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30 条记录 (耗时 0.027 秒)

    Design rule correction system and method
    11.
    发明授权
    Design rule correction system and method 失效
    设计规则校正系统及方法

    公开(公告)号：US06189132B1

    公开(公告)日：2001-02-13

    申请号：US09057961

    申请日：1998-04-09

    申请人： Fook-Luen Heng ,  Zhan Chen ,  Gustavo E. Tellez ,  John Cohn ,  Rani Narayan

    发明人： Fook-Luen Heng ,  Zhan Chen ,  Gustavo E. Tellez ,  John Cohn ,  Rani Narayan

    IPC分类号： G06F1750

    CPC分类号： G06F17/5081

    摘要： A method of modifying a layout of a plurality of objects in accordance with a plurality of predetermined criteria is presented. An objective function is defined for measuring a location perturbation and a separation perturbation of the objects in the layout. A linear system is defined using linear constraints in terms of design rules and the objective function to describe separations between layout objects. The linear system is solved to simultaneously remove violations of the design rules, and shapes and positions of objects in the layout are modified in accordance with the solution of the linear system such that a total perturbation of the objects in the layout is reduced. A system for implementing the present invention is also presented.

    摘要翻译： 呈现了根据多个预定标准修改多个对象的布局的方法。 定义了一个目标函数，用于测量布局中对象的位置扰动和分离扰动。 使用线性约束在设计规则和用于描述布局对象之间的分离的目标函数方面定义线性系统。 解决线性系统以同时消除违反设计规则的情况，并且根据线性系统的解决方案来修改布局中对象的形状和位置，使得布局中的对象的总扰动减小。 还提出了用于实现本发明的系统。

    Compositions and methods for polishing silicon nitride materials
    14.
    发明申请
    Compositions and methods for polishing silicon nitride materials 有权
    用于研磨氮化硅材料的组合物和方法

    公开(公告)号：US20070298612A1

    公开(公告)日：2007-12-27

    申请号：US11448205

    申请日：2006-06-07

    申请人： Jeffrey Dysard ,  Sriram Anjur ,  Timothy Johns ,  Zhan Chen

    发明人： Jeffrey Dysard ,  Sriram Anjur ,  Timothy Johns ,  Zhan Chen

    IPC分类号： C03C15/00 ,  H01L21/302

    CPC分类号： C09K3/1463 ,  C09G1/02 ,  H01L21/31053

    摘要： The present invention provides a method for polishing silicon nitride-containing substrates. The method comprises abrading a surface of a silicon nitride substrate with a polishing composition, which comprises colloidal silica, at least one acidic component, and an aqueous carrier. The at least one acidic component has a pKa in the range of about 1 to 4.5. The composition has a pH in the range of about 0.5 pH units less than the pKa of the at least one acidic component to about 1.5 pH units greater than the pKa.

    摘要翻译： 本发明提供一种研磨含氮化硅的基板的方法。 该方法包括用抛光组合物研磨氮化硅衬底的表面，抛光组合物包括胶体二氧化硅，至少一种酸性组分和水性载体。 所述至少一种酸性组分的pKa在约1至4.5的范围内。 所述组合物的pH值比所述至少一种酸性组分的pKa小约0.5pH单位至大于pKa约1.5pH单位。

    Oxidation-stabilized CMP compositions and methods
    15.
    发明申请
    Oxidation-stabilized CMP compositions and methods 失效
    氧化稳定的CMP组合物和方法

    公开(公告)号：US20070219104A1

    公开(公告)日：2007-09-20

    申请号：US11384538

    申请日：2006-03-20

    申请人： Steven Grumbine ,  Renjie Zhou ,  Zhan Chen ,  Phillip Carter

    发明人： Steven Grumbine ,  Renjie Zhou ,  Zhan Chen ,  Phillip Carter

    IPC分类号： B08B7/00

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  C23F3/04 ,  C23F3/06

    摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives). The invention further provides a method of chemically-mechanically polishing a substrate with the CMP compositions, as well as a method of enhancing the shelf-life of CMP compositions containing an amine and a radical-forming oxidizing agent, in which a radical trapping agent is added to the CMP composition.

    摘要翻译： 本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。 任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。 本发明还提供了用CMP组合物对基材进行化学机械抛光的方法，以及提高含有胺和自由基形成氧化剂的CMP组合物的保存期限的方法，其中自由基捕获剂是 添加到CMP组合物中。

    Anti-glare reflective and transmissive devices
    17.
    发明申请
    Anti-glare reflective and transmissive devices 审中-公开
    防眩光反射和透射装置

    公开(公告)号：US20060221452A1

    公开(公告)日：2006-10-05

    申请号：US11373579

    申请日：2006-03-10

    申请人： Zhan Chen

    发明人： Zhan Chen

    IPC分类号： G02B5/08

    CPC分类号： B60R1/088 ,  G02F1/13725

    摘要： Devices that include a dichroic material sandwiched between first and second electrodes layers and exhibiting a high optical absorption when the first and second electrode layers are biased at a first electrical bias state and a low optical absorption when the first and second electrode layers are biased at a second, different electrical bias state. Such devices may be used to construct optically reflective devices such as anti-glare mirrors and optically transmissive devices such as eye glasses. The dichroic material may be selected to be operable to switch between the high optical absorption and the low optical absorption in less than 0.1 second.

