-
11.发明授权Imaging cell that has a long integration period and method of operating the imaging cell 有权成像细胞具有长的积分期和操作成像细胞的方法公开(公告)号：US07218555B2
公开(公告)日：2007-05-15
申请号：US11242094
申请日：2005-10-03
IPC分类号： G11C11/34 , H01L29/788
CPC分类号： H01L27/11526 , H01L27/115 , H01L27/11531 , H01L27/14603 , H01L27/14609
摘要： The integration period of an imaging cell, or the time that an imaging cell is exposed to light energy, is substantially increased by utilizing a single-poly, electrically-programmable, read-only-memory (EPROM) structure to capture the light energy. Photogenerated electrons are formed in the channel region of the EPROM structure from the light energy. The photogenerated electrons are then accelerated into having ionizing collisions which, in turn, leads to electrons being injected onto the floating gate of the EPROM structure at a rate that is proportionate to the number of photons captured by the channel region.
摘要翻译： 成像单元的积分周期或成像单元暴露于光能的时间通过利用单聚电子可编程只读存储器（EPROM）结构捕获光能而大大增加。 光能从EPROM结构的沟道区形成光电子。 光生成的电子然后被加速成具有电离碰撞，其进而导致电子以与通道区域捕获的光子数成正比的速率注入到EPROM结构的浮动栅极上。
-
公开(公告)号：US07209503B1
公开(公告)日：2007-04-24
申请号：US10838671
申请日：2004-05-03
IPC分类号： H01S5/00
CPC分类号： H01L27/1446 , H01L27/146
摘要： An integrated circuit is powered by exposing conductive regions, such as the p+ source regions of the PMOS transistors that are formed to receive a supply voltage, to light energy from a light source. The conductive regions function as photodiodes that produce voltages on the conductive regions via the photovoltaic effect.
摘要翻译： 集成电路通过将形成为接收电源电压的PMOS晶体管的p +源极区域等导电区域暴露于来自光源的光能来供电。 导电区域用作通过光电效应在导电区域上产生电压的光电二极管。
-
公开(公告)号：US07113427B1
公开(公告)日：2006-09-26
申请号：US11076711
申请日：2005-03-09
IPC分类号： G11C16/04
CPC分类号： G11C11/5628 , G11C16/12 , G11C16/3459 , H01L27/115 , H01L29/7881
摘要： NVM cell for storing three levels of charge: one erased and two programmed states. The cell comprises a transistor structure providing a gate current versus gate voltage curve having a shape with a flat region or a second peak. To provide such a structure, one embodiment combines two parallel transistors having different threshold voltages, and another embodiment uses one transistor with variable doping. The gate current curve provides two programming zones. Programming the first state includes applying a voltage across a channel, ramping up a gate voltage in the first programming zone, followed by ramping it back down. Programming the second state comprises applying a voltage across a channel, ramping up a gate voltage past the first programming zone and into the second programming zone, followed by ramping it back down. Ramping the voltage back down may optionally be preceded by turning off the voltage across the channel.
摘要翻译： 用于存储三个电荷电平的NVM单元：一个擦除和两个编程状态。 该单元包括提供具有平坦区域或第二峰值的形状的栅极电流对栅极电压曲线的晶体管结构。 为了提供这样的结构，一个实施例组合了具有不同阈值电压的两个并联晶体管，另一实施例使用一个具有可变掺杂的晶体管 栅极电流曲线提供两个编程区域。 对第一状态进行编程包括在一个通道上施加电压，使第一个编程区中的栅极电压升高，然后将其向下斜坡。 对第二状态进行编程包括在通道上施加电压，将栅极电压升高到第一编程区并进入第二编程区，然后将其向下斜坡。 可以选择先将电压降低，然后关闭通道上的电压。
-
公开(公告)号：US07057174B1
公开(公告)日：2006-06-06
申请号：US10355904
申请日：2003-01-30
IPC分类号： H01L31/00
CPC分类号： H01L31/08
摘要： A photon detector capable of detecting gigahertz frequency optical signals utilizes a layer of photonic material that is formed adjacent to the coil of an inductor. When a pulsed light source is applied to the layer of photonic material, the photonic material generates eddy currents that alter the magnetic flux of the inductor. The signals can then be detected by detecting the change in the magnetic flux.
