公开(公告)号：US20140284316A1

公开(公告)日：2014-09-25

申请号：US14190084

申请日：2014-02-25

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun JI

IPC: G01J5/02

CPC classification number: G01J5/602 ,  G01J5/0007 ,  G01J2005/0048 ,  G01J2005/067

Abstract: Disclosed are an apparatus and method of detecting a temperature through a pyrometer in a non-contact manner, and an apparatus for processing a substrate using the apparatus, and more particularly, an apparatus and method of detecting a temperature, which precisely measures a temperature without any effect by humidity, and an apparatus for processing a substrate using the same. In an exemplary embodiment, an apparatus for detecting a temperature includes a humidity sensor configured to measure a humidity value, a temperature compensation database configured to store a temperature compensation value for each humidity value, and a pyrometer in which, assuming that a wavelength band including a transmittance limiting wavelength band as a wavelength band having a transmittance less than a first threshold value due to the humidity and a transmittance allowing wavelength band as a wavelength band having a transmittance more than a second threshold value due to the humidity is a wavelength band to be compensated, a non-contact temperature is calculated by adding a temperature compensation value corresponding to a humidity value detected by the humidity sensor to a temperature to be compensated calculated by measuring a wavelength intensity of the wavelength band to be compensated radiated from an object to be measured.

Abstract translation: 公开了以非接触方式通过高温计检测温度的装置和方法，以及使用该装置处理基板的装置，更具体地，涉及一种检测温度的装置和方法，其精确地测量温度而没有 湿度的任何影响，以及使用其的基板的处理装置。 在一个示例性实施例中，用于检测温度的装置包括被配置为测量湿度值的湿度传感器，配置成存储每个湿度值的温度补偿值的温度补偿数据库，以及高温计，其中， 作为具有由于湿度而导致的透射率小于第一阈值的波长带的透光率限制波长带和由于湿度导致的具有大于第二阈值的波长带的波长带的透射率为波长带宽 通过将对应于由湿度传感器检测到的湿度值的温度补偿值与通过测量从物体辐射的待补偿的波长带的波长强度计算得到的待补偿温度相加来计算非接触温度 被测量。

公开(公告)号：US20140219310A1

公开(公告)日：2014-08-07

申请号：US14173795

申请日：2014-02-05

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun Ji

IPC: G01J5/52

CPC classification number: G01J5/522 ,  G01J5/0007 ,  G01J5/0893

Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover comprising a transparent blocking plate disposed at a position opposite to the light output port so as to transmit a long wavelength of approximately 5 μm to approximately 20 μm may and configured to be coupled with the light output wall of the body housing, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

Abstract translation: 公开了一种校准装置，其适于去除高温计的测量偏差，更具体地，涉及用于校准高温计的装置，其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体，其包括辐射能量辐射的辐射空间，被构造为在其中接收黑体的主体壳体，并且包括具有与辐射空间连接的光输出端口的光输出壁，光输出壁 保护盖包括设置在与光输出端口相对的位置处的透明阻挡板，以将大约5μm的长波长传输到大约20μm，并且可以被配置为与主体外壳的光输出壁相连，并且 固定构件，其构造成将光输出壁保护盖固定到主体壳体的光输出壁。

公开(公告)号：US20140219309A1

公开(公告)日：2014-08-07

申请号：US14173793

申请日：2014-02-05

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun JI

IPC: G01J5/52

CPC classification number: G01J5/522 ,  G01J5/0007 ,  G01J5/0887

Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover configured to be coupled with the light output wall of the body housing so as to define a passage connecting the light output wall of the body housing and an outside environment, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

Abstract translation: 公开了一种校准装置，其适于去除高温计的测量偏差，更具体地，涉及用于校准高温计的装置，其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体，其包括辐射能量辐射的辐射空间，被构造为在其中接收黑体的主体壳体，并且包括具有与辐射空间连接的光输出端口的光输出壁，光输出壁 保护盖，其构造成与所述主体壳体的所述光输出壁联接，以便限定连接所述主体壳体的光输出壁和外部环境的通​​道;以及固定构件，其将所述光输出壁保护盖固定到 光输出墙体的外壳。

公开(公告)号：US20130287376A1

公开(公告)日：2013-10-31

申请号：US13791848

申请日：2013-03-08

Applicant: AP SYSTEMS INC.

