-
11.发明授权Optical member made of synthetic quartz glass, and process for its production 失效由合成石英玻璃制成的光学元件及其生产工艺公开(公告)号：US07784307B2
公开(公告)日：2010-08-31
申请号：US11540760
申请日：2006-10-02
申请人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
发明人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , C03C2203/54
摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm.sup.2-ppb).sup.-1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm.sup.2) by the laser, to be 0.Itoreq.R.Itoreq.0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所使用的激光束的能量密度设置光学构件的OH基浓度，以调节比率R（KJ / cm 2 -Pbb ）为1，光学部件的折射率与激光的累积照射能量（KJ / cm 2）的变化为0.Itoreq.R.Itore.0.0，由此控制 通过用激光束照射由合成石英玻璃制成的光学构件的折射率的变化在预定范围内。
-
公开(公告)号：US20070160916A1
公开(公告)日：2007-07-12
申请号：US11330205
申请日：2006-01-12
申请人： Yoshiaki Ikuta , Toshiyuki Uno , Ken Ebihara
发明人： Yoshiaki Ikuta , Toshiyuki Uno , Ken Ebihara
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F1/38 , G03F1/40 , G03F7/70708 , G21K2201/067 , Y10T428/31616
摘要： There are provided a substrate with a reflective layer and an EUV mask blank, which can prevent particles from adhering to a surface of the reflective layer or an absorbing layer, or into a reflective layer or an absorbing layer during formation thereof by eliminating electrical connection between a film formed on a front surface of the substrate and a film formed on a rear surface of the substrate. A substrate with a reflective layer, which is usable to fabricate a reflective mask blank for EUV lithography, comprising a chucking layer formed on a rear surface opposite a surface with the reflective layer formed thereon, the chucking layer serving to chuck and support the substrate by an electrostatic chuck, wherein the reflective layer has no electrical connection to the chucking layer.
摘要翻译： 提供了具有反射层和EUV掩模坯料的基板，其可以防止颗粒在其形成期间粘附到反射层或吸收层的表面，或者通过消除反射层或吸收层之间的电连接 形成在基板的前表面上的膜和形成在基板的后表面上的膜。 具有反射层的基板，其可用于制造用于EUV光刻的反射掩模板，包括形成在与形成在其上的反射层相反的表面的后表面上的夹持层，夹持层用于卡盘并支撑基板， 静电卡盘，其中反射层与夹持层没有电连接。
-
13.发明申请公开(公告)号：US20070059608A1
公开(公告)日：2007-03-15
申请号：US11222979
申请日：2005-09-12
申请人： Yoshiaki Ikuta , Hiroshi Kojima , Kouji Otsuka
发明人： Yoshiaki Ikuta , Hiroshi Kojima , Kouji Otsuka
CPC分类号： G03F7/707 , G03F1/60 , G03F7/703 , G03F7/70783
摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.
摘要翻译： 通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量 基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。
-
14.发明申请Optical member made of synthetic quartz glass, and process for its production 失效由合成石英玻璃制成的光学元件及其生产工艺公开(公告)号：US20070027018A1
公开(公告)日：2007-02-01
申请号：US11540760
申请日：2006-10-02
申请人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
发明人： Tomonori Ogawa , Yoshiaki Ikuta , Shinya Kikugawa
CPC分类号： C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , C03C2203/54
摘要： To reduce the change in the refractive index of an irradiated portion of synthetic quartz glass, caused by the irradiation with a high energy light emitted from a light source such as a KrF excimer laser or an ArF excimer laser. A process for producing an optical member made of synthetic quartz glass, wherein the OH group concentration of the optical member is set depending upon the energy density of the laser beam employed, to adjust the ratio R (KJ/cm2-ppb)−1 of the change in the refractive index of the optical member to the cumulative irradiation energy (KJ/cm2) by the laser, to be 0≦R≦0.2, thereby to control the change in the refractive index of the optical member made of synthetic quartz glass by the irradiation with a laser beam to be within a predetermined range.
摘要翻译： 为了减少由诸如KrF准分子激光器或ArF准分子激光器的光源发射的高能量光的照射引起的合成石英玻璃的照射部分的折射率的变化。 一种制造由合成石英玻璃制成的光学构件的方法，其中根据所用激光束的能量密度设置光学构件的OH基浓度，以调节比例R（KJ / cm 2）/ 光学构件的折射率与激光的累积照射能量（KJ / cm 2）之间的变化的值为0以上的SUP〜-ppb）为0 <= R <= 0.2，从而通过激光束的照射来控制由合成石英玻璃制成的光学构件的折射率的变化，使其在预定范围内。
-
公开(公告)号：US07022633B2
公开(公告)日：2006-04-04
申请号：US10317068
申请日：2002-12-12
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用途的合成石英玻璃，其通过在含有氟的紫外区域至真空紫外区域的范围内的光照射而使用，所述氟化物具有2250cm -1的散射峰强度 （I 2250）相对于800cm -1（I 800）的散射峰强度，即I 2250 在激光拉曼光谱中，其最大吸收系数为245nm，最多为2×10 3，最大为1×10 -4， SUP> -3cm -1 -1。
-
16.发明授权Synthetic quartz glass for optical member, process for producing the same, and method of using the same 失效用于光学构件的合成石英玻璃及其制造方法及其使用方法公开(公告)号：US06544914B1
公开(公告)日：2003-04-08
申请号：US09701191
申请日：2000-12-28
IPC分类号： C03C306
CPC分类号： C03C23/002 , B08B7/0057 , C03B19/1453 , C03B19/1469 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C2201/23 , C03C2203/50 , Y02P40/57
摘要： A process for producing a synthetic quartz glass for an optical member, which comprises a step of irradiating a synthetic quartz glass having an OH group content of 50 ppm or lower with vacuum ultraviolet light having a wavelength of 180 nm or shorter to improve the transmittance in a region of wavelengths of not longer than 165 nm.
