公开(公告)号：US20090139833A1

公开(公告)日：2009-06-04

申请号：US12324788

申请日：2008-11-26

申请人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： B65G43/08

CPC分类号： H01L21/67178 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67276 ,  H01L21/67742

摘要： A substrate treating apparatus includes substrate treatment lines arranged one over another, each for treating substrates while transporting the substrates substantially horizontally. The apparatus further includes an interface section for transporting the substrates between the substrate treatment lines and an exposing machine having a plurality of exposing stages, the exposing machine being provided separately from the apparatus, and a controller for controlling transport of the substrates in the interface section to cause all the substrates similarly treated in each of the substrate treatment lines to be exposed on one of the exposing stages. This apparatus can uniform the quality of treatment among a plurality of substrates receiving the same type of treatment in the same substrate treating line.

摘要翻译： 基板处理装置包括彼此重叠布置的基板处理线，每个基板处理线基本上水平地输送基板，用于处理基板。 该装置还包括用于在基板处理线之间输送基板的接口部分和具有多个曝光台的曝光机，所述曝光机与所述装置分开设置，以及用于控制所述基板在所述界面部分中的传送的控制器 使得在每个基板处理线中类似地处理的所有基板在一个曝光阶段上暴露。 该装置可以在同一基板处理线中接收相同类型处理的多个基板之间使处理质量均匀。

公开(公告)号：US20090139450A1

公开(公告)日：2009-06-04

申请号：US12324802

申请日：2008-11-26

申请人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： B05C11/00

CPC分类号： B05C13/00 ,  B05C9/12 ,  B05C11/08 ,  B05C13/02 ,  C23C14/568 ,  G03F7/16 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/135

摘要： A treating section includes a plurality of treating blocks juxtaposed horizontally. Each treating block is vertically divided into stories. Each story includes treating units and a main transport mechanism. Substrates are transportable between the same stories of the treating blocks. Further, the substrates are transportable between different stories. Thus, the apparatus can transport the substrates flexibly between the treating blocks.

摘要翻译： 处理部包括水平并列的多个处理块。 每个处理块垂直分为故事。 每个故事包括处理单位和主要运输机制。 底物可在治疗块的相同故事之间运输。 此外，基材可在不同的故事之间运输。 因此，该装置可以在处理块之间灵活地输送基板。

公开(公告)号：US5639301A

公开(公告)日：1997-06-17

申请号：US461066

申请日：1995-06-05

申请人： Shigeru Sasada ,  Kaoru Aoki ,  Mitsumasa Kodama ,  Kenji Sugimoto ,  Yoshiteru Fukutomi ,  Hidekazu Inoue

发明人： Shigeru Sasada ,  Kaoru Aoki ,  Mitsumasa Kodama ,  Kenji Sugimoto ,  Yoshiteru Fukutomi ,  Hidekazu Inoue

IPC分类号： B23P19/00 ,  H01L21/00 ,  H01L21/677 ,  B05C5/00

CPC分类号： H01L21/67173 ,  H01L21/67178 ,  H01L21/67276 ,  Y10S414/135 ,  Y10S414/137

摘要： An apparatus including a structure which separates a first transport robot (high temperature robot), which accesses a first processing part group including the thermal processing parts, from a second transport robot (low temperature robot) which accesses the only non-thermal processing parts. During circulating transportation of substrates to be processed, heat created at thermal processing parts is prevented from flowing into non-thermal processing parts. Semiconductor wafers are circulated one by one between the first processing part group which includes a hot plate and a second processing part group which does not include a hot plate and processed one at a time at each processing part. The high temperature robot accesses the first processing part group while the low temperature robot accesses the second processing part group. Transfer of a semiconductor wafer between the two robots is performed at a transfer part which is formed using a cool plate. Since the low temperature robot is never subjected to heat, temperatures at the non-thermal processing parts which are included in the second processing part group remain stable even when the low temperature robot accesses the non-thermal processing parts.

摘要翻译： 一种包括将第一输送机器人（高温机器人）从第二输送机器人（低温机器人）访问的非热处理部分分离的装置，该第一输送机器人从高温处理部进入第一处理部。 在要处理的基板的循环运送期间，防止在热处理部件产生的热量流入非热处理部件。 半导体晶片在包括热板的第一处理部分组和不包括热板的第二处理部分组之间逐个循环，并且在每个处理部分一次处理半导体晶片。 高温机器人访问第一处理部分组，而低温机器人访问第二处理部分组。 在两个机器人之间的半导体晶片的转移是在使用冷板形成的转印部分进行的。 由于低温机器人不会受到热量的影响，即使在低温机器人进入非热处理部件时，包含在第二处理部件组中的非热处理部件的温度也保持稳定。

