公开(公告)号：US20240186114A1

公开(公告)日：2024-06-06

申请号：US18515120

申请日：2023-11-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Satoru Kawakami ,  Hiroshi Kondo ,  Eiki Kamata ,  Shin Oowada

IPC: H01J37/32

CPC classification number: H01J37/32247 ,  H01J37/3222 ,  H01J37/32449

Abstract: Provided is a plasma processing apparatus comprising a processing container configured to provide a processing space; an electromagnetic wave generator configured to generate electromagnetic waves for plasma excitation supplied to the processing space; a dielectric provided with a first surface thereof facing the processing space; an electromagnetic wave supply portion configured to supply the electromagnetic waves to the processing space through the dielectric; and a resonator array structure located along the first surface of the dielectric within the processing container, wherein the resonator array structure includes a base plate having a groove on a surface on the processing space side; a plurality of resonators capable of resonating with a magnetic field component of the electromagnetic wave and having a size smaller than a wavelength of the electromagnetic wave; and a pressing member configured to press the plurality of resonators.

公开(公告)号：US20220130643A1

公开(公告)日：2022-04-28

申请号：US17513711

申请日：2021-10-28

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32

Abstract: There is provided a plasma processing apparatus. The apparatus comprises: a chamber body; and a power supply unit configured to output power for exciting a gas supplied to an inside of the chamber body. The power supply unit supplies, as power having a center frequency, a bandwidth, and a carrier pitch respectively corresponding to a set frequency, a set bandwidth, and a set carrier pitch that are indicated by a controller, power which is pulse-modulated so as to be a pulse frequency, a duty ratio, a high level, and a low level respectively corresponding to a set pulse frequency, a set duty ratio, a high-level set power, and a low-level set power indicated by the controller, and in which a pulse on time determined by the set pulse frequency and the set duty ratio is longer than a power fluctuation cycle of the power having the bandwidth.

公开(公告)号：US20190267216A1

公开(公告)日：2019-08-29

申请号：US16342766

申请日：2017-10-04

Applicant: Tokyo Electron Limited ,  TOKYO KEIKI INC.

Inventor： Kazushi KANEKO ,  Yuki KAWADA ,  Kouichi MURAI ,  Takayuki USHIKUBO

IPC: H01J37/32

Abstract: In a microwave output device of an embodiment, a part of travelling wave propagating from a microwave generation unit to an output are output from a directional coupler. A first measurement unit generates an analog signal corresponding to a power of the part of the travelling wave by using diode detection, and converts the analog signal into a digital value. One or more correction coefficients associated with a set frequency and a set power of a microwave designated for the microwave output device are selected. The selected one or more correction coefficients are multiplied by the digital value, and thus a measured value is determined.

公开(公告)号：US20180151332A1

公开(公告)日：2018-05-31

申请号：US15821588

申请日：2017-11-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Takashi HASEGAWA ,  Koji KOYAMA ,  Naoki MATSUMOTO

IPC: H01J37/32

CPC classification number: H01J37/32229 ,  H01J37/32 ,  H01J37/3222 ,  H01J37/32275 ,  H01J37/32311 ,  H01J37/32449 ,  H01J37/32715 ,  H01J37/32834 ,  H01J2237/006 ,  H01J2237/1825 ,  H01J2237/186

Abstract: A plasma processing apparatus includes a microwave output unit, a wave guide tube, a tuner, a demodulation unit, and a calculation unit. The microwave output unit outputs a microwave having power corresponding to setting power while frequency-modulating the microwave in a setting frequency range. The wave guide tube guides the microwave to an antenna of a chamber main body. The tuner is provided in the wave guide tube and adjusts a position of a movable plate. The demodulation unit is provided in the wave guide tube, and acquires travelling wave power and reflected wave power for each frequency. The calculation unit calculates a frequency at which a reflection coefficient, which is calculated on the basis of the travelling wave power and the reflected wave power, for each frequency becomes a minimum point as an absorption frequency.

