公开(公告)号：US20070085034A1

公开(公告)日：2007-04-19

申请号：US11251330

申请日：2005-10-14

Applicant: Ching-Yu Chang ,  Chin-Hsiang Lin ,  Burn Lin ,  David Lu

Inventor： Ching-Yu Chang ,  Chin-Hsiang Lin ,  Burn Lin ,  David Lu

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/70941

Abstract: A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.

Abstract translation: 一种用于浸没式光刻的方法包括提供涂覆有成像层的基底，在基底和光刻系统的成像透镜之间分配导电浸渍流体，以及使用辐射能量通过导电浸渍流体对成像层进行曝光处理 。

公开(公告)号：US20070004182A1

公开(公告)日：2007-01-04

申请号：US11280162

申请日：2005-11-16

Applicant: Ching-Yu Chang ,  Burn Lin

Inventor： Ching-Yu Chang ,  Burn Lin

IPC: H01L21/20 ,  H01L21/36

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/70916

Abstract: An immersion lithography system includes an immersion fluid holder for containing an immersion fluid. The system further includes a stage for positioning a resist-coated semiconductor wafer in the immersion fluid holder and a lens proximate to the immersion fluid holder and positionable for projecting an image through the immersion fluid and onto the resist-coated semiconductor wafer. The immersion fluid holder includes a coating configured to reduce contaminate adhesion from contaminates in the immersion fluid.

Abstract translation: 浸没式光刻系统包括用于容纳浸液的浸液流体保持器。 该系统还包括用于将浸渍液体保持器中的抗蚀剂涂覆的半导体晶片定位的台和靠近浸没流体保持器的透镜，并且可定位用于将图像投影通过浸没流体并且涂覆到抗蚀剂涂覆的半导体晶片上。 浸没流体保持器包括被配置为减少污染物从浸渍流体中的污染物粘附的涂层。

公开(公告)号：US20050147921A1

公开(公告)日：2005-07-07

申请号：US11043304

申请日：2005-01-26

Applicant: Chin-Hsiang Lin ,  Burn Lin

Inventor： Chin-Hsiang Lin ,  Burn Lin

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/70466 ,  G03F7/001 ,  G03F7/201 ,  G03F7/203 ,  G03F7/70408

Abstract: Provided are a high resolution lithography system and method. In one example, a method for producing a pattern on a substrate includes separating the pattern into at least a first sub-pattern containing lines oriented in a first direction and a second sub-pattern containing lines oriented in a second direction. Lines oriented in the first direction are created on a first layer of photosensitive material on the substrate using a first standing wave interference pattern. A portion of the created lines are trimmed to create the first sub-pattern. A second layer of photosensitive material is applied to the substrate after creating the first sub-pattern. Lines oriented in the second direction are created on the second layer using a second standing wave interference pattern. A portion of the created lines are trimmed to create the second sub-pattern.

Abstract translation: 提供了高分辨率光刻系统和方法。 在一个示例中，用于在衬底上产生图案的方法包括将图案分离成至少包含沿第一方向定向的线的第一子图案和包含沿第二方向定向的线的第二子图案。 使用第一驻波干涉图案，在基板上的第一感光材料层上产生沿第一方向取向的线。 创建的线的一部分被修剪以创建第一子图案。 在形成第一子图案之后，将第二层感光材料施加到基板上。 使用第二驻波干涉图形在第二层上产生朝向第二方向的线。 创建的线的一部分被修剪以创建第二子图案。

公开(公告)号：US06900258B2

公开(公告)日：2005-05-31

申请号：US10190191

申请日：2002-07-02

Applicant: Shaow Burn Lin ,  Anne Katja Shim ,  Todd Matthew Starke

Inventor： Shaow Burn Lin ,  Anne Katja Shim ,  Todd Matthew Starke

IPC: C08C19/25 ,  C08F8/42 ,  C08J3/26 ,  C08K5/00 ,  C08K5/09

CPC classification number: C08J3/26 ,  C08C19/25 ,  C08F8/42 ,  C08J2300/108 ,  C08J2321/00 ,  C08K5/0025 ,  C08L21/00

Abstract: Water-continuous emulsion of curable elastomeric polymers are disclosed having a solids content of greater than 75%, an average particle size less than 5 μm, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water comprising; a curable elastomeric polymer, surfactant, internal cure additive, water, optional plasticizer, and optional low molecular weight acid. The water-continuous emulsions of curable elastomeric polymers can be prepared by; (I) forming a premix comprising an elastomeric polymer, surfactant, and internal cure additive, and (II) adding water to the premix with mixing to form a water continuous emulsion of the curable elastomeric polymer having a solids content of greater than 75%, an average particle size less than 5 μm, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water.

