HEAT EXCHANGE APPARATUS AND METHODS FOR HYPERBARIC COOLING FAN APPLICATIONS

    公开(公告)号:US20240431066A1

    公开(公告)日:2024-12-26

    申请号:US18340577

    申请日:2023-06-23

    Abstract: Heat exchange apparatuses and methods for hyperbaric cooling fan applications such as computing devices. The apparatus comprises a material with high thermal conductivity and is configured to be overlaid on an internal surface of the housing, such that an internal surface of the apparatus is exposed to the hot air flowing inside the housing, and an external surface of the apparatus occludes at least some of the existing through-holes of the housing. In operation, the apparatus converts the through-holes into passive heat exchanging regions that passively transfer heat from inside the housing to outside the housing, which brings the internal air temperature and junction temperature (Tj) of the heat generating components down. Provided embodiments do not require reworking of the original industrial design (ID) of the housing.

    ACTIVE BOOTSTRAPPED-SUPPLY GENERATOR

    公开(公告)号:US20240429816A1

    公开(公告)日:2024-12-26

    申请号:US18214031

    申请日:2023-06-26

    Abstract: Some embodiments include an apparatus having a first node to receive a connection from a gate of a first transistor of a voltage converter; a second node to receive a connection from a gate of a second transistor of the voltage converter; a third node to receive a connection from a node between the first and second transistors; a capacitor including a first plate coupled to the third node; a first driver including an output node coupled to the first node, a first voltage node coupled to the first plate of the capacitor, and a second voltage node coupled to a second plate of the capacitor; a second driver including an output node coupled to the second node; and a circuit including third transistors coupled in series between the second voltage node and a third voltage node.

    FORKSHEET DEVICES WITH DIELECTRIC SPINE AT CELL BOUNDARY

    公开(公告)号:US20240429276A1

    公开(公告)日:2024-12-26

    申请号:US18212295

    申请日:2023-06-21

    Abstract: Techniques are provided herein to form semiconductor devices having cells that include forksheet devices with source or drain regions of the same dopant type on both sides of the forksheet dielectric spine. The techniques can be used in any number of integrated circuit applications and are particularly useful with respect to logic and memory cells. The forksheet devices may include all p-type source or drain regions on both sides of the dielectric spine or all n-type source or drain regions on both sides of the dielectric spine. Using forksheet devices with the same dopant type allows for both forksheet transistors and gate-all-around (GAA) transistors to be included within the same cell. The cell boundaries may also be placed along the forksheet dielectric spines rather than along gate cuts, which provides greater flexibility when designing multi-height cells.

    FABRICATION OF GATE-ALL-AROUND INTEGRATED CIRCUIT STRUCTURES HAVING ADDITIVE METAL GATES

    公开(公告)号:US20240429238A1

    公开(公告)日:2024-12-26

    申请号:US18825952

    申请日:2024-09-05

    Abstract: Gate-all-around integrated circuit structures having additive metal gates are described. For example, an integrated circuit structure includes a first vertical arrangement of horizontal nanowires, and a second vertical arrangement of horizontal nanowires. A first gate stack is over the first vertical arrangement of horizontal nanowires, the first gate stack having a P-type conductive layer with a first portion surrounding the nanowires of the first vertical arrangement of horizontal nanowires and a second portion extending laterally beside and spaced apart from the first portion. A second gate stack is over the second vertical arrangement of horizontal nanowires, the second gate stack having an N-type conductive layer with a first portion surrounding the nanowires of the second vertical arrangement of horizontal nanowires and a second portion adjacent to and in contact with the second portion of the P-type conductive layer.

    MATRIX OPERATION OPTIMIZATION MECHANISM

    公开(公告)号:US20240427842A1

    公开(公告)日:2024-12-26

    申请号:US18674212

    申请日:2024-05-24

    Abstract: An apparatus to facilitate machine learning matrix processing is disclosed. The apparatus comprises a memory to store matrix data one or more processors to execute an instruction to examine a message descriptor included in the instruction to determine a type of matrix layout manipulation operation that is to be executed, examine a message header included in the instruction having a plurality of parameters that define a two-dimensional (2D) memory surface that is to be retrieved, retrieve one or more blocks of the matrix data from the memory based on the plurality of parameters and a register file including a plurality of registers, wherein the one or more blocks of the matrix data is stored within a first set of the plurality of registers.

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