公开(公告)号：US5322079A

公开(公告)日：1994-06-21

申请号：US952281

申请日：1992-09-28

申请人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Yasushi Nakamura

发明人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Yasushi Nakamura

IPC分类号： H01L21/304 ,  B08B11/02 ,  G03F7/16 ,  H01L21/306 ,  H01L21/683 ,  H01L21/687 ,  B08B3/02

CPC分类号： H01L21/68728 ,  B08B11/02 ,  G03F7/162 ,  H01L21/67225

摘要： A substrate holding apparatus includes a rotary table rotatable about a vertical center axis for supporting a substrate in a horizontal plane, and substrate travel regulating pins fixed to the rotary table and arranged at positions in contact with the outer edge of the substrate so that the center of gravity of the substrate supported on the rotary table is spaced from the center axis for regulating the travel of the substrate in a horizontal direction. Centrifugal force generated with respect to the substrate when the rotary table rotates about the center axis, urges the periphery of the substrate towards the travel regulating pins so that the resulting frictional force prevents rotary slippage between the substrate and the rotary table as rotation of the latter relates to the latter. The structure of this apparatus is simple because the substrate holding portion does not include a movable portion. It is easy to mount a substrate onto this apparatus because it is not necessary to align the orientation flat and the like at a predetermined position.

摘要翻译： 基板保持装置包括：旋转台，其可绕垂直中心轴线旋转，用于支撑水平面中的基板;以及基板行进限制销，固定到旋转台并且布置在与基板的外边缘接触的位置，使得中心 支撑在旋转台上的基板的重力与中心轴线间隔开，用于调节基板在水平方向上的移动。 当旋转台围绕中心轴线旋转时，相对于基板产生的离心力将基板的周边推向行进调节销，使得所产生的摩擦力防止基板和旋转台之间的旋转滑动， 涉及后者。 该装置的结构简单，因为基板保持部不包括可动部。 由于不需要将定向平面等对准在预定位置，因此将基板安装在该装置上是容易的。

公开(公告)号：US09184071B2

公开(公告)日：2015-11-10

申请号：US12324802

申请日：2008-11-26

申请人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Hiroyuki Ogura ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： C23C16/00 ,  B05C13/02 ,  H01L21/67 ,  H01L21/677 ,  C23C14/56

CPC分类号： B05C13/00 ,  B05C9/12 ,  B05C11/08 ,  B05C13/02 ,  C23C14/568 ,  G03F7/16 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67276 ,  H01L21/67703 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S414/135

摘要： A treating section includes a plurality of treating blocks juxtaposed horizontally. Each treating block is vertically divided into stories. Each story includes treating units and a main transport mechanism. Substrates are transportable between the same stories of the treating blocks. Further, the substrates are transportable between different stories. Thus, the apparatus can transport the substrates flexibly between the treating blocks.

摘要翻译： 处理部包括水平并列的多个处理块。 每个处理块垂直分为故事。 每个故事包括处理单位和主要运输机制。 底物可在治疗块的相同故事之间运输。 此外，基材可在不同的故事之间运输。 因此，该装置可以在处理块之间灵活地输送基板。

公开(公告)号：US09174235B2

公开(公告)日：2015-11-03

申请号：US13401625

申请日：2012-02-21

申请人： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： B05C13/00 ,  H01L21/67 ,  B05D3/04 ,  B05B15/12

CPC分类号： H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

摘要： A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism disposed in a transporting space for transporting the substrates to the treating units. The treating units include solution treating units and heat-treating units. The solution treating units are arranged at one side of the transporting space, the heat-treating units are arranged at the other side of the transporting space, and the main transport mechanism and the treating units are in substantially the same layout in plan view for the respective cells. The solution treating units are in substantially the same layout in side view for the respective cells, the heat-treating units are in substantially the same layout in side view for the respective cells, and treatments of the substrates carried out in the respective cells are the same.

摘要翻译： 一种基板处理装置，包括处理块，该处理块包括多个彼此排列的单元。 每个单元具有用于处理基板的处理单元和设置在用于将基板输送到处理单元的输送空间中的单个主输送机构。 处理单元包括溶液处理单元和热处理单元。 溶液处理单元布置在传送空间的一侧，热处理单元布置在传送空间的另一侧，主传送机构和处理单元在平面图中基本相同的布局 各自的细胞。 溶液处理单元在各个单元的侧视图中基本相同的布局，热处理单元在各个单元的侧视图中基本相同的布局，并且在各单元中执行的基板的处理是 相同。

公开(公告)号：US08031324B2

公开(公告)日：2011-10-04

申请号：US12031667

申请日：2008-02-14

申请人： Yoshiteru Fukutomi ,  Masami Ohtani

发明人： Yoshiteru Fukutomi ,  Masami Ohtani

IPC分类号： G03B27/52 ,  G03D5/00

CPC分类号： H01L21/68764 ,  H01L21/67051 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/68707 ,  H01L21/68728

摘要： In a substrate processing apparatus, an indexer block, a resist film processing block, a cleaning/drying processing block, a development processing block, and an interface block are provided side by side in this order. An exposure device is arranged adjacent to the interface block. The exposure device subjects a substrate to exposure processing by means of a liquid immersion method. Substrate platforms are provided in close proximity one above the other between the cleaning/drying processing block and the development processing block for receiving and transferring the substrate therebetween. Reversing units that reverse one surface and the other surface of the substrate are respectively stacked above and below the substrate platforms.

