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    Three-beam generating diffraction grating, transmission type holographic optical element and optical pickup apparatus using the same
    11.
    发明授权
    Three-beam generating diffraction grating, transmission type holographic optical element and optical pickup apparatus using the same 失效
    三光束产生衍射光栅，透射型全息光学元件和使用其的光学拾取装置

    公开(公告)号：US5717674A

    公开(公告)日：1998-02-10

    申请号：US671197

    申请日：1996-06-27

    申请人： Kazushi Mori ,  Atsushi Tajiri ,  Yasuaki Inoue

    发明人： Kazushi Mori ,  Atsushi Tajiri ,  Yasuaki Inoue

    IPC分类号： G11B7/00 ,  G11B7/125 ,  G11B7/135

    CPC分类号： G11B7/1353 ,  G11B7/127 ,  G11B2007/0006

    摘要： An optical pickup apparatus includes a semiconductor laser generating a light having a short wavelength for reproduction of a high-density information recording medium and a semiconductor laser outputting a light for reproduction of an information recording medium with low recording density. A three-beam generating diffraction grating, a transmission type holographic optical element and a condenser lens are disposed in the light path in which the laser lights from the semiconductor lasers propagate toward the recording surface of an information recording medium. The laser light emitted from each semiconductor laser is transmitted through the three-beam generating diffraction grating and divided into three beams and then transmitted through the transmission type holographic optical element and passed through the condenser lens to reach the recording surface of the information recording medium. The transmission type holographic optical element is formed so that the product of the diffraction efficiency of the laser light in the forward optical path and the separated diffraction efficiency of the returned light increases as the wavelength of the laser light decreases. The three-beam generating diffraction grating has grooves with such depth that the diffraction efficiency of the main beam in the three-divided beams is smaller and the diffraction efficiency of the sub-beams is larger as the wavelength of the laser light is shorter.

    摘要翻译： 光拾取装置包括：半导体激光器，其产生用于再现高密度信息记录介质的短波长的光;以及输出用于再现记录密度低的信息记录介质的光的半导体激光器。 在来自半导体激光器的激光朝向信息记录介质的记录表面传播的光路中设置三光束产生衍射光栅，透射型全息光学元件和聚光透镜。 从每个半导体激光器发射的激光通过三光束产生衍射光栅传输并分成三个光束，然后通过透射型全息光学元件透射并通过聚光透镜到达信息记录介质的记录表面。 透射型全息光学元件形成为使得正向光路中的激光的衍射效率与返回的光的分离的衍射效率的乘积随着激光的波长而减小。 三光束产生衍射光栅具有凹槽，其深度使得三分光束中的主光束的衍射效率较小，并且激光的波长较短时子束的衍射效率较大。

    Method of forming grating microstructures by anodic oxidation
    14.
    发明授权
    Method of forming grating microstructures by anodic oxidation 失效
    通过阳极氧化形成光栅微结构的方法

    公开(公告)号：US06930053B2

    公开(公告)日：2005-08-16

    申请号：US10394033

    申请日：2003-03-24

    申请人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    发明人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    IPC分类号： G02B5/18 ,  H01L21/302 ,  H01L21/461

    CPC分类号： G02B5/1809 ,  G02B5/1857

    摘要： A method of manufacturing an element having a microstructure of an excellent grating groove pattern or the like is obtained. This method of manufacturing an element having a microstructure comprises steps of forming a metal layer on a substrate, forming a dot column of concave portions on the surface of the metal layer and anodically oxidizing the surface of the metal layer formed with the dot column of concave portions while opposing this surface to a cathode surface thereby forming a metal oxide film having a grating groove pattern. When the interval between the concave portions of the dot column is reduced, therefore, a linear grating groove pattern having a large depth with a uniform groove width along the depth direction is easily formed in a self-organized manner.

    摘要翻译： 可以得到具有优良的光栅槽图案等的微结构的元件的制造方法。 这种制造具有微结构的元件的方法包括以下步骤：在衬底上形成金属层，在金属层的表面上形成凹点的点列，并且阳极氧化形成有凹点的点列的金属层的表面 同时将该表面与阴极表面相对，从而形成具有格栅槽图案的金属氧化物膜。 当点列的凹部之间的间隔减小时，容易以自组织的方式形成具有沿深度方向具有均匀凹槽宽度的大深度的线性格栅槽图案。

    Wave plate and optical device using the same
    17.
    发明授权
    Wave plate and optical device using the same 失效
    波片和光学装置使用相同

    公开(公告)号：US07046444B2

    公开(公告)日：2006-05-16

    申请号：US10927232

    申请日：2004-08-27

    申请人： Kazushi Mori ,  Shingo Kameyama ,  Hitoshi Hirano ,  Koutarou Furusawa ,  Koji Tominaga ,  Masayuki Shono

    发明人： Kazushi Mori ,  Shingo Kameyama ,  Hitoshi Hirano ,  Koutarou Furusawa ,  Koji Tominaga ,  Masayuki Shono