公开(公告)号：US20150194292A1

公开(公告)日：2015-07-09

申请号：US14588114

申请日：2014-12-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yunosuke HASHIMOTO ,  Yohei ISHIDA

IPC: H01J37/32 ,  G01R23/02 ,  C23C16/511 ,  H03L7/00

Abstract: Disclosed is a plasma processing apparatus including a processing container, a plasma generation mechanism, a regulation unit, a detection unit, and a determination unit. The plasma generation mechanism includes a microwave oscillator, and generates plasma within the processing container using microwaves oscillated by the microwave oscillator. The regulation unit regulates an oscillation frequency, which corresponds to a frequency of the microwaves oscillated by the microwave oscillator, to a predetermined frequency. The detection unit detects the oscillation frequency regulated to the predetermined frequency by the regulation unit. The determination unit determines the success/failure of regulation of the oscillation frequency by the regulation unit, using the oscillation frequency detected by the detection unit, or using a parameter which is changed depending on a difference between the oscillation frequency and the predetermined frequency.

Abstract translation: 公开了一种包括处理容器，等离子体产生机构，调节单元，检测单元和确定单元的等离子体处理装置。 等离子体产生机构包括微波振荡器，并使用由微波振荡器振荡的微波在处理容器内产生等离子体。 调节单元将对应于由微波振荡器振荡的微波的频率的振荡频率调节到预定频率。 检测单元通过调节单元检测调节到预定频率的振荡频率。 确定单元使用由检测单元检测到的振荡频率或使用根据振荡频率和预定频率之间的差异而改变的参数来确定调节单元调节振荡频率的成功/失败。

公开(公告)号：US20240234092A9

公开(公告)日：2024-07-11

申请号：US18382809

申请日：2023-10-23

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO

IPC: H01J37/32

CPC classification number: H01J37/32165 ,  H01J37/32183

Abstract: A frequency-variable power supply that outputs radio-frequency (RF) waves of a set frequency and includes an operation part configured to calculate a correction value according to each of a plurality of frequencies within an outputtable frequency range.

公开(公告)号：US20240136154A1

公开(公告)日：2024-04-25

申请号：US18382809

申请日：2023-10-22

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO

IPC: H01J37/32

CPC classification number: H01J37/32165 ,  H01J37/32183

Abstract: A frequency-variable power supply that outputs radio-frequency (RF) waves of a set frequency and includes an operation part configured to calculate a correction value according to each of a plurality of frequencies within an outputtable frequency range.

公开(公告)号：US20220115208A1

公开(公告)日：2022-04-14

申请号：US17497559

申请日：2021-10-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO

IPC: H01J37/32

Abstract: A plasma processing apparatus includes a processing chamber configured to accommodate a substrate, a gas supply configured to supply a processing gas into the processing chamber, a power supply configured to supply power to the processing chamber to generate plasma such that the substrate is processed by using the generated plasma, and a control device configured to control the power supply. The control device controls the power supply to perform a process of supplying a first power including a frequency component within a first band having a first bandwidth to the processing chamber when the plasma is generated from the processing gas, and a process of supplying a second power including a frequency component within a second band having a second bandwidth smaller than or equal to the first bandwidth to the processing chamber when the substrate is processed by using the generated plasma.

公开(公告)号：US20200341043A1

公开(公告)日：2020-10-29

申请号：US16848483

申请日：2020-04-14

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: G01R29/02 ,  G01R29/08

Abstract: A method includes measuring first travelling wave power of a microwave having a single frequency peak and second travelling wave power having a single frequency peak, acquiring duty ratios of the first travelling wave power and the second travelling wave power based on measured values and a first determination threshold value, measuring third travelling wave power of a microwave having a bandwidth and fourth travelling wave power having a bandwidth, acquiring duty ratios of the third travelling wave power and the fourth travelling wave power based on measured values and a second determination threshold value, approximating a pulse width error between the first travelling wave power and the third travelling wave power and a pulse width error between the second travelling wave power and the fourth travelling wave power with linear functions, and determining the correction function based on the linear functions.

公开(公告)号：US20200035462A1

公开(公告)日：2020-01-30

申请号：US16523066

申请日：2019-07-26

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazushi KANEKO ,  Yohei ISHIDA

IPC: H01J37/32 ,  H01P5/18 ,  H01P3/06

Abstract: A detection device includes a substrate on which a connector connected to a transmission line for microwaves, a detection circuit configured to convert the microwaves inputted from the transmission line via the connector to a detection value indicating power of the microwaves, and an output port configured to output the detection value obtained by the detection circuit are disposed. The detection device further includes a housing that has a first opening and a second opening and accommodates the substrate in a state where the connector is inserted into the first opening and the output port is inserted into the second opening. The detection device further includes a first sealing member provided at the first opening of the housing to seal a periphery of the connector; and a second sealing member provided at the second opening of the housing to seal a periphery of the output port.