摘要翻译： 一种用于制造用于光学构件的合成石英玻璃的方法，其包括用波长为180nm或更短的真空紫外光照射具有50ppm或更低的OH基含量的合成石英玻璃以提高透射率的步骤 波长不超过165nm的区域。
-
公开(公告)号：US06499317B1
公开(公告)日：2002-12-31
申请号：US09581263
申请日：2000-10-17
IPC分类号： G01N2300
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/12 , C03B2201/21 , C03B2201/23 , C03C23/002 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2203/44 , C03C2203/54 , Y02P40/57 , Y10S65/16 , Y10S501/90 , Y10S501/905
摘要： A synthetic quartz glass for optical use, to be used by irradiation with light within a range of from the ultraviolet region to the vacuum ultraviolet region, which contains fluorine, which has a ratio of the scattering peak intensity of 2250 cm−1 (I2250) to the scattering peak intensity of 800 cm−1 (I800), i.e. I2250/I800, of at most 1×10−4 in the laser Raman spectrum, and which has an absorption coefficient of light of 245 nm of at most 2×10−3 cm−1.
摘要翻译： 一种用于光学用的合成石英玻璃，其用于通过在从含有氟的紫外线区域到真空紫外线区域的光的照射下使用，其具有2250cm -1（I2250）的散射峰强度比， 对于激光拉曼光谱中至多为1×10 -4的800cm -1（I800）的散射峰强度（I800），即I2250 / I800，其吸光系数为245nm，最多为2×10 -3 cm -3， 1。
-
公开(公告)号：US06475575B1
公开(公告)日：2002-11-05
申请号：US09831360
申请日：2001-08-06
申请人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
发明人： Yoshiaki Ikuta , Shinya Kikugawa , Hitoshi Mishiro , Hiroshi Arishima , Kaname Okada , Katsuhiro Matsumoto
IPC分类号： A47G112
CPC分类号： G03F1/62 , C03B33/082 , C03B2201/04
摘要： It is characterized by having a pellicle sheet made of a synthetic quartz glass having an OH group concentration of at most 100 ppm and containing substantially no oxygen deficient defect. It is particularly preferred that the OH group concentration is at most 10 ppm, and the internal transmittance is at least 80%/cm at a wavelength of 157 nm.
摘要翻译： 其特征在于，具有由OH基浓度为100ppm以下且基本上不含缺氧缺陷的合成石英玻璃制成的防护薄片。 特别优选OH基浓度为10ppm以下，内部透射率为157nm以上至少80％/ cm 3。
-
公开(公告)号：US4756368A
公开(公告)日：1988-07-12
申请号：US2868
申请日：1987-01-13
摘要： The present invention relates to a method for drawing up a crude oil containing a great amount of wax or a high-viscosity crude oil. The method of the present invention is characterized by cracking or fractionating the crude oil which has been drawn up, in order to prepare a cracked oil or a gas oil, and by drawing up the crude oil, while injecting a part of the cracked oil or the gas oil into an oil well. According to the present invention, an efficient drawing operation can be achieved.
摘要翻译： 本发明涉及一种用于制备含有大量蜡或高粘度原油的原油的方法。 本发明的方法的特征在于，为了制备裂化油或粗柴油，以及在将一部分裂化油注入的同时拉起原油，将已经被拉伸的原油开裂或分馏，或 瓦斯油成油井。 根据本发明，可以实现有效的拉拔操作。
-
20.发明申请REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND PROCESS FOR PRODUCTION OF THE REFLECTIVE LAYER-EQUIPPED SUBSTRATE 有权用于EUV光刻的反射层设备衬底，用于EUV光刻的反射掩膜，用于EUV光刻的反射掩模，以及用于生产反射层的衬底的工艺公开(公告)号：US20120231378A1
公开(公告)日：2012-09-13
申请号：US13478532
申请日：2012-05-23
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G02B5/0891 , G03F7/70316 , G03F7/70958 , G03F7/70983
摘要： Provided are an EUV mask blank in which deterioration in reflectivity due to oxidation of a Ru protective layer is prevented, a reflective layer-equipped substrate to be used for producing the EUV mask blank, and a process for producing the reflective layer-equipped substrate. A reflective layer-equipped substrate for EUV lithography comprising a substrate, and a reflective layer for reflecting EUV light and a protective layer for protecting the reflective layer, formed in this order on the substrate, wherein the reflective layer is a Mo/Si multilayer reflective film, the protective layer is a Ru layer or a Ru compound layer, and an intermediate layer containing from 0.5 to 25 at % of nitrogen and from 75 to 99.5 at % of Si is formed between the reflective layer and the protective layer.
摘要翻译： 提供了防止由于Ru保护层的氧化引起的反射率的劣化的EUV掩模坯料，用于制造EUV掩模坯料的反射层的衬底以及用于制造具有反射层的衬底的工艺。 一种用于EUV光刻的反射层衬底，包括衬底，以及用于反射EUV光的反射层和用于保护反射层的保护层，其依次形成在衬底上，其中反射层是Mo / Si多层反射 膜，保护层是Ru层或Ru化合物层，并且在反射层和保护层之间形成含有0.5至25原子％的氮和75至99.5原子％的Si的中间层。
-
-
-
-
-
-
-
-
-
搜索结果
54 条记录 (耗时 0.022 秒)