    IPC分类号： G02B5/18

    CPC分类号： G02B5/3083 ,  G02B5/1833 ,  G02B5/1852 ,  G02B5/1857 ,  G02B5/1871

    摘要： The present invention provides a wave plate capable of obtaining preferable phase conversion characteristic over a wide wavelength range. The wave plate includes an aluminum oxide film having linear grating groove patterns. The period L (μm) and the duty ratio De of the grating groove patterns are set at values within the first range specified by the following four formulas: L≦0.65 L≧2×10−14e31.263De L≦6.0317De2−10.352De+5.0516 (De−0.85)2/0.442+(L−0.41)2/0.392≦1

    摘要翻译： 本发明提供能够在宽波长范围内获得优选的相变特性的波片。 波片包括具有线性格栅凹槽图案的氧化铝膜。 光栅凹槽图案的周期L（母）和占空比De被设定在由以下四个公式指定的第一范围内的值：<？in-line-formula description =“In-line formula”end =“lead “？> L <= 0.65 <？in-line-formula description =”In-line Formulas“end =”tail“？> <？in-line-formula description =”In-line Formulas“end =”lead“？ > L> = 2x10 -14 在线公式描述=“内联公式”end =“tail”？> <？ line-formula description =“In-line Formulas”end =“lead”？> L <= 6.0317De <2> -10.352De + 5.0516 <？in-line-formula description =“In-Line Formulas “end =”tail“？> <？in-line-formula description =”In-line formula“end =”lead“？>（De-0.85） 2 /0.44 < /SUP>+(L-0.41)2/0.392<=1

    Element having microstructure and manufacturing method thereof
    18.
    发明申请
    Element having microstructure and manufacturing method thereof 失效
    具有微结构的元件及其制造方法

    公开(公告)号：US20070029567A1

    公开(公告)日：2007-02-08

    申请号：US11544615

    申请日：2006-10-10

    申请人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    发明人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    IPC分类号： H01L21/461 ,  H01L21/302 ,  H01L33/00 ,  H01L29/22 ,  H01L29/227

    CPC分类号： G02B5/1809 ,  G02B5/1857

    摘要： A method of manufacturing an element having a microstructure of an excellent grating groove pattern or the like is obtained. This method of manufacturing an element having a microstructure comprises steps of forming a metal layer on a substrate, forming a dot column of concave portions on the surface of the metal layer and anodically oxidizing the surface of the metal layer formed with the dot column of concave portions while opposing this surface to a cathode surface thereby forming a metal oxide film having a grating groove pattern. When the interval between the concave portions of the dot column is reduced, therefore, a linear grating groove pattern having a large depth with a uniform groove width along the depth direction is easily formed in a self-organized manner.

    摘要翻译： 可以得到具有优良的光栅槽图案等的微结构的元件的制造方法。 这种制造具有微细结构的元件的方法包括以下步骤：在基底上形成金属层，在金属层的表面上形成凹点的点列，并且阳极氧化形成有凹点的点列的金属层的表面 同时将该表面与阴极表面相对，从而形成具有格栅槽图案的金属氧化物膜。 当点列的凹部之间的间隔减小时，容易以自组织的方式形成具有沿深度方向具有均匀凹槽宽度的大深度的线性格栅槽图案。

    Method of forming grating microstrutures by anodic oxidation
    20.
    发明授权
    Method of forming grating microstrutures by anodic oxidation 失效
    通过阳极氧化形成光栅微尺寸的方法

    公开(公告)号：US07129183B2

    公开(公告)日：2006-10-31

    申请号：US11155480

    申请日：2005-06-20

    申请人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    发明人： Kazushi Mori ,  Mitsuaki Matsumoto ,  Koji Tominaga ,  Atsushi Tajiri ,  Koutarou Furusawa

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： G02B5/1809 ,  G02B5/1857

    摘要： A method of manufacturing an element having a microstructure of an excellent grating groove pattern or the like is obtained. This method of manufacturing an element having a microstructure comprises steps of forming a metal layer on a substrate, forming a dot column of concave portions on the surface of the metal layer and anodically oxidizing the surface of the metal layer formed with the dot column of concave portions while opposing this surface to a cathode surface thereby forming a metal oxide film having a grating groove pattern. When the interval between the concave portions of the dot column is reduced, therefore, a linear grating groove pattern having a large depth with a uniform groove width along the depth direction is easily formed in a self-organized manner.

    摘要翻译： 可以得到具有优良的光栅槽图案等的微结构的元件的制造方法。 这种制造具有微结构的元件的方法包括以下步骤：在衬底上形成金属层，在金属层的表面上形成凹点的点列，并且阳极氧化形成有凹点的点列的金属层的表面 同时将该表面与阴极表面相对，从而形成具有格栅槽图案的金属氧化物膜。 当点列的凹部之间的间隔减小时，容易以自组织的方式形成具有沿深度方向具有均匀凹槽宽度的大深度的线性格栅槽图案。