Flash memory cell and associated high voltage row decoder

    公开(公告)号:US11011240B2

    公开(公告)日:2021-05-18

    申请号:US16879663

    申请日:2020-05-20

    Abstract: The present invention relates to a flash memory cell with only four terminals and a high voltage row decoder for operating an array of such flash memory cells. The invention allows for fewer terminals for each flash memory cell compared to the prior art, which results in a simplification of the decoder circuitry and overall die space required per flash memory cells. The invention also provides for the use of high voltages on one or more of the four terminals to allow for read, erase, and programming operations despite the lower number of terminals compared to prior art flash memory cells.

    Method Of Forming Split-Gate Flash Memory Cell With Spacer Defined Floating Gate And Discretely Formed Polysilicon Gates

    公开(公告)号:US20210005724A1

    公开(公告)日:2021-01-07

    申请号:US16796412

    申请日:2020-02-20

    Abstract: A method of forming a memory device that includes forming a first polysilicon layer using a first polysilicon deposition over a semiconductor substrate, forming an insulation spacer on the first polysilicon layer, and removing some of the first polysilicon layer to leave a first polysilicon block under the insulation spacer. A source region is formed in the substrate adjacent a first side surface of the first polysilicon block. A second polysilicon layer is formed using a second polysilicon deposition. The second polysilicon layer is partially removed to leave a second polysilicon block over the substrate and adjacent to a second side surface of the first polysilicon block. A third polysilicon layer is formed using a third polysilicon deposition. The third polysilicon layer is partially removed to leave a third polysilicon block over the source region. A drain region is formed in the substrate adjacent to the second polysilicon block.

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