    摘要翻译： 包括夹在第一和第二电极层之间的二向色材料的装置，并且当第一和第二电极层被偏置在第一电偏置状态时呈现高的光吸收，而当第一和第二电极层被偏置在 第二，不同的电偏置状态。 这种装置可用于构造光学反射装置，例如防眩光镜和诸如眼镜的光学透射装置。 二色性材料可以被选择为可操作以在小于0.1秒内在高光吸收和低光吸收之间切换。

    HIGH STABLE NON-IONIC N-VINYL BUTYROLACTAM IODINE AND PREPARATION METHOD THEREOF
    18.
    发明申请
    HIGH STABLE NON-IONIC N-VINYL BUTYROLACTAM IODINE AND PREPARATION METHOD THEREOF 审中-公开
    高稳定性非离子型N-乙烯基丁酰胺碘化物及其制备方法

    公开(公告)号：US20130296576A1

    公开(公告)日：2013-11-07

    申请号：US13978329

    申请日：2011-08-18

    申请人： Yu Wang ,  Zhan Chen

    发明人： Yu Wang ,  Zhan Chen

    IPC分类号： C07D207/267

    CPC分类号： C07D207/267 ,  C08F8/22 ,  C08F126/10

    摘要： The present invention relates to a preparation method of a high-stable non-ionic N-vinyl butyrolactam iodine, wherein non-ionic N-vinyl butyrolactam, iodine and at least one grinding aid are stirred at 150-800 r/min at a temperature of 50° C.-90° C. for 1 to 12 hours to prepare the high-stable non-ionic N-vinyl butyrolactam iodine, wherein the K value of the non-ionic N-vinyl butyrolactam is 32±1, the PD value of the main peak of the non-ionic N-vinyl butyrolactam is ≦1.6, the moisture content of the non-ionic N-vinyl butyrolactam is ≦2.5%, preferably, the grinding aid is selected one or several from sodium chloride, sodium citrate, sodium carbonate and sodium phosphate, the amount of the grinding aid added is 0.02 to 2% of the total amount of the non-ionic N-vinyl butyrolactam and the iodine, the non-ionic N-vinyl butyrolactam is PVP-K32, the high-stable non-ionic N-vinyl butyrolactam iodine prepared by the above mentioned method is also provided, the stability of the high-stable non-ionic N-vinyl butyrolactam iodine of the present invention is high, thereby facilitating long-term storage and use, thus the high-stable non-ionic N-vinyl butyrolactam iodine is suitable for large-scale popularization.

    摘要翻译： 本发明涉及一种高稳定性非离子型N-乙烯基丁内酰胺碘的制备方法，其中非离子N-乙烯基丁内酰胺碘和至少一种研磨助剂以150-800r / min的温度 在50℃-90℃下反应1至12小时以制备高稳定性非离子型N-乙烯基丁内酰胺碘，其中非离子型N-乙烯基丁内酰胺的K值为32±1，PD 非离子型N-乙烯基丁内酰胺的主峰的值为1.6，非离子型N-乙烯基丁内酰胺的水分含量为2.5％，优选的是，研磨助剂由氯化钠，钠 柠檬酸钠，碳酸钠和磷酸钠，加入的助磨剂的量为非离子型N-乙烯基丁内酰胺和碘的总量的0.02〜2％，非离子型N-乙烯基丁内酰胺为PVP-K32， 还提供了通过上述方法制备的高稳定性非离子型N-乙烯基丁内酰胺碘，稳定性高 本发明的离子型N-乙烯基丁内酰胺碘高，从而促进长期保存和使用，因此高稳定性的非离子型N-乙烯基丁内酰胺碘适用于大规模普及。

    Oxidation-stabilized CMP compositions and methods
    19.
    发明授权
    Oxidation-stabilized CMP compositions and methods 有权
    氧化稳定的CMP组合物和方法

    公开(公告)号：US08497209B2

    公开(公告)日：2013-07-30

    申请号：US12764268

    申请日：2010-04-21

    申请人： Steven K. Grumbine ,  Renjie Zhou ,  Zhan Chen ,  Phillip W. Carter

    发明人： Steven K. Grumbine ,  Renjie Zhou ,  Zhan Chen ,  Phillip W. Carter

    IPC分类号： H01L21/302 ,  H01L21/321

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  C23F3/04 ,  C23F3/06

    摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).

    摘要翻译： 本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。 任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。

    OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS
    20.
    发明申请
    OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS 有权
    氧化稳定的CMP组合物和方法

    公开(公告)号：US20100200802A1

    公开(公告)日：2010-08-12

    申请号：US12764268

    申请日：2010-04-21

    申请人： Steven K. GRUMBINE ,  Renjie Zhou ,  Zhan Chen ,  Phillip W. Carter

    发明人： Steven K. GRUMBINE ,  Renjie Zhou ,  Zhan Chen ,  Phillip W. Carter

    IPC分类号： C09K13/00

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  C23F3/04 ,  C23F3/06

    摘要： The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).

    摘要翻译： 本发明提供一种包含氨基化合物，自由基形成氧化剂，能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光（CMP）组合物，以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物，含氮化合物或其组合。 任选地，组合物包含金属氧化物研磨剂（例如二氧化硅，氧化铝，二氧化钛，二氧化铈，氧化锆，或两种或更多种前述研磨剂的组合）。