Abstract translation: 公开了可固化弹性体聚合物的水连续乳液，其具有大于75％的固体含量，平均粒度小于5μm，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂; 可固化弹性体聚合物，表面活性剂，内部固化添加剂，水，任选的增塑剂和任选的低分子量酸。 可固化弹性体聚合物的水连续乳液可以通过以下步骤制备： （I）形成包含弹性体聚合物，表面活性剂和内部固化添加剂的预混物，和（II）将混合物中的水加入到预混物中以形成固体含量大于75％的可固化弹性体聚合物的水连续乳液， 平均粒径小于5μm，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂。

公开(公告)号：US20050100798A1

公开(公告)日：2005-05-12

申请号：US10964842

申请日：2004-10-13

Applicant: Burn Lin ,  Jeng Chen ,  Chun-Kuang Chen ,  Tsai-Sheng Gau ,  Ru-Gun Liu ,  Jen-Chieh Shih

Inventor： Burn Lin ,  Jeng Chen ,  Chun-Kuang Chen ,  Tsai-Sheng Gau ,  Ru-Gun Liu ,  Jen-Chieh Shih

IPC: G03C5/00 ,  G03F1/46 ,  G03F1/54 ,  G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/00

CPC classification number: G03F1/50 ,  G03F1/46

Abstract: Disclosed is a photomask having a wavelength-reducing material that may be used during photolithographic processing. In one example, the photomask includes a transparent substrate, an absorption layer having at least one opening, and a layer of wavelength-reducing material (WRM) placed into the opening. The thickness of the WRM may range from approximately a thickness of the absorption layer to approximately ten times the wavelength of light used during the photolithographic processing. In another example, the photomask includes at least one antireflection coating (ARC) layer.

Abstract translation: 公开了一种光掩模，其具有在光刻处理期间可以使用的波长减小材料。 在一个示例中，光掩模包括透明基板，具有至少一个开口的吸收层和放置在开口中的波长减小材料层（WRM）。 WRM的厚度可以在大约从吸收层的厚度到在光刻处理期间使用的光的波长的大约十倍的范围内。 在另一示例中，光掩模包括至少一个抗反射涂层（ARC）层。

公开(公告)号：US20050042552A1

公开(公告)日：2005-02-24

申请号：US10644356

申请日：2003-08-19

Applicant: Tsai-Sheng Gau ,  Burn Lin

Inventor： Tsai-Sheng Gau ,  Burn Lin

IPC: G03F7/00 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/40 ,  G03F1/50 ,  G03F7/0035 ,  G03F7/2026

Abstract: A method for selectively altering a thickness of a radiation sensitive polymer layer including providing a substrate including at least one radiation sensitive polymer layer having a first thickness topography; exposing the at least one radiation sensitive polymer layer through a mask having a predetermined radiant energy transmittance distribution to selectively expose predetermined areas of the at least one sensitive polymer layer to predetermined radiant energy dosages; and, developing the at least one radiation sensitive polymer layer to alter the first thickness topography of the at least one radiation sensitive polymer layer to produce a second thickness topography.

Abstract translation: 一种用于选择性地改变辐射敏感聚合物层的厚度的方法，包括提供包括具有第一厚度形貌的至少一个辐射敏感聚合物层的基底; 使所述至少一个辐射敏感聚合物层通过具有预定辐射能透射率分布的掩模曝光，以选择性地将所述至少一个敏感聚合物层的预定区域暴露于预定的辐射能量剂量; 以及显影所述至少一个辐射敏感聚合物层以改变所述至少一个辐射敏感聚合物层的第一厚度形貌以产生第二厚度拓扑。

公开(公告)号：US06831128B2

公开(公告)日：2004-12-14

申请号：US10189998

申请日：2002-07-02

Applicant: Michael Gene Altes ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Anne Katja Shim ,  Todd Matthew Starke ,  Toshio Suzuki

Inventor： Michael Gene Altes ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Anne Katja Shim ,  Todd Matthew Starke ,  Toshio Suzuki

IPC: C08L4304

CPC classification number: C08J3/03 ,  C08J2300/108 ,  C08J2321/00

Abstract: Water-continuous emulsion of silylated elastomeric polymers are disclosed having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water comprising; a silylated elastomeric polymer, surfactant, water, optional plasticizer, and optional low molecular weight acid. The water-continuous emulsions of silylated elastomeric polymers can be prepared by; (I) forming a premix comprising an elastomeric polymer and surfactant, and optionally a plasticizer and low molecular weight acid, and (II) adding water to the premix with mixing to form a water continuous emulsion of the silylated elastomeric polymer having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water.