摘要翻译： 能够检测千兆赫兹光信号的光子检测器利用与电感线圈相邻形成的光子材料层。 当脉冲光源被施加到光子材料层时，光子材料产生改变电感器的磁通量的涡流。 然后可以通过检测磁通量的变化来检测信号。
-
15.发明授权Imaging cell with a non-volatile memory that provides a long integration period and method of operating the imaging cell 有权具有非易失性存储器的成像单元，其提供长的积分期和操作成像单元的方法公开(公告)号：US06972995B1
公开(公告)日：2005-12-06
申请号：US10821391
申请日：2004-04-09
CPC分类号： G11C27/005 , G11C16/10
摘要： The image capture period of an imaging cell, or the total time that an imaging cell is exposed to light energy, is substantially increased by utilizing a non-volatile memory (NVM), such as an electrically-erasable, programmable, read-only-memory (EEPROM) structure. The NVM structure stores and integrates charges that are proportional to the absorbed photons over a large number of sequential integration periods.
摘要翻译： 成像单元的图像捕获周期或成像单元暴露于光能的总时间通过利用诸如电可擦除可编程的只读存储器之类的非易失性存储器（NVM）而显着增加， 存储器（EEPROM）结构。 NVM结构在大量的顺序集成周期内存储和积分与吸收的光子成比例的电荷。
-
16.发明授权Imaging cell that has a long integration period and method of operating the imaging cell 有权成像细胞具有长的积分期和操作成像细胞的方法公开(公告)号：US06972457B1
公开(公告)日：2005-12-06
申请号：US10821286
申请日：2004-04-09
IPC分类号： H01L21/8247 , H01L27/115 , H01L27/146 , H01L29/76 , H01L29/788
CPC分类号： H01L27/11526 , H01L27/115 , H01L27/11531 , H01L27/14603 , H01L27/14609
摘要： The integration period of an imaging cell, or the time that an imaging cell is exposed to light energy, is substantially increased by utilizing a single-poly, electrically-programmable, read-only-memory (EPROM) structure to capture the light energy. Photogenerated electrons are formed in the channel region of the EPROM structure from the light energy. The photogenerated electrons are then accelerated into having ionizing collisions which, in turn, leads to electrons being injected onto the floating gate of the EPROM structure at a rate that is proportionate to the number of photons captured by the channel region.
摘要翻译： 成像单元的积分周期或成像单元暴露于光能的时间通过利用单聚电子可编程只读存储器（EPROM）结构捕获光能而大大增加。 光能从EPROM结构的沟道区形成光电子。 光生成的电子然后被加速成具有电离碰撞，其进而导致电子以与通道区域捕获的光子数成正比的速率注入到EPROM结构的浮动栅极上。
-
公开(公告)号：US07217966B1
公开(公告)日：2007-05-15
申请号：US11060877
申请日：2005-02-18
IPC分类号： H01L27/10 , H01L29/739 , H01L29/73 , H01L29/74
CPC分类号： H01L27/0266 , H01L29/78
摘要： A transistor array is self-protected from an electrostatic discharge (ESD) event which can cause localized ESD damage by integrating an ESD protection device into the transistor array. The ESD protection device operates as a transistor during normal operating conditions, and provides a low-resistance current path during an ESD event.
