摘要:
Low thermal expansion ceramics contains a cordierite crystal phase, wherein a phase of a crystalline compound containing at least one element selected from the group consisting of an alkaline earth element other than Mg, a rare earth element, Ga and In, is precipitated in the grain boundaries of said crystal phase, said ceramics has a relative density of not smaller than 95%, a coefficient of thermal expansion of not larger than 1×10−6/° C. at 10 to 40° C., and a Young's modulus of not smaller than 130 GPa. That is, the ceramics has a small coefficient of thermal expansion, is deformed very little depending upon a change in the temperature, has a very high Young's modulus and is highly rigid and is resistance against external force such as vibration. Accordingly, the ceramics is very useful as a member for supporting a wafer or an optical system is a lithography apparatus that forms high resolution circuit patterns on a silicon wafer.
摘要:
In a non-volatile memory in which a floating gate is provided above a single crystal control region, a potential of wiring, which is arranged above the floating gate, has a capacitive coupling with respect to the floating gate, or even one part in and on an insulating film on the floating gate is included or attached with electric charge, thereby varying the gate threshold voltage of the floating gate non-volatile memory measured from the single crystal control region. In order to solve the above-described problems, the present invention provides following methods. A shield conductive film is provided above a floating gate through a shield insulating film. For the shield insulating film, there is used an insulating film formed by not a deposition method in which a gas atmosphere containing un-balanced charge particles such as excess electrons or excess ions contacts with a wafer surface, such as plasma CVD but a deposition method in which neutral molecules/atoms come flying immediately above the wafer, for example, thermal CVD, radical CVD, photo-assisted CVD, or thermal oxidization.
摘要:
A fast low voltage ballistic program, ultra-short channel, ultra-high density, dual-bit multi-level flash memory is described with a two or three polysilicon split gate side wall process. The structure and operation of this invention is enabled by a twin MONOS cell structure having an ultra-short control gate channel of less than 40 nm, with ballistic injection which provides high electron injection efficiency and very fast program at low program voltages of 3˜5V. The cell structure is realized by (i) placing side wall control gates over a composite of Oxide-Nitride-Oxide (ONO) on both sides of the word gate, and (ii) forming the control gates and bit diffusion by self-alignment and sharing the control gates and bit diffusions between memory cells for high density. Key elements used in this process are: 1) Disposable side wall process to fabricate the ultra short channel and the side wall control gate with or without a step structure, and 2) Self-aligned definition of the control gate over the storage nitride and the bit line diffusion, which also runs in the same direction as the control gate. The features of fast program, low voltage, ultra-high density, dual-bit, multi-level MONOS NVRAM of the present invention include: 1) Electron memory storage in nitride regions within an ONO layer underlying the control gates, 2) high density dual-bit cell in which there are two nitride memory storage elements per cell, 3) high density dual-bit cell can store multi-levels in each of the nitride regions, 4) low current program controlled by the word gate and control gate, 5) fast, low voltage program by ballistic injection utilizing the controllable ultra-short channel MONOS, and 6) side wall control poly gates to program and read multi-levels while masking out memory storage state effects of the unselected adjacent nitride regions and memory cells. The ballistic MONOS memory cell is arranged in the following array: each memory cell contains two nitride regions for one word gate, and ½ a source diffusion and ½ a bit diffusion. Control gates can be defined separately or shared together over the same diffusion. Diffusions are shared between cells and run in parallel to the side wall control gates, and perpendicular to the word line.
摘要:
The present invention relates to a nonvolatile memory cell and/or array and a method of operating the same high integrated density nonvolatile memory cell enabling high integration density, low voltage programming and/or high speed programming, a method of programming same and a nonvolatile memory array. A p-well 101 is formed in a surface of a substrate 10 and a channel forming semiconductor region 110 is defined in a surface of the p-well 101 and separated by a first n+ region 121 and a second n+ region 122. A carrier-supplying portion (CS: carrier supply) 111 is formed coming into contact with the first n+ region 121 and a carrier-acceleration-injection portion 112 (AI: acceleration and injection) is in contact with the second n+ region 122 in the channel forming semiconductor region 110 wherein the carrier-supplying portion 111 and carrier-acceleration-injection portion 112 are in contact with each other.
摘要:
A memory cell with a stored charge on its gate comprising; (A) a channel forming region, (B) a first gate formed on an insulation layer formed on the surface of the channel forming region, the first gate and the channel forming region facing each other through the insulation layer, (C) a second gate capacitively coupled with the first gate, (D) source/drain regions formed in contact with the channel forming region, one source/drain region being spaced from the other, (E) a first non-linear resistance element having two ends, one end being connected to the first gate, and (F) a second non-linear resistance element composed of the first gate, the insulation layer and either the channel-forming region and at least one of the source/drain regions.
摘要:
A semiconductor memory cell comprising a first transistor for readout, a second transistor for switching, and having a first region, a second region formed in a surface region of the first region, a third region formed in a surface region of the second region, a fourth region formed in a surface region of the first region and spaced from the second region, a fifth region formed in a surface region of the fourth region, and a gate region, wherein when the semiconductor memory cell is cut with a first imaginary perpendicular plane which is perpendicular to the extending direction of the gate region and passes through the center of the gate region, the second region and the fourth region in the vicinity of the gate region are nearly symmetrical with respect to a second imaginary perpendicular plane which is in parallel with the extending direction of the gate region and passes through the center of the gate region.
摘要:
A stage apparatus of the invention comprises: a holder for holding a substrate, and a position detection device for detecting a position of the substrate, based on reflected light from a mobile mirror provided at a predetermined positional relationship with the holder. The holder and a base material of the mobile mirror consist of ceramics having a coefficient of thermal expansion of 1×10−6/° C. or less. With such an apparatus, costs related to temperature control can be reduced.
摘要:
An electronic device has a frame and a back board having plural logical units and power supply units mounted thereon. The logical units and the power supply units are alternately located on both sides of the back board in the center of the frame so that the power supply units mounted on one side of the back board may feed a power to the closest logical units mounted on the other side. Further, the air flow paths to be circulated through the logical units and the power supply units are formed so that each unit may be efficiently cooled by the air fed by an air fan unit. As a result, the feeding voltage becomes uniform and the cooling efficiency is improved.
摘要:
Provided in the present invention are a high speed and low program voltage nonvolatile memory cell, a programming method for same and a nonvolatile memory array. A nonvolatile memory cell comprises a first gate insulator formed on a surface of a first channel forming semiconductor region adjacent to a source region; a second gate insulator formed on a surface of a second channel forming semiconductor region adjacent to a drain region; a first gate electrode formed on said first gate insulator; and a second gate electrode formed on said second gate insulator wherein the second gate insulator includes a first layer forming a potential barrier at the interface with the second channel forming region; a third layer forming a potential barrier at the interface with the second gate electrode and the second layer between the first and third layers forming a carrier trapping level.
摘要:
The semiconductor nonvolatile memory has integrated memory cells, each being operative to carry out writing and reading of information in random-access basis and having an electric charge storage structure effective to memorize the information in nonvolatile state. The information is temporarily written into each memory cell in volatile state, and thereafter the temporarily written information is written at one into the respective electric charge storage structure of each memory cell, thereby effecting quick writing of nonvolatile information into the respective memory cells of multi-bits.