Abstract:
A dielectric device of higher performance is provided. An electron emitter, to which the dielectric device is applied is provided with: an emitter including a dielectric; and an upper electrode and a lower electrode to which drive voltage is applied in order to emit electrons. The emitter is formed by the aerosol deposition method or the sol impregnation method.
Abstract:
An electronic device utilizing electric conduction generated by the movement of electrons or positive holes of a semiconductor, includes a semiconductor member or members, a conductive member or members and an insulating member or members, the electronic device comprising a member or members formed of a metal silicide as the conductive member or members, and a carbon element linear structure or structures connected to the member or members formed of the conductive silicide. A production method of such an electronic device is also disclosed.
Abstract:
An electronic device utilizing electric conduction generated by the movement of electrons or positive holes of a semiconductor, includes a semiconductor member or members, a conductive member or members and an insulating member or members, the electronic device comprising a member or members formed of a metal silicide as the conductive member or members, and a carbon element linear structure or structures connected to the member or members formed of the conductive silicide. A production method of such an electronic device is also disclosed.
Abstract:
An electron emitting semiconductor device is provided with a P-type semiconductor layer arranged on a semiconductor substrate having an impurity concentration. A Schottky barrier electrode is arranged on a surface of the P-type semiconductor layer. Plural P.sup.+ -type area units are positioned under and facing the Schottky barrier electrode. An N.sup.+ -type area is disposed in the vicinity of the P.sup.+ -type units. The impurity concentration is such as to cause an avalanche breakdown in at least a portion of the surfaces.
Abstract:
An electron emitting device is provided with a p-semiconductor layer formed on a semiconductor substrate. The p-semiconductor layer is composed of a diamond layer.
Abstract:
A planar doped barrier region of semiconductor material is coupled to a vacuum or gaseous region to provide electron emission from the planar doped barrier region into the vacuum or gaseous region. When a voltage is applied across the planar doped barrier region electrons flow from one end of the region to another. This flow results in the emission of electrons if the work function of the emission surface is less than the bandgap of the semiconductor material. The device of the present invention can be used as a vacuum microelectronic emitter, a vacuum microelectronic transistor, light source, klystron, or travelling wave tube.
Abstract:
An electron beam apparatus comprising a semiconductor electron emitter whose emissive surface dimensions are determined by dimensions of a p-n junction provided in the semiconductor element. By optimizing the dimensions of the emissive surface in relation to the electron-optical properties of the apparatus, an emitter is realized which combines optimum beam formation or imaging with a sufficiently large beam current and a high beam current density as required by the apparatus.
Abstract:
An electron-emitting surface is provided with a material reducing the electron work function, which is obtained from a suitable reaction. The reaction mixture or the product to be decomposed, for example CsN.sub.3, is present in a surface depression of a semiconductor body, while one or more pn junctions act as a heating diode. Upon heating, cesium is released and deposited on the electron-emitting surface.