Method of inspecting circuit pattern and inspecting instrument
    11.
    发明授权
    Method of inspecting circuit pattern and inspecting instrument 有权
    电路图案检查方法

    公开(公告)号:US06583634B1

    公开(公告)日:2003-06-24

    申请号:US09559563

    申请日:2000-04-27

    IPC分类号: G01R31305

    摘要: In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.

    摘要翻译: 为了根据要检查的电路图案的材料和结构获得电子束的最佳照射条件以及在最佳条件下无故障检测的种类和检查时间的延迟,检查装置 将电子束19照射到作为样本的样品板9,由检测器7检测产生的二次电子,将获得的信号顺序地存储在存储器中,比较由比较计算单元存储在存储器中的相同模式,并提取故障 提供了通过故障判定单元将预定阈值与比较信号进行比较,其中根据样本的结构和照射的推荐值,将照射能量的最佳值预先存储在设备内部的数据库中 可以通过使用照射能量的输入或选择来搜索适合于检查的能量 或输入关于被检查物品的结构的信息。

    Method of inspecting circuit pattern and inspecting instrument
    12.
    发明授权
    Method of inspecting circuit pattern and inspecting instrument 失效
    电路图案检查方法

    公开(公告)号:US06703850B2

    公开(公告)日:2004-03-09

    申请号:US10430188

    申请日:2003-05-07

    IPC分类号: G01R31305

    摘要: In order to obtain optimum irradiation conditions of an electron beam according to the material and structure of a circuit pattern to be inspected and the kind of a failure to be detected and inspect under the optimum conditions without delay of the inspection time, an inspection device for irradiating the electron beam 19 to the sample board 9 which is a sample, detecting generated secondary electrons by the detector 7, storing obtained signals sequentially in the storage, comparing the same pattern stored in the storage by the comparison calculation unit, and extracting a failure by comparing the predetermined threshold value with the comparison signal by the failure decision unit is provided, wherein the optimum value of the irradiation energy is stored in the data base inside the device beforehand according to the structure of a sample and a recommended value of the irradiation energy suited to inspection can be searched for by inputting or selecting the irradiation energy by a user or inputting information regarding the structure of an article to be inspected.

    摘要翻译: 为了根据要检查的电路图案的材料和结构获得电子束的最佳照射条件以及在最佳条件下无故障检测的种类和检查时间的延迟,检查装置 将电子束19照射到作为样本的样品板9,由检测器7检测产生的二次电子,将获得的信号顺序地存储在存储器中,比较由比较计算单元存储在存储器中的相同模式,并提取故障 提供了通过故障判定单元将预定阈值与比较信号进行比较,其中根据样本的结构和照射的推荐值,将照射能量的最佳值预先存储在设备内部的数据库中 可以通过使用照射能量的输入或选择来搜索适合于检查的能量 或输入关于被检查物品的结构的信息。

    Map generation apparatus, map generation method, moving method for moving body, and robot apparatus
    13.
    发明授权
    Map generation apparatus, map generation method, moving method for moving body, and robot apparatus 有权
    地图生成装置,地图生成方法,移动体的移动方法和机器人装置

    公开(公告)号:US09224043B2

    公开(公告)日:2015-12-29

    申请号:US13824855

    申请日:2011-08-30

    摘要: Performing map construction under a crowded environment where there are a lot of people. It includes a successive image acquisition unit that obtains images that are taken while a robot is moving, a local feature quantity extraction unit that extracts a quantity at each feature point from the images, a feature quantity matching unit that performs matching among the quantities in the input images, where quantities are extracted by the extraction unit, an invariant feature quantity calculation unit that calculates an average of the matched quantities among a predetermined number of images by the matching unit as an invariant feature quantity, a distance information acquisition unit that calculates distance information corresponding to each invariant feature quantity based on a position of the robot at times when the images are obtained, and a map generation unit that generates a local metrical map as a hybrid map.