公开(公告)号：US06825263B2

公开(公告)日：2004-11-30

申请号：US10321234

申请日：2002-12-17

Applicant: Shaow Burn Lin ,  Anne Katja Shim ,  David Shawn Tascarella

Inventor： Shaow Burn Lin ,  Anne Katja Shim ,  David Shawn Tascarella

IPC: C08L7504

CPC classification number: C08L23/22 ,  B60R2021/23514 ,  C08L75/04 ,  C08L101/00 ,  C08L2312/08 ,  C08L2666/20

Abstract: A curable coating composition comprises: (A) a water continuous emulsion comprising a curable elastomeric polymer having a viscosity of 0.5-1,000,000 KPa-s and a glass transition temperature up to 50° C.; (B) an aqueous polyurethane dispersion; and optionally, (C) a cure agent. Methods for preparing the curable coating compositions are also disclosed. The curable coating composition and the cured coatings derived from the reaction product of this composition are useful as fabric coatings, and in particular for decreasing air permeability of the coated fabrics at relatively lower coating weights.

Abstract translation: 可固化涂料组合物包含：（A）包含粘度为0.5-1,000,000KPa·s和玻璃化转变温度高达50℃的可固化弹性体聚合物的水连续乳液;（B）水性聚氨酯分散体; 和（C）固化剂。也公开了制备可固化涂料组合物的方法。 可固化涂料组合物和由该组合物的反应产物衍生的固化涂层可用作织物涂层，特别是用于在相对较低的涂层重量下降低涂布织物的透气性。

公开(公告)号：US06713558B2

公开(公告)日：2004-03-30

申请号：US09905659

申请日：2001-07-13

Applicant: Michael Gene Altes ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Todd Matthew Starke ,  Toshio Suzuki

Inventor： Michael Gene Altes ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Todd Matthew Starke ,  Toshio Suzuki

IPC: C08L4304

CPC classification number: C08J3/03 ,  C08J2300/108 ,  C08J2321/00

Abstract: Water-continuous emulsion of silylated elastomeric polymers are disclosed having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water comprising; a silylated elastomeric polymer, surfactant, water, optional plasticizer, and optional low molecular weight acid. The water-continuous emulsions of silylated elastomeric polymers can be prepared by; (I) forming a premix comprising an elastomeric polymer and surfactant, and optionally a plasticizer and low molecular weight acid, and (II) adding water to the premix with mixing to form a water continuous emulsion of the silylated elastomeric polymer having a solids content of greater than 75%, an average particle size less than 5 &mgr;m, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water.

Abstract translation: 公开了具有大于75％的固体含量，平均粒度小于5um的甲硅烷基化弹性体聚合物的水连续乳液，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂; 甲硅烷基化弹性体聚合物，表面活性剂，水，任选的增塑剂和任选的低分子量酸。 甲硅烷基化弹性体聚合物的水连续乳液可以通过以下步骤制备： （I）形成包含弹性体聚合物和表面活性剂以及任选的增塑剂和低分子量酸的预混物，和（II）将混合物中的水加入到预混合物中以形成具有固体含量的甲硅烷基化弹性体聚合物的水连续乳液 大于75％，平均粒径小于5μm，并且在用水稀释时具有足够的稳定性以产生稳定的低固体乳剂。

公开(公告)号：US20100247460A1

公开(公告)日：2010-09-30

申请号：US12680212

申请日：2008-09-22

Applicant: Shaow Burn Lin ,  Lori Ann Stark-Kasley

Inventor： Shaow Burn Lin ,  Lori Ann Stark-Kasley

IPC: A61K8/58 ,  C07F7/02 ,  A61K47/24 ,  A61K36/00 ,  A61K38/02 ,  A61K38/43 ,  A61Q1/06 ,  A61Q1/02 ,  A61Q5/12 ,  A61Q5/02 ,  A61Q15/00

CPC classification number: C08L83/12 ,  A61K8/042 ,  A61K8/894 ,  A61Q1/02 ,  A61Q1/06 ,  A61Q5/02 ,  A61Q5/06 ,  A61Q5/12 ,  A61Q15/00 ,  A61Q17/04 ,  A61Q19/007 ,  A61Q19/08 ,  A61Q19/10

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract translation: 公开了由含SiH的有机聚硅氧烷树脂与其分子中具有至少两个脂肪族不饱和基团的有机化合物反应的含硅弹性体的凝胶组合物。