BEAM HOMOGENIZER, LASER IRRADIATION APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    14.
    发明申请
    BEAM HOMOGENIZER, LASER IRRADIATION APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
    光束均化器,激光辐射装置和制造半导体器件的方法

    公开(公告)号:US20130084691A1

    公开(公告)日:2013-04-04

    申请号:US13688911

    申请日:2012-11-29

    Abstract: The present invention is to provide a beam homogenizer, a laser irradiation apparatus, and a method for manufacturing a semiconductor device, which can suppress the loss of a laser beam and form a beam spot having homogeneous energy distribution constantly on an irradiation surface without being affected by beam parameters of a laser beam. A deflector is provided at an entrance of an optical waveguide or a light pipe used for homogenizing a laser beam emitted from a laser oscillator. A pair of reflection planes of the deflector is provided so as to have a tilt angle to an optical axis of the laser beam, whereby the entrance of the optical waveguide or the light pipe is expanded. Accordingly, the loss of the laser beam can be suppressed. Moreover, by providing an angle adjusting mechanism to the deflector, a beam spot having homogeneous energy distribution can be formed at an exit of the optical waveguide.

    Abstract translation: 本发明提供一种光束均化器,激光照射装置和半导体装置的制造方法,其能够抑制激光束的损失,并且在照射面上不间断地形成具有均匀的能量分布的束斑而不受影响 通过激光束的光束参数。 在用于使从激光振荡器发射的激光束均匀化的光波导或光管的入口处设置偏转器。 偏转器的一对反射面被设置为具有与激光束的光轴的倾斜角,从而扩大了光波导或光管的入射。 因此,可以抑制激光束的损失。 此外,通过向偏转器设置角度调节机构,可以在光波导的出口处形成具有均匀能量分布的束斑。

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