    摘要翻译: 在有很多人的拥挤的环境下进行地图建设。 它包括连续图像获取单元,其获得在机器人移动期间拍摄的图像;局部特征量提取单元,从图像中提取每个特征点处的数量;特征量匹配单元, 输入图像,其中通过提取单元提取量;不变特征量计算单元,其通过匹配单元计算预定数量的图像中的匹配量的平均值作为不变特征量;距离信息获取单元,其计算距离 基于在获取图像时的机器人的位置对应于每个不变特征量的信息,以及生成本地计量图作为混合图的地图生成单元。

    semiconductor device and process for producing the same
    14.
    发明申请
    semiconductor device and process for producing the same 有权
    半导体装置及其制造方法

    公开(公告)号:US20070205467A1

    公开(公告)日:2007-09-06

    申请号:US11649269

    申请日:2007-01-04

    IPC分类号: H01L29/76

    摘要: A semiconductor device having a contact structure is provided. The semiconductor device includes: a conductive region; a first film and a second film which are formed over the conductive region to realize a layer; and a contact electrode which extends through the layer to the conductive region, and is formed so as to replace a portion of the layer with a portion of the contact electrode, where the portion of the layer is constituted by only the first film, only the second film, or both of a portion of the first film and a portion of the second film, and the portion of the first film occupies a major part of the portion of the layer.

    摘要翻译: 提供具有接触结构的半导体器件。 半导体器件包括:导电区域; 形成在所述导电区域上以实现层的第一膜和第二膜; 以及接触电极,该接触电极通过该层延伸到导电区域,并且形成为用该接触电极的一部分来代替该层的一部分,其中该部分仅由第一膜构成,只有 第二膜或第一膜的一部分和第二膜的一部分两者,并且第一膜的部分占该层的该部分的主要部分。

    Cubic parking apparatus
    18.
    发明授权
    Cubic parking apparatus 失效
    CUBIC停车场

    公开(公告)号:US5118239A

    公开(公告)日:1992-06-02

    申请号:US568056

    申请日:1990-08-16

    申请人: Hiroshi Morioka

    发明人: Hiroshi Morioka

    IPC分类号: E04H6/22 E04H6/28

    CPC分类号: E04H6/282 E04H6/225

    摘要: The present invention relates to a cubic parking apparatus vertically formed with parking spaces in a multi-stage fashion to move a car in and out of the parking space through a pallet, in which guides and lateral guides are provided on the parking spaces and a carriage of an elevator, and a transfer device for laterally moving the pallet is provided on the carriage whereby when the pallet is delivered between the carriage and the parking space, a great torsional moment is prevented from being loaded in the carriage to simplify a construction of an elevator device. There is provided a cubic parking apparatus in which a turning device is provided which can be moved forward and backward in an approximately horizontal direction with respect to the carriage passing path, whereby a home position for moving the carriage above and below a position at which the turning device is disposed to move a car in and out of the parking space can be disposed on a suitable story, and parking spaces can be effectively secured.

    摘要翻译: 本发明涉及一种立式停车设备,其以多级的方式垂直地形成有停车位,用于通过托盘将车辆移入和离开停车空间,托盘中设有导轨和侧向导轨,托架 的电梯和用于横向移动托盘的传送装置设置在滑架上,由此当托架在托架和停车空间之间传送时,防止大的扭矩被装载在托架中,以简化托架 电梯设备。 提供了一种立体停车装置,其中设置有能够相对于滑架通过路径在大致水平方向上前后移动的转动装置,由此将滑架的上下移动的位置, 转向装置被设置成将车辆移入和离开停车位可以被布置在合适的故事上,并且可以有效地确保停车位。

    Micro pattern forming method and semiconductor device manufacturing method
    19.
    发明授权
    Micro pattern forming method and semiconductor device manufacturing method 有权
    微图案形成方法和半导体器件制造方法

    公开(公告)号:US07670759B2

    公开(公告)日:2010-03-02

    申请号:US10692722

    申请日:2003-10-27

    申请人: Hiroshi Morioka

    发明人: Hiroshi Morioka

    IPC分类号: G03F1/00 B44C1/22

    CPC分类号: G03F7/40 G03F7/427

    摘要: Photosensitive resist material is coated on a substrate and exposed and developed to form a resist pattern. The surface layer of sidewalls and a top wall of the resist pattern is etched by plasma of a mixture gas of a first gas and an SO2 gas, the first gas being at least one gas selected from a group consisting of He, Ne, Ar, Xe, Kr, CO, CO2 and N2. Resist pattern deformation and pattern collapse can be prevented while the resist pattern shrinks.

    摘要翻译: 将感光抗蚀剂材料涂覆在基材上并曝光和显影以形成抗蚀剂图案。 通过第一气体和SO 2气体的混合气体的等离子体蚀刻侧壁的表面层和抗蚀剂图案的顶壁,第一气体是选自由He,Ne,Ar, Xe,Kr,CO,CO2和N2。 可以防止抗蚀剂图案变形和图案塌陷,同时抗蚀剂图案收缩。