Inventor： Il Hwan LIM ,  Jang Woo SHIM ,  Chul Soo KIM ,  Seung Ae CHOI

IPC: H01L21/67

CPC classification number: H01L21/67115

Abstract: A heater block according to the present invention comprises a light-emitting lamp; a concave reflecting member that is placed opposite the lamp and has a concave reflecting surface at one surface faced with the lamp; a lens module that is inserted into the concave reflecting member and has at least one lens; and a flat reflecting member that is placed opposite the lens module. According to embodiments of the present invention, light emitted from the lamp is reflected by the concave reflecting member. Then, light and heat are collected from the reflected light by the flat reflecting member and the lens module and are irradiated on a substrate. That is, light having energy greater than a conventional manner is irradiated on the substrate to enhance the instant heating temperature and temperature increasing rate of substrate and to increase a heat-focusing area. Therefore, it has an advantage that the productivity of semiconductor or display device manufacture that requires a rapid thermal process is improved.

Abstract translation: 根据本发明的加热器块包括发光灯; 与所述灯相对放置的凹面反射构件，在与所述灯对置的一个面上具有凹面反射面; 透镜模块，其插入到所述凹面反射构件中并且具有至少一个透镜; 以及与透镜模块相对放置的平坦的反射部件。 根据本发明的实施例，从灯发射的光被凹面反射部件反射。 然后，通过平面反射部件和透镜组件从反射光收集光和热，并将其照射在基板上。 也就是说，具有大于常规方式的能量的光被照射在基板上以增强基板的即时加热温度和温度升高速率并增加热聚焦区域。 因此，具有提高需要快速热处理的半导体或显示装置制造的生产率的优点。

公开(公告)号：US11774370B2

公开(公告)日：2023-10-03

申请号：US17507797

申请日：2021-10-21

Applicant: AP SYSTEMS INC.

Inventor： Yong Soo Moon ,  Hahn Joo Yoon ,  Chan Ho Hong ,  Seung Hwan Lee ,  Oh Seung Kwon

IPC: G01N21/95 ,  G01N21/88 ,  G01K13/00

CPC classification number: G01N21/95 ,  G01N21/8806 ,  G01K13/00

Abstract: Provided are an apparatus for processing a substrate and a method for measuring a temperature of the substrate. The apparatus for processing the substrate includes a temperature measurement part and a light-transmitting shield plate. The temperature measurement part includes a light source, a light receiving part configured to receive reflected light reflected by the substrate or the shield plate among the light irradiated from the light source, and a radiant light emitted from the substrate to measure a quantity of the reflected light and an intensity of the radiant light and a temperature calculation part configured to calculate the temperature of the substrate, to which a contamination level of the shield plate is reflected, by using the quantity of the reflected light and the intensity of the radiant light.

公开(公告)号：US11136670B2

公开(公告)日：2021-10-05

申请号：US15870756

申请日：2018-01-12

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun Ji ,  Chang Kyo Kim

IPC: C23C16/455 ,  C23C16/52 ,  C23C16/40

Abstract: A gas spraying apparatus according to the embodiment of the present invention includes a spray part disposed and aligned on one side outside a substrate in the width direction of the substrate, and having a plurality of nozzles for spraying gas toward the substrate, and a spray control unit for automatically controlling whether or not each of a plurality of nozzles sprays gas such that a gas density distribution type in the width direction of the substrate becomes a targeted gas density distribution type by the gas sprayed through the plurality of nozzles. Therefore, according to the embodiment of the present invention, it is easy to carry out the process with a plurality of types of process types or a plurality of types of gas density distribution types, and a time for adjusting the open or close operation of the plurality of nozzles can be shortened.

公开(公告)号：US10985040B2

公开(公告)日：2021-04-20

申请号：US16132218

申请日：2018-09-14

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun Ji ,  Yong Soo Moon ,  Gun Bum Lee

IPC: G01J5/00 ,  G01K1/00 ,  G01K13/00 ,  H01L21/67 ,  G01J5/02 ,  G01J5/08

Abstract: A substrate treatment method in accordance with an exemplary embodiment includes: heating a substrate, for a substrate treatment process, so that a temperature of the substrate reaches a target temperature; calculating the temperature of the substrate using a sensor located facing the substrate while heating the substrate; and controlling an operation of a heating part configured to heat the substrate according to the temperature calculated from the calculating the temperature, wherein the calculating the temperature comprises: measuring a total radiant energy (Et) radiated from the substrate using the sensor; calculating a corrected total emissivity (εt0) by applying a correction value for correcting the total emissivity (εt) which is the emissivity of the radiant energy (Et); and calculating the temperature (Ts) of the substrate using the total radiant energy (Et) and the corrected total emissivity (εt0).