摘要翻译： 在基板处理装置中，按顺序并排设置分度器块，抗蚀剂膜处理块，清洁/干燥处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 曝光装置通过液浸法对基板进行曝光处理。 在清洁/干燥处理块和用于在其间接收和转移基板的显影处理块之间彼此靠近地提供基板平台。 将基板的一个表面和另一个表面相反的反转单元分别堆叠在基板平台的上方和下方。

公开(公告)号：US20090165712A1

公开(公告)日：2009-07-02

申请号：US12343292

申请日：2008-12-23

申请人： Hiroyuki OGURA ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

发明人： Hiroyuki OGURA ,  Tsuyoshi Mitsuhashi ,  Yoshiteru Fukutomi ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC分类号： B05C11/00

CPC分类号： H01L21/67225 ,  B05C9/12 ,  B05C9/14 ,  B05C13/00 ,  B05C13/02 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67196 ,  H01L21/67276 ,  H01L21/67742

摘要： A substrate treating apparatus for treating substrates includes a plurality of substrate treatment lines arranged vertically for carrying out plural types of treatment on the substrates while transporting the substrates substantially horizontally, and a controller for changing processes of treatment carried out on the substrates for each of the substrate treatment lines. By changing the processes of treatment carried out for the substrates for each substrate treatment line, the processes of treatment carried out for the substrates can be changed for each substrate conveniently. Thus, a plurality of different processes of treatment corresponding to the number of substrate treatment lines can be carried out in parallel for the respective substrates.

摘要翻译： 用于处理基板的基板处理装置包括：垂直布置的多个基板处理线，用于在基板上大致水平地输送基板的同时在基板上进行多种处理;以及控制器，用于改变对基板的处理 底物处理线。 通过改变对于每个基板处理线的基板的处理过程，可以方便地对每个基板改变对基板进行的处理的处理。 因此，对于各个基板，可以并行地执行与基板处理线的数量相对应的多个不同的处理处理。

公开(公告)号：US5359785A

公开(公告)日：1994-11-01

申请号：US977990

申请日：1992-11-18

申请人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Takeo Okamoto

发明人： Yoshiteru Fukutomi ,  Masami Ohtani ,  Takeo Okamoto

IPC分类号： G02F1/13 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  F26B19/00

CPC分类号： H01L21/67769 ,  H01L21/67766 ,  H01L21/6838

摘要： A deck movable between cassettes arranged on a base for storing a plurality of substrates in multiple stages and a substrate cleaning section for cleaning the substrates, supports a substrate fetching arm for fetching the substrates from the cassettes, and a cleaned substrate depositing arm for depositing treated substrates. The depositing arm is vertically movable between a position in which a substrate supporting surface thereof is situated below a substrate supporting surface of the substrate fetching arm to render the latter operative, and a position in which the supporting surface of the depositing arm is situated above the supporting surface of the fetching arm to render the depositing arm operative.

摘要翻译： 可以在布置在基座上的多个基板之间移动的平台和用于清洁基板的基板清洁部分，支撑用于从卡带取出基板的基板取出臂以及用于沉积处理的清洁的基板沉积臂 底物。 沉积臂可以在其基板支撑表面位于基板支撑臂的基板支撑表面下方的位置之间垂直移动以使后者操作，并且存放臂的支撑表面位于其上方的位置 抓取臂的支撑表面以使沉积臂可操作。

公开(公告)号：US5308210A

公开(公告)日：1994-05-03

申请号：US80652

申请日：1993-06-22

申请人： Masami Ohtani ,  Yoshiji Oka ,  Takeo Okamoto ,  Yoshiteru Fukutomi

发明人： Masami Ohtani ,  Yoshiji Oka ,  Takeo Okamoto ,  Yoshiteru Fukutomi

IPC分类号： B65G49/07 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/68728 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/68742 ,  H01L21/68785 ,  Y10S414/137

摘要： An interface apparatus for transferring substrates between processing apparatus which provide various treatments for the substrates. The interface apparatus includes a transfer mechanism which, during a normal operation, receives substrates from an upstream processing apparatus and delivers the substrates to a downstream processing apparatus. Upon occurrence of a trouble in the downstream processing apparatus, the substrates transported from the upstream processing apparatus to the transfer mechanism are deposited in a substrate storage by a depositing and fetching mechanism. After the trouble is eliminated, the transfer mechanism delivers the substrates taken out of the storage to the downstream processing apparatus.

摘要翻译： 一种用于在对基板提供各种处理的处理装置之间传送基板的界面装置。 接口装置包括传送机构，其在正常操作期间从上游处理装置接收基板并将基板输送到下游处理装置。 在下游处理装置发生故障的情况下，通过存放取出机构将从上游处理装置输送到转印机构的基板沉积在基板收纳部中。 在消除了故障之后，传送机构将从存储器中取出的基板传送到下游处理装置。