沉积颗粒到达的多个气相沉积区（72）中。 多个气相沉积区域沿着与基板（10）的法线方向正交的第二方向和基板的移动方向排列，其中气相沉积微粒不具有非气相沉积区域（73） 夹在其间。 沿着平行于第二方向的直线上的非蒸镀区域的位置，沿着基板的移动方向的不同位置，沿蒸镀粒子的法线方向 底物。 因此，可以稳定地形成在基板上的期望位置抑制边缘模糊的气相沉积涂膜。

    Vapor deposition device, vapor deposition method, and organic EL display device
    16.
    发明授权
    Vapor deposition device, vapor deposition method, and organic EL display device 有权
    气相沉积装置，气相沉积法和有机EL显示装置

    公开(公告)号：US08673077B2

    公开(公告)日：2014-03-18

    申请号：US13984283

    申请日：2012-03-02

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： C23C16/00 ,  H01L21/31

    CPC分类号： H01L51/5012 ,  C23C14/042 ,  C23C14/243 ,  C23C14/564 ,  H01L51/0011 ,  H01L51/56 ,  H05B33/10

    摘要： Vapor deposition particles (91) discharged from at least one vapor deposition source opening (61) pass through a plurality of limiting openings (82) of a limiting unit (80) and a plurality of mask openings (71) of a vapor deposition mask (70), and adhere to a substrate (10) that relatively moves along a second direction (10a) so as to form a coating film. The limiting unit includes a plurality of plate members stacked on one another. Accordingly, it is possible to efficiently form a vapor deposition coating film in which edge blurring is suppressed on a large-sized substrate at a low cost.

    摘要翻译： 从至少一个气相沉积源开口（61）排出的气相沉积颗粒（91）通过限制单元（80）的多个限制开口（82）和气相沉积掩模的多个掩模开口（71） 70），并且粘附到沿着第二方向（10a）相对移动以形成涂膜的基板（10）。 限制单元包括彼此堆叠的多个板构件。 因此，可以以低成本有效地形成在大尺寸基板上抑制边缘模糊的气相沉积涂膜。

    VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY DEVICE
    17.
    发明申请
    VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY DEVICE 有权
    蒸气沉积装置，蒸发沉积方法和用于生产有机EL显示装置的方法

    公开(公告)号：US20140004641A1

    公开(公告)日：2014-01-02

    申请号：US14004896

    申请日：2012-03-09

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L51/56

    CPC分类号： H01L51/56 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H05B33/10

    摘要： A vapor deposition device (1) performs a vapor deposition treatment to form a luminescent layer (47) having a predetermined pattern on a film formation substrate (40). The vapor deposition device includes: a nozzle (13) having a plurality of injection holes (16) from which vapor deposition particles (17), which constitute the luminescent layer, are injected toward the film formation substrate when the vapor deposition treatment is carried out; and a plurality of control plates (20) provided between the nozzle and the film formation substrate and restricting an incident angle, with respect to the film formation substrate, of the vapor deposition particles injected from the plurality of injection holes. The nozzle includes: a nozzle main body (14b) in a container shape having an opening (14c) on a surface thereof on a film formation substrate side and (ii) a plurality of blocks (15) covering the opening and separated from each other, each of the plurality of blocks having the plurality of injection holes. The above arrangement allows a vapor-deposited film pattern to be formed with high definition.

    摘要翻译： 蒸镀装置（1）进行蒸镀处理，在成膜基板（40）上形成具有规定图案的发光层（47）。 气相沉积装置包括：具有多个喷射孔（16）的喷嘴（13），当进行气相沉积处理时，构成发光层的气相沉积颗粒（17）从该注入孔喷射到成膜基底 ; 以及设置在喷嘴和成膜基板之间的多个控制板（20），并且限制从多个喷射孔喷射的气相沉积颗粒相对于成膜基板的入射角。 喷嘴包括：容器形状的喷嘴主体（14b），其在成膜基板侧的表面上具有开口（14c），和（ii）覆盖开口并分离的多个块体（15） 所述多个块中的每个具有所述多个喷射孔。 上述布置允许以高清晰度形成气相沉积膜图案。

    CRUCIBLE AND DEPOSITION APPARATUS
    18.
    发明申请
    CRUCIBLE AND DEPOSITION APPARATUS 有权
    可溶和沉积装置

    公开(公告)号：US20130291796A1

    公开(公告)日：2013-11-07

    申请号：US13980875

    申请日：2012-01-13

    申请人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

    发明人： Satoshi Inoue ,  Shinichi Kawato ,  Tohru Sonoda

    IPC分类号： C23C16/448 ,  C23C16/04

    CPC分类号： C23C16/448 ,  C23C14/243 ,  C23C16/042 ,  G03B37/06 ,  H01L51/0008

    摘要： A crucible (50) of the present invention includes: an opening (55a) from which vapor deposition particles are injected toward a film formation substrate on which a film is to be formed; a focal point member (54a), provided so as to face the opening (55a), which reflects vapor deposition particles injected from the opening (55a); and a revolution paraboloid (55b) which reflects, toward the film formation substrate, vapor deposition particles which have been reflected by the focal point member (54a).

    摘要翻译： 本发明的坩埚（50）包括：朝向要在其上形成膜的成膜基板上注入蒸镀颗粒的开口（55a） 设置成面对开口（55a）的焦点部件（54a），其反射从开口（55a）喷射的气相沉积粒子; 以及向所述成膜基板反射已被所述焦点部件（54a）反射的气相沉积粒子的旋转抛物面（55b）。

    DEPOSITION DEVICE, AND COLLECTION DEVICE
    20.
    发明申请
    DEPOSITION DEVICE, AND COLLECTION DEVICE 审中-公开
    沉积装置和收集装置

    公开(公告)号：US20130276701A1

    公开(公告)日：2013-10-24

    申请号：US13976443

    申请日：2011-12-20

    申请人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    发明人： Tohru Sonoda ,  Shinichi Kawato ,  Satoshi Inoue ,  Satoshi Hashimoto

    IPC分类号： H01L31/18

    CPC分类号： C23C16/4401 ,  C12M33/00 ,  C23C14/564 ,  H01L31/186 ,  H01L51/0011

    摘要： A Film (7) is provided on at least a part of a surface of each of a vapor deposition preventing plate (3) and a shutter (4) of a vacuum chamber (5) on which surface vapor deposition particles are vapor-deposited, the film (7) being provided so as to be peeled off from the each of the vapor deposition preventing plate (3) and the shutter (4), and the film being made of a material differing in at least one of a melting point, a sublimation point, solubility in a given solvent, microbial biodegradability, and photodegradability from a material of which a vapor-deposited film that is formed on the film (7) is made.

    摘要翻译： 在气相沉积颗粒被蒸镀的真空室（5）的气相沉积防止板（3）和快门（4）的每一个的表面的至少一部分上提供膜（7） 薄膜（7）设置成从每个防蒸镀板（3）和活门（4）上剥离，并且该薄膜由不同于熔点， 升华点，在给定溶剂中的溶解度，微生物生物降解性和由形成在膜（7）上的气相沉积膜的材料的光降解性）。