摘要翻译： 晶体管阵列可以通过将ESD保护器件集成到晶体管阵列中而免受静电放电（ESD）事件的影响，从而导致局部ESD损坏。 ESD保护装置在正常操作条件下作为晶体管工作，并且在ESD事件期间提供低电阻电流路径。
-
公开(公告)号：US07202538B1
公开(公告)日：2007-04-10
申请号：US10647604
申请日：2003-08-25
IPC分类号： H01L29/94
CPC分类号： H01L29/4238 , H01L21/28123 , H01L21/823481 , H01L21/823878 , H01L29/0692
摘要： A MOSFET transistor structure is formed in a substrate of semiconductor material having a first conductivity type. The MOSFET transistor structure includes an active region that is surrounded by a perimeter isolation dielectric material formed in the substrate to define a continuous sidewall interface between the sidewall dielectric material and the active region. Spaced-apart source and drain regions are formed in the active region and are also spaced-apart from the sidewall interface. A conductive gate electrode that is separated from the substrate channel region by intervening gate dielectric material includes a first portion that extends over the substrate channel region and a second portion that extends continuously over the entire sidewall interface between the isolation dielectric material and the active region. Thus, an enclosed ring is maintained around the entire composite perimeter, thereby completely avoiding regions of high trap density and, thus, preventing any current path for gate induced drain leakage (GIDL) to occur.
摘要翻译： 在具有第一导电类型的半导体材料的衬底中形成MOSFET晶体管结构。 MOSFET晶体管结构包括由形成在衬底中的周边隔离电介质材料围绕以限定侧壁电介质材料和有源区域之间的连续侧壁界面的有源区域。 间隔开的源极和漏极区域形成在有源区中并且也与侧壁界面间隔开。 通过介入栅极电介质材料与衬底沟道区分离的导电栅电极包括在衬底沟道区上延伸的第一部分和在隔离电介质材料与有源区之间的整个侧壁界面上连续延伸的第二部分。 因此，围绕整个复合材料周边保持封闭的环，从而完全避免高陷阱密度的区域，并因此防止发生栅极引起漏极泄漏（GIDL）的任何电流路径。
-
19.发明授权公开(公告)号：US07180379B1
公开(公告)日：2007-02-20
申请号：US10838485
申请日：2004-05-03
IPC分类号： G01N21/00
CPC分类号： G06F1/105
摘要： A synchronous clock signal is generated in a large number of local clock circuits at the same time by exposing photoconductive regions in each local clock circuit to a pulsed light source that operates at a fixed frequency. The photoconductive regions generate photoconductive currents which are sufficient to cause a logic inverter to switch states.
摘要翻译： 通过将每个本地时钟电路中的光电导区域暴露于以固定频率工作的脉冲光源，同时在多个本地时钟电路中产生同步时钟信号。 光电导区产生足以导致逻辑逆变器切换状态的光电流。
-
公开(公告)号：US06940133B1
公开(公告)日：2005-09-06
申请号：US10818039
申请日：2004-04-05
IPC分类号： H01C17/26 , H01L21/02 , H01L29/76 , H01L29/8605 , H01L29/94
CPC分类号： H01L28/20 , H01C17/267 , H01L29/8605
摘要： An integrated circuit trim structure includes a dopant source, a target trim element formed in proximity to the dopant source, and a conductive heating element. The heater element is formed in proximity to the dopant source and includes first and second terminals and a trapezoid shaped region formed between the first and second terminals. As predefined current pulse is applied to the first terminal to promote current flow between the first and second terminals, a local heat source is created at a predefined location within the trapezoid shaped region and in proximity to the dopant source such that dopant flows from the dopant source into the target trim element to change the conductive characteristics of the target trim element.
摘要翻译： 集成电路微调结构包括掺杂剂源，在掺杂剂源附近形成的目标微调元件和导电加热元件。 加热器元件形成在掺杂剂源附近，并且包括形成在第一和第二端子之间的第一和第二端子和梯形区域。 当预定义的电流脉冲施加到第一端子以促进第一和第二端子之间的电流流动时，在梯形区域内的预定位置处并且在掺杂剂源附近产生局部热源，使得掺杂剂从掺杂剂 源到目标装饰元件以改变目标装饰元件的导电特性。
-
-
-
-
-
-
-
-
-
搜索结果
282 条记录 (耗时 0.034 秒)