公开(公告)号：US20180258534A1

公开(公告)日：2018-09-13

申请号：US15870756

申请日：2018-01-12

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun JI ,  Chang Kyo KIM

IPC: C23C16/52 ,  C23C16/455

CPC classification number: C23C16/52 ,  C23C16/402 ,  C23C16/45574

Abstract: A gas spraying apparatus according to the embodiment of the present invention includes a spray part disposed and aligned on one side outside a substrate in the width direction of the substrate, and having a plurality of nozzles for spraying gas toward the substrate, and a spray control unit for automatically controlling whether or not each of a plurality of nozzles sprays gas such that a gas density distribution type in the width direction of the substrate becomes a targeted gas density distribution type by the gas sprayed through the plurality of nozzles. Therefore, according to the embodiment of the present invention, it is easy to carry out the process with a plurality of types of process types or a plurality of types of gas density distribution types, and a time for adjusting the open or close operation of the plurality of nozzles can be shortened.

公开(公告)号：US20180202035A1

公开(公告)日：2018-07-19

申请号：US15743944

申请日：2016-08-04

Applicant: AP SYSTEMS INC.

Inventor： Jong-Kab Park ,  Bo-Ram Kim ,  Jun-Gyu Hur ,  Doh-Hoon KIM

IPC: C23C14/04 ,  B23K26/352

CPC classification number: C23C14/042 ,  B23K26/352 ,  G03F7/0957 ,  G03F7/12 ,  H01L21/027 ,  H01L21/0338 ,  H01L21/31 ,  H01L51/0011 ,  Y10S148/143

Abstract: The present invention discloses a method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method includes: forming a wet-etched pattern by performing wet etching from above a base; and forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed. The present invention uses hybrid processing including wet etching and laser processing for manufacturing a shadow mask. The method has an effect on solving the productivity degradation of the conventional laser processing and provides a shadow mask with high quality using wet etching.

公开(公告)号：US09568372B2

公开(公告)日：2017-02-14

申请号：US14173795

申请日：2014-02-05

Applicant: AP SYSTEMS INC.

Inventor： Sang Hyun Ji

IPC: G01K15/00 ,  G01J5/00 ,  G01J5/52 ,  G01J5/08

CPC classification number: G01J5/522 ,  G01J5/0007 ,  G01J5/0893

Abstract: Disclosed is a calibrating apparatus which is adapted to remove a measurement deviation of a pyrometer, and more particularly, to an apparatus for calibrating a pyrometer, which calibrates a reference value so as to remove a deviation in a temperature measured in a pyrometer. The apparatus for calibrating a pyrometer includes a blackbody including a radiant space from which radiant energy is radiated, a body housing configured to receive the blackbody therein and including a light output wall having a light output port connected with the radiant space, a light output wall protecting cover comprising a transparent blocking plate disposed at a position opposite to the light output port so as to transmit a long wavelength of approximately 5 μm to approximately 20 μm may and configured to be coupled with the light output wall of the body housing, and a fixing member configured to fix the light output wall protecting cover to the light output wall of the body housing.

Abstract translation: 公开了一种校准装置，其适于去除高温计的测量偏差，更具体地，涉及用于校准高温计的装置，其校准参考值以消除在高温计中测量的温度的偏差。 用于校准高温计的装置包括黑体，其包括辐射能量辐射的辐射空间，被构造为在其中接收黑体的主体壳体，并且包括具有与辐射空间连接的光输出端口的光输出壁，光输出壁 保护盖包括设置在与光输出端口相对的位置处的透明阻挡板，以将大约5μm的长波长传输到大约20μm，并且可以被配置为与主体外壳的光输出壁相连，并且 固定构件，其构造成将光输出壁保护盖固定到主体壳体的光输出壁。