公开(公告)号：US20130187046A1

公开(公告)日：2013-07-25

申请号：US13825820

申请日：2011-09-23

Applicant: Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

Inventor： Dirk Zeidler ,  Thomas Kemen ,  Pascal Anger ,  Antonio Casares ,  Christof Riedesel

IPC: H01J37/09

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/28 ,  H01J37/3177 ,  H01J2237/0453 ,  H01J2237/0458 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention concerns a charged-particle multi-beamlet system that comprises a source of charged particles (301); a first multi-aperture plate (320) having plural apertures disposed in a charged particle beam path of the system down-stream of the source; a first multi-aperture selector plate (313) having plural apertures; a carrier (340), wherein the first multi-aperture selector plate is mounted on the carrier; and an actuator (350) configured to move the carrier such that the first multi-aperture selector plate is disposed in the charged particle beam path of the system downstream of the source in a first mode of operation of the system, and such that the first multi-aperture selector plate is disposed outside of the charged particle beam path in a second mode of operation of the system. The source, the first multi-aperture plate and the carrier of the system are arranged such that a first number of charged particle beamlets is generated at a position downstream of both the first multi-aperture plate and the first multi-aperture selector plate in the first mode of operation, and that a second number of charged particle beamlets is generated at the position in the second mode of operation, wherein the first number of beamlets differs from the second number of beamlets.

Abstract translation: 本发明涉及一种带电粒子多子束系统，其包括带电粒子源（301）; 第一多孔板（320），其具有设置在源的系统下游的带电粒子束路径中的多个孔; 具有多个孔的第一多孔选择板（313） 载体（340），其中所述第一多孔径选择器板安装在所述载体上; 以及构造成移动所述载体的致动器（350），使得所述第一多孔径选择器板在所述系统的第一操作模式中被布置在所述源的下游的系统的带电粒子束路径中，并且使得所述第一 多孔径选择器板在系统的第二操作模式中设置在带电粒子束路径的外部。 源极，第一多孔板和系统的载体被布置成使得在第一多孔径板和第一多孔径选择器板的下游位置处产生第一数量的带电粒子子束 第一操作模式，并且在第二操作模式的位置处产生第二数量的带电粒子子束，其中第一数量的子束与第二数量的子束不同。

公开(公告)号：US20130161511A1

公开(公告)日：2013-06-27

申请号：US13665623

申请日：2012-10-31

Applicant: Ebara Corporation

Inventor： Tsutomu Karimata ,  Tatsuya Kohama ,  Shoji Yoshikawa ,  Masahiro Hatakeyama

IPC: H01J37/26

CPC classification number: H01J37/261 ,  H01J37/073 ,  H01J37/12 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/036 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/1205 ,  H01J2237/1518 ,  H01J2237/186 ,  H01J2237/2443 ,  H01J2237/2817

Abstract: An electron beam inspection device observes a sample by irradiating the sample set on a stage with electron beams and detecting the electron beams from the sample. The electron beam inspection device has one electron column which irradiates the sample with the electron beams, and detects the electron beams from the sample. In this one electron column, a plurality of electron beam irradiation detecting systems are formed which each form electron beam paths in which the electron beams with which the sample is irradiated and the electron beams from the sample pass. The electron beam inspection device inspects the sample by simultaneously using a plurality of electron beam irradiation detecting systems and simultaneously irradiating the sample with the plurality of electron beams.

Abstract translation: 电子束检查装置通过用电子束照射载物台上的样品并检测来自样品的电子束来观察样品。 电子束检查装置具有一个电子管，用电子束照射样品，并检测来自样品的电子束。 在该一个电子柱中，形成多个电子束照射检测系统，每个电子束照射检测系统形成电子束路径，其中照射样品的电子束和来自样品的电子束通过。 电子束检查装置通过同时使用多个电子束照射检测系统来检查样品，同时用多个电子束照射样品。

公开(公告)号：US20120241606A1

公开(公告)日：2012-09-27

申请号：US13095585

申请日：2011-04-27

Applicant: Liqun Han ,  Xinrong Jiang ,  John D. Greene

Inventor： Liqun Han ,  Xinrong Jiang ,  John D. Greene

IPC: G01N23/04 ,  G01N23/00

CPC classification number: G01N23/2251 ,  G01N2223/102 ,  G01N2223/611 ,  H01J37/04 ,  H01J37/28 ,  H01J2237/0435 ,  H01J2237/04926 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/2446

Abstract: One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.

Abstract translation: 公开的一个实施例涉及用于对目标基板的表面进行成像的多子束电子束成像装置。 分束器透镜阵列被配置为分离照明光束以形成主子束阵列，并且扫描系统被配置为在目标基板的表面的区域上扫描主子束阵列。 另外，被配置为检测单个二次电子束的检测系统。 所公开的另一实施例涉及使用多子束电子束柱对目标衬底的表面进行成像的方法。 还公开了其它特征和实施例。

公开(公告)号：US08071944B2

公开(公告)日：2011-12-06

申请号：US11792156

申请日：2005-09-01

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: G01N23/00

CPC classification number: H01J37/28 ,  G01N23/04 ,  H01J37/04 ,  H01J37/185 ,  H01J2237/0245 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1503 ,  H01J2237/1825 ,  H01J2237/188 ,  H01J2237/204

Abstract: Provided is a portable electron microscope using a microcolumn. The portable electron microscope includes a microcolumn, a low vacuum pump, a high vacuum pump, an ultra-high vacuum ion pump, a first chamber for receiving and fixing the microcolumn and a sample to be measured and forming a vacuum by means of the pumps, a controller, and a case for receiving the pumps, the chamber and the controller.

Abstract translation: 提供了使用微柱的便携式电子显微镜。 便携式电子显微镜包括微柱，低真空泵，高真空泵，超高真空离子泵，用于接收和固定微柱的第一室和待测量的样品并通过泵形成真空 ，控制器和用于接收泵，腔室和控制器的壳体。

公开(公告)号：US20110168910A1

公开(公告)日：2011-07-14

申请号：US13071225

申请日：2011-03-24

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: G21K1/08

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US20100019166A1

公开(公告)日：2010-01-28

申请号：US11571695

申请日：2005-07-05

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: H01J3/14

CPC classification number: H01J37/263 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/14 ,  H01J37/04 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J2237/1205 ,  H01J2237/248 ,  H01J2237/28 ,  H01J2237/31752

Abstract: Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.

Abstract translation: 提供了一种用于控制多微柱中的电子束的方法，其中具有电子发射器，透镜和偏转器的单元微柱以n×m矩阵排列。 电压均匀或差分施加到每个电子发射器或提取器。 将相同的控制电压或不同的电压施加到每个提取器的控制分割区域中的坐标处的区域以偏转电子束。 不对应于提取器的透镜层被集体地或单独地控制，以便有效地控制单元微柱的电子束。 此外，提供了使用该方法的多微柱。

公开(公告)号：US20090261266A1

公开(公告)日：2009-10-22

申请号：US12492610

申请日：2009-06-26

Applicant: STEFAN LANIO

Inventor： STEFAN LANIO

IPC: H01J1/50

CPC classification number: H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

Abstract: The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.

Abstract translation: 本发明提供一种用于多个带电粒子束的透镜系统。 所述透镜系统包括向具有第一极片，第二极片和用于带电粒子束的至少两个开口的极片单元提供磁通的激励线圈，其中两个开口布置成一排，从而形成透镜 并且其中所述极靴单元具有细长形状。

公开(公告)号：US07504644B2

公开(公告)日：2009-03-17

申请号：US10543175

申请日：2004-01-23

Applicant: Hans Wilfried Peter Koops

Inventor： Hans Wilfried Peter Koops

IPC: G21G5/00 ,  C23F1/00 ,  H01B13/00

CPC classification number: H01J37/317 ,  H01J9/02 ,  H01J2237/1205 ,  H01J2237/31735

Abstract: The invention pertains to a process for the production of particle beam systems (10-10″″, 12-12″), in which at least one first particle beam system (10-10″″) is produced on a first substrate (14) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system (10-10″″) is used to produce at least one second particle beam system (12-12″) on at least one second substrate (16) by computer-guided particle beam-induced deposition. The inventive process makes it possible to produce a large number of particle beam systems in a relatively short time.

Abstract translation: 本发明涉及生产粒子束系统（10-10“，”12-12“）的方法，其中至少一个第一粒子束系统（10-10”）在 通过计算机引导的粒子束诱导沉积的第一衬底（14），并且使用最小的一个第一粒子束系统（10-10“”）来产生至少一个第二粒子束系统（12-12' '）通过计算机引导的粒子束诱导沉积在至少一个第二基底（16）上。 本发明的方法使得可以在相对短的时间内产生大量的粒子束系统。

公开(公告)号：US20080210866A1

公开(公告)日：2008-09-04

申请号：US11792274

申请日：2005-09-01

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: G01N23/00

CPC classification number: H01J37/04 ,  G11B7/261 ,  H01J2237/0245 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1503 ,  H01J2237/2817 ,  H01J2237/3175

Abstract: Provided is motioning equipment which provides relative motion between electron column emitting electron beam and a sample on which the electron beam is irradiated. The motioning equipment includes multi-microcolumn for emitting electron beams on the sample, supports for supporting the multi-microcolumns, and driving means for driving the supports to move the multi-microcolumns.

Abstract translation: 提供了提供电子束发射电子束与其上照射电子束的样品之间的相对运动的运动设备。 运动设备包括用于在样品上发射电子束的多微柱，用于支撑多微柱的支撑件，以及用于驱动支撑件以移动多微柱的驱动装置。

公开(公告)号：US20080203881A1

公开(公告)日：2008-08-28

申请号：US11915679

申请日：2006-05-29

Applicant: Ho Seob Kim ,  Byeng Jin

Inventor： Ho Seob Kim ,  Byeng Jin

IPC: H01J1/00 ,  H01K1/30

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

Abstract translation: 本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。 具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。 此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。